APPARATUS AND METHOD FOR ELECTROLESS PLATING
An apparatus and method for the electroless plating of articles. A tank (10) is provided for sequentially containing the respective constituent baths corresponding to the steps of the electroless plating process. An article to be plated (38), such as a printed circuit board, is supported in the cent...
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| description | An apparatus and method for the electroless plating of articles. A tank (10) is provided for sequentially containing the respective constituent baths corresponding to the steps of the electroless plating process. An article to be plated (38), such as a printed circuit board, is supported in the center of the tank immersed in the constituent bath contained therein. A pair in inwardly facing parallel manifolds (18) and (20) are disposed at opposite ends of the tank. The constituent solution is pumped through a nozzle matrix (35) in the inward facing wall (30) of a first manifold (18) onto the article and is simultaneously sucked away from the opposing side of the article through the matrix of the nozzles (37) defined in the inward facing wall (32) of a second manifold (20). The direction of pumping is alternated for periodically reversing the direction of suction and impingement. The alternating pressure difference created across the surface of the article being plated substantially improves the rate of metal deposition over prior art systems and allows for a uniform and high quality plate over the entire surface of the article. Additionally, through-holes defined in the article are thoroughly and uniformly deposited with electroless metal. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP0120083B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP0120083B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP0120083B13</originalsourceid><addsrcrecordid>eNrjZNBxDAhwDHIMCQ1WcPRzUfB1DfHwd1Fw8w9ScPVxdQ4J8vdxDQ5WCPBxDPH0c-dhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAQaGRgYGFsZOhsZEKAEAUK4kuQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>APPARATUS AND METHOD FOR ELECTROLESS PLATING</title><source>esp@cenet</source><creator>SCHRAMM, CHARLES, H</creator><creatorcontrib>SCHRAMM, CHARLES, H</creatorcontrib><description>An apparatus and method for the electroless plating of articles. A tank (10) is provided for sequentially containing the respective constituent baths corresponding to the steps of the electroless plating process. An article to be plated (38), such as a printed circuit board, is supported in the center of the tank immersed in the constituent bath contained therein. A pair in inwardly facing parallel manifolds (18) and (20) are disposed at opposite ends of the tank. The constituent solution is pumped through a nozzle matrix (35) in the inward facing wall (30) of a first manifold (18) onto the article and is simultaneously sucked away from the opposing side of the article through the matrix of the nozzles (37) defined in the inward facing wall (32) of a second manifold (20). The direction of pumping is alternated for periodically reversing the direction of suction and impingement. The alternating pressure difference created across the surface of the article being plated substantially improves the rate of metal deposition over prior art systems and allows for a uniform and high quality plate over the entire surface of the article. Additionally, through-holes defined in the article are thoroughly and uniformly deposited with electroless metal.</description><language>eng</language><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ; METALLURGY ; PRINTED CIRCUITS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1989</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890510&DB=EPODOC&CC=EP&NR=0120083B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25563,76318</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19890510&DB=EPODOC&CC=EP&NR=0120083B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHRAMM, CHARLES, H</creatorcontrib><title>APPARATUS AND METHOD FOR ELECTROLESS PLATING</title><description>An apparatus and method for the electroless plating of articles. A tank (10) is provided for sequentially containing the respective constituent baths corresponding to the steps of the electroless plating process. An article to be plated (38), such as a printed circuit board, is supported in the center of the tank immersed in the constituent bath contained therein. A pair in inwardly facing parallel manifolds (18) and (20) are disposed at opposite ends of the tank. The constituent solution is pumped through a nozzle matrix (35) in the inward facing wall (30) of a first manifold (18) onto the article and is simultaneously sucked away from the opposing side of the article through the matrix of the nozzles (37) defined in the inward facing wall (32) of a second manifold (20). The direction of pumping is alternated for periodically reversing the direction of suction and impingement. The alternating pressure difference created across the surface of the article being plated substantially improves the rate of metal deposition over prior art systems and allows for a uniform and high quality plate over the entire surface of the article. Additionally, through-holes defined in the article are thoroughly and uniformly deposited with electroless metal.</description><subject>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</subject><subject>METALLURGY</subject><subject>PRINTED CIRCUITS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1989</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNBxDAhwDHIMCQ1WcPRzUfB1DfHwd1Fw8w9ScPVxdQ4J8vdxDQ5WCPBxDPH0c-dhYE1LzClO5YXS3AwKbq4hzh66qQX58anFBYnJqXmpJfGuAQaGRgYGFsZOhsZEKAEAUK4kuQ</recordid><startdate>19890510</startdate><enddate>19890510</enddate><creator>SCHRAMM, CHARLES, H</creator><scope>EVB</scope></search><sort><creationdate>19890510</creationdate><title>APPARATUS AND METHOD FOR ELECTROLESS PLATING</title><author>SCHRAMM, CHARLES, H</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP0120083B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1989</creationdate><topic>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</topic><topic>METALLURGY</topic><topic>PRINTED CIRCUITS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHRAMM, CHARLES, H</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHRAMM, CHARLES, H</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>APPARATUS AND METHOD FOR ELECTROLESS PLATING</title><date>1989-05-10</date><risdate>1989</risdate><abstract>An apparatus and method for the electroless plating of articles. A tank (10) is provided for sequentially containing the respective constituent baths corresponding to the steps of the electroless plating process. An article to be plated (38), such as a printed circuit board, is supported in the center of the tank immersed in the constituent bath contained therein. A pair in inwardly facing parallel manifolds (18) and (20) are disposed at opposite ends of the tank. The constituent solution is pumped through a nozzle matrix (35) in the inward facing wall (30) of a first manifold (18) onto the article and is simultaneously sucked away from the opposing side of the article through the matrix of the nozzles (37) defined in the inward facing wall (32) of a second manifold (20). The direction of pumping is alternated for periodically reversing the direction of suction and impingement. The alternating pressure difference created across the surface of the article being plated substantially improves the rate of metal deposition over prior art systems and allows for a uniform and high quality plate over the entire surface of the article. Additionally, through-holes defined in the article are thoroughly and uniformly deposited with electroless metal.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY PRINTED CIRCUITS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | APPARATUS AND METHOD FOR ELECTROLESS PLATING |
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