SOLUBLE FLUORINATED CYCLOALKANE SULFONATE SURFACTANT ADDITIVES FOR NH4F/HF OXIDE ETCHANT SOLUTIONS
Silicon dioxide etching solutions with soluble surfact additives are provided. The improved silicon dioxide etchants are produced by adding soluble fluorinated surfactant additives to standard oxide etchants in the manufacture of integrated circuits. The surfactants found effective in accordance wit...
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| creator | KIETA, HAROLD JOHN HOPKINS, RONALD JAMES THOMAS, EVAN GOWER |
| description | Silicon dioxide etching solutions with soluble surfact additives are provided. The improved silicon dioxide etchants are produced by adding soluble fluorinated surfactant additives to standard oxide etchants in the manufacture of integrated circuits. The surfactants found effective in accordance with the invention are referred to as fluorianted cycloalkane sulfonates and fluorinated cycloalkene sulfonates and have the general formula Where X is F, H, Cl, OH, SO3A or R and Y is F, H, OH, R or be omitted and thereby impart a double bond; wherein R is a 1 to 4 fluoroalkyl group; and wherein n has a value of up to 6. A represents as the cation group may be NH4, H, Na, K, Li, R or organic amine cations. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP0201808A3</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP0201808A3</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP0201808A33</originalsourceid><addsrcrecordid>eNqNzEEKwjAQBdBuXIh6h7mAWK2LbsdkhgZDRpqk6KpUiSvRQr0_GvAArv7n8_jz4urFxoMlYBulNQ4DaVAXZQXtER2Bj5Ylz9_WMqqALgBqbYLpyANLC67Z86ZhkLPRBBRUk00-DkacXxaz-_CY0uqXiwI4o3UaX32axuGWnund06ncldu6rLGq_iAfto4z4Q</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SOLUBLE FLUORINATED CYCLOALKANE SULFONATE SURFACTANT ADDITIVES FOR NH4F/HF OXIDE ETCHANT SOLUTIONS</title><source>esp@cenet</source><creator>KIETA, HAROLD JOHN ; HOPKINS, RONALD JAMES ; THOMAS, EVAN GOWER</creator><creatorcontrib>KIETA, HAROLD JOHN ; HOPKINS, RONALD JAMES ; THOMAS, EVAN GOWER</creatorcontrib><description><![CDATA[Silicon dioxide etching solutions with soluble surfact additives are provided. The improved silicon dioxide etchants are produced by adding soluble fluorinated surfactant additives to standard oxide etchants in the manufacture of integrated circuits. The surfactants found effective in accordance with the invention are referred to as fluorianted cycloalkane sulfonates and fluorinated cycloalkene sulfonates and have the general formula Where X is F, H, Cl, OH, SO3A or R and Y is F, H, OH, R or be omitted and thereby impart a double bond; wherein R is a 1 to 4 fluoroalkyl group; and wherein n has a value of up to 6. A represents as the cation group may be NH4<+>, H<+>, Na<+>, K<+>, Li<+>, R<+> or organic amine cations.]]></description><edition>4</edition><language>eng</language><subject>ADHESIVES ; ARTIFICIAL STONE ; BASIC ELECTRIC ELEMENTS ; CEMENTS ; CERAMICS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS ; CONCRETE ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; DYES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LIME, MAGNESIA ; MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NATURAL RESINS ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE ; PAINTS ; POLISHES ; REFRACTORIES ; SEMICONDUCTOR DEVICES ; SLAG ; TREATMENT OF NATURAL STONE</subject><creationdate>1988</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19880323&DB=EPODOC&CC=EP&NR=0201808A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76516</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19880323&DB=EPODOC&CC=EP&NR=0201808A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KIETA, HAROLD JOHN</creatorcontrib><creatorcontrib>HOPKINS, RONALD JAMES</creatorcontrib><creatorcontrib>THOMAS, EVAN GOWER</creatorcontrib><title>SOLUBLE FLUORINATED CYCLOALKANE SULFONATE SURFACTANT ADDITIVES FOR NH4F/HF OXIDE ETCHANT SOLUTIONS</title><description><![CDATA[Silicon dioxide etching solutions with soluble surfact additives are provided. The improved silicon dioxide etchants are produced by adding soluble fluorinated surfactant additives to standard oxide etchants in the manufacture of integrated circuits. The surfactants found effective in accordance with the invention are referred to as fluorianted cycloalkane sulfonates and fluorinated cycloalkene sulfonates and have the general formula Where X is F, H, Cl, OH, SO3A or R and Y is F, H, OH, R or be omitted and thereby impart a double bond; wherein R is a 1 to 4 fluoroalkyl group; and wherein n has a value of up to 6. A represents as the cation group may be NH4<+>, H<+>, Na<+>, K<+>, Li<+>, R<+> or organic amine cations.]]