PROCESS FOR FORMING PATTERN WITH NEGATIVE RESIST

A process for forming patterns with a negative type resist which comprises the steps of forming a negative type resist film (2) made of quinone diazide oligomer having a polymerization degree of 10 or less such as quinone diazide sulfonic ester on a substrate (3), irradiating selectively with far ul...

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Bibliographische Detailangaben

Hauptverfasser:	YAMASHITA, YOSHIO OKI ELECTRIC INDUSTRY CO. LTD, KAWAZU, RYUJI OKI ELECTRIC INDUSTRY CO. LTD
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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