Apparat til anbringelse af en tynd film af et materiale på et substrat og re-genereringsfremgangsmåde for et sådant apparat

The present invention concerns an apparatus for depositing a thin film of material on a substrate and a regeneration process. The apparatus comprises a chamber (1), a cryogenic panel (10) disposed inside the chamber, a sample holder (6) able to support a substrate, a gas injector (9) able to inject...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	CASSAGNE, VALERICK, CHAIX, CATHERINE, VILLETTE, JEROME
Format:	Patent
Sprache:	dan
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMISTRY CRYSTAL GROWTH METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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