></description><subject>ADHESIVES</subject><subject>ARTIFICIAL STONE</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CEMENTS</subject><subject>CERAMICS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</subject><subject>CONCRETE</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>DYES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LIME, MAGNESIA</subject><subject>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</subject><subject>NATURAL RESINS</subject><subject>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><subject>PAINTS</subject><subject>POLISHES</subject><subject>REFRACTORIES</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SLAG</subject><subject>TREATMENT OF NATURAL STONE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1988</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzEEKwjAQBdBuXIh6h7mAWK2LbsdkhgZDRpqk6KpUiSvRQr0_GvAArv7n8_jz4urFxoMlYBulNQ4DaVAXZQXtER2Bj5Ylz9_WMqqALgBqbYLpyANLC67Z86ZhkLPRBBRUk00-DkacXxaz-_CY0uqXiwI4o3UaX32axuGWnund06ncldu6rLGq_iAfto4z4Q</recordid><startdate>19880323</startdate><enddate>19880323</enddate><creator>KIETA, HAROLD JOHN</creator><creator>HOPKINS, RONALD JAMES</creator><creator>THOMAS, EVAN GOWER</creator><scope>EVB</scope></search><sort><creationdate>19880323</creationdate><title>SOLUBLE FLUORINATED CYCLOALKANE SULFONATE SURFACTANT ADDITIVES FOR NH4F/HF OXIDE ETCHANT SOLUTIONS</title><author>KIETA, HAROLD JOHN ; HOPKINS, RONALD JAMES ; THOMAS, EVAN GOWER</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP0201808A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1988</creationdate><topic>ADHESIVES</topic><topic>ARTIFICIAL STONE</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CEMENTS</topic><topic>CERAMICS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS</topic><topic>CONCRETE</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>DYES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LIME, MAGNESIA</topic><topic>MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</topic><topic>NATURAL RESINS</topic><topic>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</topic><topic>PAINTS</topic><topic>POLISHES</topic><topic>REFRACTORIES</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SLAG</topic><topic>TREATMENT OF NATURAL STONE</topic><toplevel>online_resources</toplevel><creatorcontrib>KIETA, HAROLD JOHN</creatorcontrib><creatorcontrib>HOPKINS, RONALD JAMES</creatorcontrib><creatorcontrib>THOMAS, EVAN GOWER</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KIETA, HAROLD JOHN</au><au>HOPKINS, RONALD JAMES</au><au>THOMAS, EVAN GOWER</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SOLUBLE FLUORINATED CYCLOALKANE SULFONATE SURFACTANT ADDITIVES FOR NH4F/HF OXIDE ETCHANT SOLUTIONS</title><date>1988-03-23</date><risdate>1988</risdate><abstract><![CDATA[Silicon dioxide etching solutions with soluble surfact additives are provided. The improved silicon dioxide etchants are produced by adding soluble fluorinated surfactant additives to standard oxide etchants in the manufacture of integrated circuits. The surfactants found effective in accordance with the invention are referred to as fluorianted cycloalkane sulfonates and fluorinated cycloalkene sulfonates and have the general formula Where X is F, H, Cl, OH, SO3A or R and Y is F, H, OH, R or be omitted and thereby impart a double bond; wherein R is a 1 to 4 fluoroalkyl group; and wherein n has a value of up to 6. A represents as the cation group may be NH4<+>, H<+>, Na<+>, K<+>, Li<+>, R<+> or organic amine cations.]]></abstract><edition>4</edition><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES ARTIFICIAL STONE BASIC ELECTRIC ELEMENTS CEMENTS CERAMICS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDINGMATERIALS CONCRETE DIFFUSION TREATMENT OF METALLIC MATERIAL DYES ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIME, MAGNESIA MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NATURAL RESINS NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE PAINTS POLISHES REFRACTORIES SEMICONDUCTOR DEVICES SLAG TREATMENT OF NATURAL STONE |
| title | SOLUBLE FLUORINATED CYCLOALKANE SULFONATE SURFACTANT ADDITIVES FOR NH4F/HF OXIDE ETCHANT SOLUTIONS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-15T03%3A07%3A57IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=KIETA,%20HAROLD%20JOHN&rft.date=1988-03-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP0201808A3%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |