A STRIP OF ELECTRICAL TERMINALS ELECTROPLATED WITH CONTACT METAL AND A METHOD OF, AND APPARATUS FOR, PLATING SUCH A STRIP

Each terminal of the strip has a contact zone (18) plated with contact metal of wear resistant thickness (B). For avoiding the creep of corrosion products onto the contact metal on the contact zone (18), the contact zone (18) is surrounded by contact metal plating of corrosion resistant thickness, e...

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Hauptverfasser:	LERNER, LEWIS BRIAN, ZIMMERMAN, RICHARD HENRY, DAVIS, THOMAS FRANCIS
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CURRENT COLLECTORS ELECTRICITY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES LINE CONNECTORS METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
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creator	LERNER, LEWIS BRIAN ZIMMERMAN, RICHARD HENRY DAVIS, THOMAS FRANCIS
description	Each terminal of the strip has a contact zone (18) plated with contact metal of wear resistant thickness (B). For avoiding the creep of corrosion products onto the contact metal on the contact zone (18), the contact zone (18) is surrounded by contact metal plating of corrosion resistant thickness, extending for a distance of between about 0.254mm and about 0.381mm from the longitudinal central plane (A-A) of the contact zone (18), and in the interest of economy, being much thinner than the plating on the contact zone (18) and being joined thereto by intermediate plating (B min ) of sharply tapered thickness. In the method and apparatus for producing the plating a very narrow linear anode embedded in a wall of a plating cell is employed.
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fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP0023394B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP0023394B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP0023394B13</originalsourceid><addsrcrecordid>eNqNjUEKwjAURLtxIeod_gEqVOvG5Tf9MYE0CckvXZYicSVaqBtvb4s9gKsZhjcz6-yDEDloD04CGRKTF2iAKdTaoolL6LxBpgpazQqEs4yCoSaeULQV4OyVq6aV_Bd4jwG5iSBdyGFua3uF2AgFy-M2W937x5h2i24ykMRC7dPw6tI49Lf0TO-OfFEcy_J8uhzKP5Av94w5CA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A STRIP OF ELECTRICAL TERMINALS ELECTROPLATED WITH CONTACT METAL AND A METHOD OF, AND APPARATUS FOR, PLATING SUCH A STRIP</title><source>esp@cenet</source><creator>LERNER, LEWIS BRIAN ; ZIMMERMAN, RICHARD HENRY ; DAVIS, THOMAS FRANCIS</creator><creatorcontrib>LERNER, LEWIS BRIAN ; ZIMMERMAN, RICHARD HENRY ; DAVIS, THOMAS FRANCIS</creatorcontrib><description>Each terminal of the strip has a contact zone (18) plated with contact metal of wear resistant thickness (B). For avoiding the creep of corrosion products onto the contact metal on the contact zone (18), the contact zone (18) is surrounded by contact metal plating of corrosion resistant thickness, extending for a distance of between about 0.254mm and about 0.381mm from the longitudinal central plane (A-A) of the contact zone (18), and in the interest of economy, being much thinner than the plating on the contact zone (18) and being joined thereto by intermediate plating (B min ) of sharply tapered thickness. In the method and apparatus for producing the plating a very narrow linear anode embedded in a wall of a plating cell is employed.</description><language>eng</language><subject>APPARATUS THEREFOR ; BASIC ELECTRIC ELEMENTS ; CHEMISTRY ; CURRENT COLLECTORS ; ELECTRICITY ; ELECTROFORMING ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; LINE CONNECTORS ; METALLURGY ; PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><creationdate>1983</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19830720&DB=EPODOC&CC=EP&NR=0023394B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19830720&DB=EPODOC&CC=EP&NR=0023394B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LERNER, LEWIS BRIAN</creatorcontrib><creatorcontrib>ZIMMERMAN, RICHARD HENRY</creatorcontrib><creatorcontrib>DAVIS, THOMAS FRANCIS</creatorcontrib><title>A STRIP OF ELECTRICAL TERMINALS ELECTROPLATED WITH CONTACT METAL AND A METHOD OF, AND APPARATUS FOR, PLATING SUCH A STRIP</title><description>Each terminal of the strip has a contact zone (18) plated with contact metal of wear resistant thickness (B). For avoiding the creep of corrosion products onto the contact metal on the contact zone (18), the contact zone (18) is surrounded by contact metal plating of corrosion resistant thickness, extending for a distance of between about 0.254mm and about 0.381mm from the longitudinal central plane (A-A) of the contact zone (18), and in the interest of economy, being much thinner than the plating on the contact zone (18) and being joined thereto by intermediate plating (B min ) of sharply tapered thickness. In the method and apparatus for producing the plating a very narrow linear anode embedded in a wall of a plating cell is employed.