Plamaverfahren zur Herstellung von Oberflächenschichten
The invention relates to a method for obtaining a surface layer on a substrate by means of a PACVD plasma generated with the aid of a gas, the substrate being connected to a bipolar voltage source which supplies periodic bipolar voltage pulses, characterized in that the absolute value of the amplitu...
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| creator | MENEVE, JAN DEKEMPENEER, ERIK SMEETS, JOS |
| description | The invention relates to a method for obtaining a surface layer on a substrate by means of a PACVD plasma generated with the aid of a gas, the substrate being connected to a bipolar voltage source which supplies periodic bipolar voltage pulses, characterized in that the absolute value of the amplitude of the voltage during the positive voltage pulse is smaller than the absolute value of the amplitude of the voltage during the negative voltage pulse. |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Plamaverfahren zur Herstellung von Oberflächenschichten |
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