Light-sensitive composition based on 1,2-naphthoquinone diazides, and light-sensitive registration material made therewith
Die Erfindung betrifft ein lichtempfindliches Gemisch, das im wesentlichen einen Naphthochinon-(1,2)-diazid-(2)-sulfonsäureester und ein Bindemittel enthält und ein hiermit hergestelltes Kopiermaterial. Der Naphthochinondiazidsulfonsäureester ist eine Verbindung der allgemeinen Formel I worin D eine...
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description | Die Erfindung betrifft ein lichtempfindliches Gemisch, das im wesentlichen einen Naphthochinon-(1,2)-diazid-(2)-sulfonsäureester und ein Bindemittel enthält und ein hiermit hergestelltes Kopiermaterial. Der Naphthochinondiazidsulfonsäureester ist eine Verbindung der allgemeinen Formel I worin D einen Naphthochinon-(1,2)-diazid-(2)-4-sulfonyl- oder einen Naphthochinon-(1,2)-diazid-(2)-5-sulfonylrest, R1 Wasserstoff oder eine -OD-Gruppe und R2 Alkyl oder gegebenenfalls substituiertes Aryl, vorzugsweise Alkyl mit 1-10 Kohlenstoffatomen oder gegebenenfalls substitiertes Phenyl bedeuten. Das lichtempfindliche Gemisch ist hochlichtempfindlich, besitzt gute Entwicklerresistenz und ist beständig gegen Feuchtwässer und Benzinkohlenwasserstoff.
A light-sensitive mixture is disclosed which contains a 1,2-naphthoquinone-2-diazide-sulfonic acid ester and a binder. A reproduction material produced with this mixture is also disclosed. The naphthoquinone-diazide-sulfonic acid ester is a compound of the general formula I I in which D is a 1,2-naphthoquinone-2-diazide-4-sulfonyl or 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R1 is hydrogen or an -OD group, and R2 is alkyl or substituted or unsubstituted aryl, preferably alkyl having 1 to 10 carbon atoms or substituted or unsubstituted phenyl. The light-sensitive mixture is highly photosensitive, has good overdevelopment resistance and is resistant to fountain solutions and petroleum hydrocarbons. |
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A light-sensitive mixture is disclosed which contains a 1,2-naphthoquinone-2-diazide-sulfonic acid ester and a binder. A reproduction material produced with this mixture is also disclosed. The naphthoquinone-diazide-sulfonic acid ester is a compound of the general formula I I in which D is a 1,2-naphthoquinone-2-diazide-4-sulfonyl or 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R1 is hydrogen or an -OD group, and R2 is alkyl or substituted or unsubstituted aryl, preferably alkyl having 1 to 10 carbon atoms or substituted or unsubstituted phenyl. The light-sensitive mixture is highly photosensitive, has good overdevelopment resistance and is resistant to fountain solutions and petroleum hydrocarbons.</description><language>eng ; fre ; ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; AUXILIARY PROCESSES IN PHOTOGRAPHY ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1989</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890308&DB=EPODOC&CC=EP&NR=0305828A2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890308&DB=EPODOC&CC=EP&NR=0305828A2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>STAHLHOFEN, PAUL</creatorcontrib><title>Light-sensitive composition based on 1,2-naphthoquinone diazides, and light-sensitive registration material made therewith</title><description>Die Erfindung betrifft ein lichtempfindliches Gemisch, das im wesentlichen einen Naphthochinon-(1,2)-diazid-(2)-sulfonsäureester und ein Bindemittel enthält und ein hiermit hergestelltes Kopiermaterial. Der Naphthochinondiazidsulfonsäureester ist eine Verbindung der allgemeinen Formel I worin D einen Naphthochinon-(1,2)-diazid-(2)-4-sulfonyl- oder einen Naphthochinon-(1,2)-diazid-(2)-5-sulfonylrest, R1 Wasserstoff oder eine -OD-Gruppe und R2 Alkyl oder gegebenenfalls substituiertes Aryl, vorzugsweise Alkyl mit 1-10 Kohlenstoffatomen oder gegebenenfalls substitiertes Phenyl bedeuten. Das lichtempfindliche Gemisch ist hochlichtempfindlich, besitzt gute Entwicklerresistenz und ist beständig gegen Feuchtwässer und Benzinkohlenwasserstoff.
