SULFOPOLYESTER-CONTAINING PHOTOPOLYMER SYSTEMS
A low molecular weight, film-forming, polymerizable, ethylenically-unsaturated compound is water- and organic solvent-soluble (i.e., soluble in both water and organic solvents) but is readily converted on exposure to actinic radiation to a polymer that is solvent-insoluble (i.e., not soluble in wate...
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| creator | LARSON, WAYNE KEITH |
| description | A low molecular weight, film-forming, polymerizable, ethylenically-unsaturated compound is water- and organic solvent-soluble (i.e., soluble in both water and organic solvents) but is readily converted on exposure to actinic radiation to a polymer that is solvent-insoluble (i.e., not soluble in water, organic solvents, or mixtures of water and organic solvents) and, in certain examples, is hydrophobic. The compound comprises the ethylenically-unsaturated derivative (i.e., an ester or an amide) of a sulfopolyol or sulfopolyamine having an ethylenic unsaturated functionality of 2 to 18 and an equivalent weight per ethylenic unsaturated functionality of less than 2500. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP0146326A3</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP0146326A3</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP0146326A33</originalsourceid><addsrcrecordid>eNrjZNALDvVx8w_w94l0DQ5xDdJ19vcLcfT08_RzVwjw8A8By_i6BikERwKlfYN5GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakm8a4CBoYmZsZGZo7ExEUoAAHMmPg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SULFOPOLYESTER-CONTAINING PHOTOPOLYMER SYSTEMS</title><source>esp@cenet</source><creator>LARSON, WAYNE KEITH</creator><creatorcontrib>LARSON, WAYNE KEITH</creatorcontrib><description>A low molecular weight, film-forming, polymerizable, ethylenically-unsaturated compound is water- and organic solvent-soluble (i.e., soluble in both water and organic solvents) but is readily converted on exposure to actinic radiation to a polymer that is solvent-insoluble (i.e., not soluble in water, organic solvents, or mixtures of water and organic solvents) and, in certain examples, is hydrophobic. The compound comprises the ethylenically-unsaturated derivative (i.e., an ester or an amide) of a sulfopolyol or sulfopolyamine having an ethylenic unsaturated functionality of 2 to 18 and an equivalent weight per ethylenic unsaturated functionality of less than 2500.</description><edition>4</edition><language>eng</language><subject>ADHESIVES ; CHEMICAL PAINT OR INK REMOVERS ; CHEMISTRY ; COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; CORRECTING FLUIDS ; DYES ; FILLING PASTES ; INKS ; MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS ; MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS ; METALLURGY ; MISCELLANEOUS APPLICATIONS OF MATERIALS ; MISCELLANEOUS COMPOSITIONS ; NATURAL RESINS ; ORGANIC MACROMOLECULAR COMPOUNDS ; PAINTS ; PASTES OR SOLIDS FOR COLOURING OR PRINTING ; POLISHES ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF MATERIALS THEREFOR ; WOODSTAINS</subject><creationdate>1987</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19870408&DB=EPODOC&CC=EP&NR=0146326A3$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19870408&DB=EPODOC&CC=EP&NR=0146326A3$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LARSON, WAYNE KEITH</creatorcontrib><title>SULFOPOLYESTER-CONTAINING PHOTOPOLYMER SYSTEMS</title><description>A low molecular weight, film-forming, polymerizable, ethylenically-unsaturated compound is water- and organic solvent-soluble (i.e., soluble in both water and organic solvents) but is readily converted on exposure to actinic radiation to a polymer that is solvent-insoluble (i.e., not soluble in water, organic solvents, or mixtures of water and organic solvents) and, in certain examples, is hydrophobic. The compound comprises the ethylenically-unsaturated derivative (i.e., an ester or an amide) of a sulfopolyol or sulfopolyamine having an ethylenic unsaturated functionality of 2 to 18 and an equivalent weight per ethylenic unsaturated functionality of less than 2500.</description><subject>ADHESIVES</subject><subject>CHEMICAL PAINT OR INK REMOVERS</subject><subject>CHEMISTRY</subject><subject>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>CORRECTING FLUIDS</subject><subject>DYES</subject><subject>FILLING PASTES</subject><subject>INKS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</subject><subject>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</subject><subject>METALLURGY</subject><subject>MISCELLANEOUS APPLICATIONS OF MATERIALS</subject><subject>MISCELLANEOUS COMPOSITIONS</subject><subject>NATURAL RESINS</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PAINTS</subject><subject>PASTES OR SOLIDS FOR COLOURING OR PRINTING</subject><subject>POLISHES</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF MATERIALS THEREFOR</subject><subject>WOODSTAINS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1987</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNALDvVx8w_w94l0DQ5xDdJ19vcLcfT08_RzVwjw8A8By_i6BikERwKlfYN5GFjTEnOKU3mhNDeDgptriLOHbmpBfnxqcUFicmpeakm8a4CBoYmZsZGZo7ExEUoAAHMmPg</recordid><startdate>19870408</startdate><enddate>19870408</enddate><creator>LARSON, WAYNE KEITH</creator><scope>EVB</scope></search><sort><creationdate>19870408</creationdate><title>SULFOPOLYESTER-CONTAINING PHOTOPOLYMER SYSTEMS</title><author>LARSON, WAYNE KEITH</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP0146326A33</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1987</creationdate><topic>ADHESIVES</topic><topic>CHEMICAL PAINT OR INK REMOVERS</topic><topic>CHEMISTRY</topic><topic>COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>CORRECTING FLUIDS</topic><topic>DYES</topic><topic>FILLING PASTES</topic><topic>INKS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS</topic><topic>MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS</topic><topic>METALLURGY</topic><topic>MISCELLANEOUS APPLICATIONS OF MATERIALS</topic><topic>MISCELLANEOUS COMPOSITIONS</topic><topic>NATURAL RESINS</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PAINTS</topic><topic>PASTES OR SOLIDS FOR COLOURING OR PRINTING</topic><topic>POLISHES</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF MATERIALS THEREFOR</topic><topic>WOODSTAINS</topic><toplevel>online_resources</toplevel><creatorcontrib>LARSON, WAYNE KEITH</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LARSON, WAYNE KEITH</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SULFOPOLYESTER-CONTAINING PHOTOPOLYMER SYSTEMS</title><date>1987-04-08</date><risdate>1987</risdate><abstract>A low molecular weight, film-forming, polymerizable, ethylenically-unsaturated compound is water- and organic solvent-soluble (i.e., soluble in both water and organic solvents) but is readily converted on exposure to actinic radiation to a polymer that is solvent-insoluble (i.e., not soluble in water, organic solvents, or mixtures of water and organic solvents) and, in certain examples, is hydrophobic. The compound comprises the ethylenically-unsaturated derivative (i.e., an ester or an amide) of a sulfopolyol or sulfopolyamine having an ethylenic unsaturated functionality of 2 to 18 and an equivalent weight per ethylenic unsaturated functionality of less than 2500.</abstract><edition>4</edition><oa>free_for_read</oa></addata></record> |
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| subjects | ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES FILLING PASTES INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS |
| title | SULFOPOLYESTER-CONTAINING PHOTOPOLYMER SYSTEMS |
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