Integrated circuit structure and method for forming a recessed isolation structure for integrated circuits

An integrated circuit structure having substrate contacts formed as a part of the isolation structure and method for making the same is described. The integrated circuit structure is composed of a monocrystalline silicon body (2, 4) having a pattern of dielectric isolation surrounding regions of the...

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Bibliographische Detailangaben
Hauptverfasser: MAUER IV, JOHN LESTER, KEMLAGE, BERNARD MICHAEL, JOY, RICHARD CARLETON
Format: Patent
Sprache:eng ; fre ; ger
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