A light-sensitive mixture is disclosed which contains a 1,2-naphthoquinone-2-diazide-sulfonic acid ester and a binder. A reproduction material produced with this mixture is also disclosed. The naphthoquinone-diazide-sulfonic acid ester is a compound of the general formula I I in which D is a 1,2-naphthoquinone-2-diazide-4-sulfonyl or 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R1 is hydrogen or an -OD group, and R2 is alkyl or substituted or unsubstituted aryl, preferably alkyl having 1 to 10 carbon atoms or substituted or unsubstituted phenyl. The light-sensitive mixture is highly photosensitive, has good overdevelopment resistance and is resistant to fountain solutions and petroleum hydrocarbons.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1989</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzDEKwkAQheE0FqLeYQ6QQEwQ0opELCws7MOYHbMDyey6Oyrk9EaxsrJ6X_H458l45M5qFkkiKz8IWjd497YTuGAkAxPWaZEJeqvW3e4sTggM48iGYgooBvqfSqCOowb8ZAZUCoz9BEOglgI9We0ymV2xj7T67iKBfX3eHTLyrqHosSUhbepTXuabqqi2RfnH5QUQlUc7</recordid><startdate>19890308</startdate><enddate>19890308</enddate><creator>STAHLHOFEN, PAUL</creator><scope>EVB</scope></search><sort><creationdate>19890308</creationdate><title>Light-sensitive composition based on 1,2-naphthoquinone diazides, and light-sensitive registration material made therewith</title><author>STAHLHOFEN, PAUL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP0305828A23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; fre ; ger</language><creationdate>1989</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>STAHLHOFEN, PAUL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>STAHLHOFEN, PAUL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Light-sensitive composition based on 1,2-naphthoquinone diazides, and light-sensitive registration material made therewith</title><date>1989-03-08</date><risdate>1989</risdate><abstract>Die Erfindung betrifft ein lichtempfindliches Gemisch, das im wesentlichen einen Naphthochinon-(1,2)-diazid-(2)-sulfonsäureester und ein Bindemittel enthält und ein hiermit hergestelltes Kopiermaterial. Der Naphthochinondiazidsulfonsäureester ist eine Verbindung der allgemeinen Formel I worin D einen Naphthochinon-(1,2)-diazid-(2)-4-sulfonyl- oder einen Naphthochinon-(1,2)-diazid-(2)-5-sulfonylrest, R1 Wasserstoff oder eine -OD-Gruppe und R2 Alkyl oder gegebenenfalls substituiertes Aryl, vorzugsweise Alkyl mit 1-10 Kohlenstoffatomen oder gegebenenfalls substitiertes Phenyl bedeuten. Das lichtempfindliche Gemisch ist hochlichtempfindlich, besitzt gute Entwicklerresistenz und ist beständig gegen Feuchtwässer und Benzinkohlenwasserstoff.
A light-sensitive mixture is disclosed which contains a 1,2-naphthoquinone-2-diazide-sulfonic acid ester and a binder. A reproduction material produced with this mixture is also disclosed. The naphthoquinone-diazide-sulfonic acid ester is a compound of the general formula I I in which D is a 1,2-naphthoquinone-2-diazide-4-sulfonyl or 1,2-naphthoquinone-2-diazide-5-sulfonyl radical, R1 is hydrogen or an -OD group, and R2 is alkyl or substituted or unsubstituted aryl, preferably alkyl having 1 to 10 carbon atoms or substituted or unsubstituted phenyl. The light-sensitive mixture is highly photosensitive, has good overdevelopment resistance and is resistant to fountain solutions and petroleum hydrocarbons.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | APPARATUS SPECIALLY ADAPTED THEREFOR AUXILIARY PROCESSES IN PHOTOGRAPHY BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS SEMICONDUCTOR DEVICES |
title | Light-sensitive composition based on 1,2-naphthoquinone diazides, and light-sensitive registration material made therewith |
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