POLYMER COMPOSITIONS HAVING A REDUCED COEFFICIENT OF FRICTION AND ELEMENTS CONTAINING THEM
Polymer compositions which have a low coefficient of friction are disclosed. The polymer compositions comprise a blend of at least 80 percent by weight of a solid or film-forming polymer and at least 0.35 percent by weight of a crosslinked silicone polycarbinol. The described composition retains its...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | STEKLENSKI, DAVID JOHN |
| description | Polymer compositions which have a low coefficient of friction are disclosed. The polymer compositions comprise a blend of at least 80 percent by weight of a solid or film-forming polymer and at least 0.35 percent by weight of a crosslinked silicone polycarbinol. The described composition retains its low coefficient of friction even after being exposed to hydrocarbon solvents during a cleaning process. The described compositions are particularly useful in forming protective layers for elements, particularly photographic elements. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP0097462B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP0097462B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP0097462B13</originalsourceid><addsrcrecordid>eNrjZIgK8PeJ9HUNUnD29w3wD_YM8fT3C1bwcAzz9HNXcFQIcnUJdXZ1Acq6url5Onu6-oUo-LspuAV5OoNUKjj6uSi4-rj6AsWDgYr8Qhw9_UA6QzxcfXkYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSbxrgIGBpbmJmZGToTERSgD8BzFm</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>POLYMER COMPOSITIONS HAVING A REDUCED COEFFICIENT OF FRICTION AND ELEMENTS CONTAINING THEM</title><source>esp@cenet</source><creator>STEKLENSKI, DAVID JOHN</creator><creatorcontrib>STEKLENSKI, DAVID JOHN</creatorcontrib><description>Polymer compositions which have a low coefficient of friction are disclosed. The polymer compositions comprise a blend of at least 80 percent by weight of a solid or film-forming polymer and at least 0.35 percent by weight of a crosslinked silicone polycarbinol. The described composition retains its low coefficient of friction even after being exposed to hydrocarbon solvents during a cleaning process. The described compositions are particularly useful in forming protective layers for elements, particularly photographic elements.</description><language>eng</language><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G ; AUXILIARY PROCESSES IN PHOTOGRAPHY ; CHEMISTRY ; CINEMATOGRAPHY ; COMPOSITIONS BASED THEREON ; COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ; ELECTROGRAPHY ; GENERAL PROCESSES OF COMPOUNDING ; HOLOGRAPHY ; METALLURGY ; ORGANIC MACROMOLECULAR COMPOUNDS ; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES ; PHOTOGRAPHY ; PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES ; PHYSICS ; THEIR PREPARATION OR CHEMICAL WORKING-UP ; USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS ; WORKING-UP</subject><creationdate>1990</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19900411&DB=EPODOC&CC=EP&NR=0097462B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19900411&DB=EPODOC&CC=EP&NR=0097462B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>STEKLENSKI, DAVID JOHN</creatorcontrib><title>POLYMER COMPOSITIONS HAVING A REDUCED COEFFICIENT OF FRICTION AND ELEMENTS CONTAINING THEM</title><description>Polymer compositions which have a low coefficient of friction are disclosed. The polymer compositions comprise a blend of at least 80 percent by weight of a solid or film-forming polymer and at least 0.35 percent by weight of a crosslinked silicone polycarbinol. The described composition retains its low coefficient of friction even after being exposed to hydrocarbon solvents during a cleaning process. The described compositions are particularly useful in forming protective layers for elements, particularly photographic elements.</description><subject>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</subject><subject>AUXILIARY PROCESSES IN PHOTOGRAPHY</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>COMPOSITIONS BASED THEREON</subject><subject>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</subject><subject>ELECTROGRAPHY</subject><subject>GENERAL PROCESSES OF COMPOUNDING</subject><subject>HOLOGRAPHY</subject><subject>METALLURGY</subject><subject>ORGANIC MACROMOLECULAR COMPOUNDS</subject><subject>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</subject><subject>PHYSICS</subject><subject>THEIR PREPARATION OR CHEMICAL WORKING-UP</subject><subject>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</subject><subject>WORKING-UP</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1990</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIgK8PeJ9HUNUnD29w3wD_YM8fT3C1bwcAzz9HNXcFQIcnUJdXZ1Acq6url5Onu6-oUo-LspuAV5OoNUKjj6uSi4-rj6AsWDgYr8Qhw9_UA6QzxcfXkYWNMSc4pTeaE0N4OCm2uIs4duakF-fGpxQWJyal5qSbxrgIGBpbmJmZGToTERSgD8BzFm</recordid><startdate>19900411</startdate><enddate>19900411</enddate><creator>STEKLENSKI, DAVID JOHN</creator><scope>EVB</scope></search><sort><creationdate>19900411</creationdate><title>POLYMER COMPOSITIONS HAVING A REDUCED COEFFICIENT OF FRICTION AND ELEMENTS CONTAINING THEM</title><author>STEKLENSKI, DAVID JOHN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP0097462B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1990</creationdate><topic>AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G</topic><topic>AUXILIARY PROCESSES IN PHOTOGRAPHY</topic><topic>CHEMISTRY</topic><topic>CINEMATOGRAPHY</topic><topic>COMPOSITIONS BASED THEREON</topic><topic>COMPOSITIONS OF MACROMOLECULAR COMPOUNDS</topic><topic>ELECTROGRAPHY</topic><topic>GENERAL PROCESSES OF COMPOUNDING</topic><topic>HOLOGRAPHY</topic><topic>METALLURGY</topic><topic>ORGANIC MACROMOLECULAR COMPOUNDS</topic><topic>PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES</topic><topic>PHYSICS</topic><topic>THEIR PREPARATION OR CHEMICAL WORKING-UP</topic><topic>USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS</topic><topic>WORKING-UP</topic><toplevel>online_resources</toplevel><creatorcontrib>STEKLENSKI, DAVID JOHN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>STEKLENSKI, DAVID JOHN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POLYMER COMPOSITIONS HAVING A REDUCED COEFFICIENT OF FRICTION AND ELEMENTS CONTAINING THEM</title><date>1990-04-11</date><risdate>1990</risdate><abstract>Polymer compositions which have a low coefficient of friction are disclosed. The polymer compositions comprise a blend of at least 80 percent by weight of a solid or film-forming polymer and at least 0.35 percent by weight of a crosslinked silicone polycarbinol. The described composition retains its low coefficient of friction even after being exposed to hydrocarbon solvents during a cleaning process. The described compositions are particularly useful in forming protective layers for elements, particularly photographic elements.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_EP0097462B1 |
| source | esp@cenet |
| subjects | AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G AUXILIARY PROCESSES IN PHOTOGRAPHY CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTROGRAPHY GENERAL PROCESSES OF COMPOUNDING HOLOGRAPHY METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR,STEREO-PHOTOGRAPHIC PROCESSES PHOTOGRAPHY PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS WORKING-UP |
| title | POLYMER COMPOSITIONS HAVING A REDUCED COEFFICIENT OF FRICTION AND ELEMENTS CONTAINING THEM |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T20%3A10%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=STEKLENSKI,%20DAVID%20JOHN&rft.date=1990-04-11&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP0097462B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |