A GAS DISTRIBUTION DEVICE FOR THE SUPPLY OF A PROCESSING GAS TO AN ATOMIZING CHAMBER
A gas distribution device for the supply of a processing gas to the atomizing zone around an atomizing device (1) arranged centrally in an atomizing chamber, said gas distribution device comprises a conical guide duct (10) communicating with a horizontal spiral supply duct (8) through an annular mou...
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| creator | LARSSON, FINN HILDING SCHWARTZBACH, CHRISTIAN |
| description | A gas distribution device for the supply of a processing gas to the atomizing zone around an atomizing device (1) arranged centrally in an atomizing chamber, said gas distribution device comprises a conical guide duct (10) communicating with a horizontal spiral supply duct (8) through an annular mouth (9). A uniform gas distribution with respect to flow direction and velocity is obtained by means of guide vanes (15, 16) arranged with a small annular spacing inthe mouth (9) and comprising two succeeding vein sets, in which the vanes (15) of one set are shaped to deflect the tangential gas stream in the spiral duct (8) to a flow direction, for which the radial velocity component considerably exceeds the tangential component, whereas each vane (16) of the other set positioned at the opening of the mouth towards the conical guide duct (10) projects into the space between neighbouring vanes (15) of the first set and extends substantially parallel to tangential planes to said vanes (15) at their internal edges. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_EP0008524B1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>EP0008524B1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_EP0008524B13</originalsourceid><addsrcrecordid>eNqNi0sKwjAUALNxIeod3gWE-AO3L-lLE7BJSF4LuilF4kq0UO-PKB7A1cAwMxeMUGOGymVOTrXsgoeKOqcJTEjAliC3MZ7OEAwgxBQ05ex8_d04AHpADo27fJy22ChKSzG7DfeprH5cCDDE2q7L-OzLNA7X8iivnqKU8njY7tVm90fyBo_GLzA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>A GAS DISTRIBUTION DEVICE FOR THE SUPPLY OF A PROCESSING GAS TO AN ATOMIZING CHAMBER</title><source>esp@cenet</source><creator>LARSSON, FINN HILDING ; SCHWARTZBACH, CHRISTIAN</creator><creatorcontrib>LARSSON, FINN HILDING ; SCHWARTZBACH, CHRISTIAN</creatorcontrib><description>A gas distribution device for the supply of a processing gas to the atomizing zone around an atomizing device (1) arranged centrally in an atomizing chamber, said gas distribution device comprises a conical guide duct (10) communicating with a horizontal spiral supply duct (8) through an annular mouth (9). A uniform gas distribution with respect to flow direction and velocity is obtained by means of guide vanes (15, 16) arranged with a small annular spacing inthe mouth (9) and comprising two succeeding vein sets, in which the vanes (15) of one set are shaped to deflect the tangential gas stream in the spiral duct (8) to a flow direction, for which the radial velocity component considerably exceeds the tangential component, whereas each vane (16) of the other set positioned at the opening of the mouth towards the conical guide duct (10) projects into the space between neighbouring vanes (15) of the first set and extends substantially parallel to tangential planes to said vanes (15) at their internal edges.</description><language>eng</language><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ; ATOMISING APPARATUS ; BLASTING ; CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY ; DRYING ; DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ; FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOWOF GASES OR LIQUIDS ; FLUID-PRESSURE ACTUATORS ; HEATING ; HYDRAULICS OR PNEUMATICS IN GENERAL ; LIGHTING ; MECHANICAL ENGINEERING ; NOZZLES ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEPARATION ; SPRAYING APPARATUS ; SPRAYING OR ATOMISING IN GENERAL ; THEIR RELEVANT APPARATUS ; TRANSPORTING ; WEAPONS</subject><creationdate>1982</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19820120&DB=EPODOC&CC=EP&NR=0008524B1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19820120&DB=EPODOC&CC=EP&NR=0008524B1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LARSSON, FINN HILDING</creatorcontrib><creatorcontrib>SCHWARTZBACH, CHRISTIAN</creatorcontrib><title>A GAS DISTRIBUTION DEVICE FOR THE SUPPLY OF A PROCESSING GAS TO AN ATOMIZING CHAMBER</title><description>A gas distribution device for the supply of a processing gas to the atomizing zone around an atomizing device (1) arranged centrally in an atomizing chamber, said gas distribution device comprises a conical guide duct (10) communicating with a horizontal spiral supply duct (8) through an annular mouth (9). A uniform gas distribution with respect to flow direction and velocity is obtained by means of guide vanes (15, 16) arranged with a small annular spacing inthe mouth (9) and comprising two succeeding vein sets, in which the vanes (15) of one set are shaped to deflect the tangential gas stream in the spiral duct (8) to a flow direction, for which the radial velocity component considerably exceeds the tangential component, whereas each vane (16) of the other set positioned at the opening of the mouth towards the conical guide duct (10) projects into the space between neighbouring vanes (15) of the first set and extends substantially parallel to tangential planes to said vanes (15) at their internal edges.