PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICES COMPRISING AN ELECTROCHEMICAL-ETCHING STEP

A procedure is described for producing semiconductor devices having damage-free surfaces in electrochemically n-type and intrinsic compound semiconductors. The process involves a photoetching procedure including applying a potential to the compound semiconductor while it is in contact with an electr...

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Bibliographische Detailangaben

Hauptverfasser:	FORREST, STEPHEN ROSS, PANOCK, RICHARD LAWRENCE, KOHL, PAUL ALBERT
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROLYTIC OR ELECTROPHORETIC PROCESSES METALLURGY PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROMOBJECTS SEMICONDUCTOR DEVICES
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