</description><subject>APPARATUS THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMISTRY</subject><subject>CURRENT COLLECTORS</subject><subject>ELECTRICITY</subject><subject>ELECTROFORMING</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>LINE CONNECTORS</subject><subject>METALLURGY</subject><subject>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1983</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjUEKwjAURLtxIeod_gEqVOvG5Tf9MYE0CckvXZYicSVaqBtvb4s9gKsZhjcz6-yDEDloD04CGRKTF2iAKdTaoolL6LxBpgpazQqEs4yCoSaeULQV4OyVq6aV_Bd4jwG5iSBdyGFua3uF2AgFy-M2W937x5h2i24ykMRC7dPw6tI49Lf0TO-OfFEcy_J8uhzKP5Av94w5CA</recordid><startdate>19830720</startdate><enddate>19830720</enddate><creator>LERNER, LEWIS BRIAN</creator><creator>ZIMMERMAN, RICHARD HENRY</creator><creator>DAVIS, THOMAS FRANCIS</creator><scope>EVB</scope></search><sort><creationdate>19830720</creationdate><title>A STRIP OF ELECTRICAL TERMINALS ELECTROPLATED WITH CONTACT METAL AND A METHOD OF, AND APPARATUS FOR, PLATING SUCH A STRIP</title><author>LERNER, LEWIS BRIAN ; ZIMMERMAN, RICHARD HENRY ; DAVIS, THOMAS FRANCIS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP0023394B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1983</creationdate><topic>APPARATUS THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMISTRY</topic><topic>CURRENT COLLECTORS</topic><topic>ELECTRICITY</topic><topic>ELECTROFORMING</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>LINE CONNECTORS</topic><topic>METALLURGY</topic><topic>PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS</topic><toplevel>online_resources</toplevel><creatorcontrib>LERNER, LEWIS BRIAN</creatorcontrib><creatorcontrib>ZIMMERMAN, RICHARD HENRY</creatorcontrib><creatorcontrib>DAVIS, THOMAS FRANCIS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LERNER, LEWIS BRIAN</au><au>ZIMMERMAN, RICHARD HENRY</au><au>DAVIS, THOMAS FRANCIS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A STRIP OF ELECTRICAL TERMINALS ELECTROPLATED WITH CONTACT METAL AND A METHOD OF, AND APPARATUS FOR, PLATING SUCH A STRIP</title><date>1983-07-20</date><risdate>1983</risdate><abstract>Each terminal of the strip has a contact zone (18) plated with contact metal of wear resistant thickness (B). For avoiding the creep of corrosion products onto the contact metal on the contact zone (18), the contact zone (18) is surrounded by contact metal plating of corrosion resistant thickness, extending for a distance of between about 0.254mm and about 0.381mm from the longitudinal central plane (A-A) of the contact zone (18), and in the interest of economy, being much thinner than the plating on the contact zone (18) and being joined thereto by intermediate plating (B min ) of sharply tapered thickness. In the method and apparatus for producing the plating a very narrow linear anode embedded in a wall of a plating cell is employed.</abstract><oa>free_for_read</oa></addata></record>
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source	esp@cenet
subjects	APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CURRENT COLLECTORS ELECTRICITY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES LINE CONNECTORS METALLURGY PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS
title	A STRIP OF ELECTRICAL TERMINALS ELECTROPLATED WITH CONTACT METAL AND A METHOD OF, AND APPARATUS FOR, PLATING SUCH A STRIP
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T17%3A33%3A30IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LERNER,%20LEWIS%20BRIAN&rft.date=1983-07-20&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EEP0023394B1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true