</description><subject>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</subject><subject>ATOMISING APPARATUS</subject><subject>BLASTING</subject><subject>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</subject><subject>DRYING</subject><subject>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</subject><subject>FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOWOF GASES OR LIQUIDS</subject><subject>FLUID-PRESSURE ACTUATORS</subject><subject>HEATING</subject><subject>HYDRAULICS OR PNEUMATICS IN GENERAL</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>NOZZLES</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEPARATION</subject><subject>SPRAYING APPARATUS</subject><subject>SPRAYING OR ATOMISING IN GENERAL</subject><subject>THEIR RELEVANT APPARATUS</subject><subject>TRANSPORTING</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1982</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi0sKwjAUALNxIeod3gWE-AO3L-lLE7BJSF4LuilF4kq0UO-PKB7A1cAwMxeMUGOGymVOTrXsgoeKOqcJTEjAliC3MZ7OEAwgxBQ05ex8_d04AHpADo27fJy22ChKSzG7DfeprH5cCDDE2q7L-OzLNA7X8iivnqKU8njY7tVm90fyBo_GLzA</recordid><startdate>19820120</startdate><enddate>19820120</enddate><creator>LARSSON, FINN HILDING</creator><creator>SCHWARTZBACH, CHRISTIAN</creator><scope>EVB</scope></search><sort><creationdate>19820120</creationdate><title>A GAS DISTRIBUTION DEVICE FOR THE SUPPLY OF A PROCESSING GAS TO AN ATOMIZING CHAMBER</title><author>LARSSON, FINN HILDING ; SCHWARTZBACH, CHRISTIAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_EP0008524B13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1982</creationdate><topic>APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL</topic><topic>ATOMISING APPARATUS</topic><topic>BLASTING</topic><topic>CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY</topic><topic>DRYING</topic><topic>DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM</topic><topic>FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOWOF GASES OR LIQUIDS</topic><topic>FLUID-PRESSURE ACTUATORS</topic><topic>HEATING</topic><topic>HYDRAULICS OR PNEUMATICS IN GENERAL</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>NOZZLES</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEPARATION</topic><topic>SPRAYING APPARATUS</topic><topic>SPRAYING OR ATOMISING IN GENERAL</topic><topic>THEIR RELEVANT APPARATUS</topic><topic>TRANSPORTING</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>LARSSON, FINN HILDING</creatorcontrib><creatorcontrib>SCHWARTZBACH, CHRISTIAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LARSSON, FINN HILDING</au><au>SCHWARTZBACH, CHRISTIAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>A GAS DISTRIBUTION DEVICE FOR THE SUPPLY OF A PROCESSING GAS TO AN ATOMIZING CHAMBER</title><date>1982-01-20</date><risdate>1982</risdate><abstract>A gas distribution device for the supply of a processing gas to the atomizing zone around an atomizing device (1) arranged centrally in an atomizing chamber, said gas distribution device comprises a conical guide duct (10) communicating with a horizontal spiral supply duct (8) through an annular mouth (9). A uniform gas distribution with respect to flow direction and velocity is obtained by means of guide vanes (15, 16) arranged with a small annular spacing inthe mouth (9) and comprising two succeeding vein sets, in which the vanes (15) of one set are shaped to deflect the tangential gas stream in the spiral duct (8) to a flow direction, for which the radial velocity component considerably exceeds the tangential component, whereas each vane (16) of the other set positioned at the opening of the mouth towards the conical guide duct (10) projects into the space between neighbouring vanes (15) of the first set and extends substantially parallel to tangential planes to said vanes (15) at their internal edges.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL ATOMISING APPARATUS BLASTING CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM FLUID DYNAMICS, i.e. METHODS OR MEANS FOR INFLUENCING THE FLOWOF GASES OR LIQUIDS FLUID-PRESSURE ACTUATORS HEATING HYDRAULICS OR PNEUMATICS IN GENERAL LIGHTING MECHANICAL ENGINEERING NOZZLES PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION SPRAYING APPARATUS SPRAYING OR ATOMISING IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING WEAPONS |
| title | A GAS DISTRIBUTION DEVICE FOR THE SUPPLY OF A PROCESSING GAS TO AN ATOMIZING CHAMBER |
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