Mustererzeugungsapparat unter Verwendung eines Lasers

A beam steering apparatus (502) for use in a laser pattern generation apparatus, having a steering mirror (602) for deflecting the radiant energy beam to a first point in space, a second steering mirror (604) for deflecting the radiant energy beam to a second point in space, and a position detection...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: ALLEN, PAUL C, JOLLEY, MATTHEW J, RIEGER, MICHAEL, TEITZEL, ROBIN L
Format: Patent
Sprache:ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator ALLEN, PAUL C
JOLLEY, MATTHEW J
RIEGER, MICHAEL
TEITZEL, ROBIN L
description A beam steering apparatus (502) for use in a laser pattern generation apparatus, having a steering mirror (602) for deflecting the radiant energy beam to a first point in space, a second steering mirror (604) for deflecting the radiant energy beam to a second point in space, and a position detection means (605-608) comprising a first beam splitting means (605) for creating an alignment beam from said radiant energy beam, a second beam splitting means (606) for creating a first positional beam and a second positional beam from said alignment beam, a first sensor (608) to detect the position of said radiant energy beam at said first point in space from said first positional beam, and a second sensor (607) to detect the position of said radiant energy beam at a second point in space from said second positional beam.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE69332314TT2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE69332314TT2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE69332314TT23</originalsourceid><addsrcrecordid>eNrjZDD1LS0uSS1KLapKLU0vzUsvTiwoSCxKLFEozQMKK4SlFpWn5qUAJRRSM_NSixV8EotTi4p5GFjTEnOKU3mhNDeDkptriLOHbmpBfnxqcUFicmpeakm8i6uZpbGxkbGhSUiIkTFRigBIoC7n</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Mustererzeugungsapparat unter Verwendung eines Lasers</title><source>esp@cenet</source><creator>ALLEN, PAUL C ; JOLLEY, MATTHEW J ; RIEGER, MICHAEL ; TEITZEL, ROBIN L</creator><creatorcontrib>ALLEN, PAUL C ; JOLLEY, MATTHEW J ; RIEGER, MICHAEL ; TEITZEL, ROBIN L</creatorcontrib><description>A beam steering apparatus (502) for use in a laser pattern generation apparatus, having a steering mirror (602) for deflecting the radiant energy beam to a first point in space, a second steering mirror (604) for deflecting the radiant energy beam to a second point in space, and a position detection means (605-608) comprising a first beam splitting means (605) for creating an alignment beam from said radiant energy beam, a second beam splitting means (606) for creating a first positional beam and a second positional beam from said alignment beam, a first sensor (608) to detect the position of said radiant energy beam at said first point in space from said first positional beam, and a second sensor (607) to detect the position of said radiant energy beam at a second point in space from said second positional beam.</description><edition>7</edition><language>ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; CLADDING OR PLATING BY SOLDERING OR WELDING ; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING ; ELECTRIC COMMUNICATION TECHNIQUE ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MACHINE TOOLS ; MATERIALS THEREFOR ; MEASURING ; MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE ; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR ; METAL-WORKING NOT OTHERWISE PROVIDED FOR ; OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS ; OPTICS ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PICTORIAL COMMUNICATION, e.g. TELEVISION ; SEMICONDUCTOR DEVICES ; SOLDERING OR UNSOLDERING ; TARIFF METERING APPARATUS ; TESTING ; TRANSPORTING ; WELDING ; WORKING BY LASER BEAM</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20030710&amp;DB=EPODOC&amp;CC=DE&amp;NR=69332314T2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20030710&amp;DB=EPODOC&amp;CC=DE&amp;NR=69332314T2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ALLEN, PAUL C</creatorcontrib><creatorcontrib>JOLLEY, MATTHEW J</creatorcontrib><creatorcontrib>RIEGER, MICHAEL</creatorcontrib><creatorcontrib>TEITZEL, ROBIN L</creatorcontrib><title>Mustererzeugungsapparat unter Verwendung eines Lasers</title><description>A beam steering apparatus (502) for use in a laser pattern generation apparatus, having a steering mirror (602) for deflecting the radiant energy beam to a first point in space, a second steering mirror (604) for deflecting the radiant energy beam to a second point in space, and a position detection means (605-608) comprising a first beam splitting means (605) for creating an alignment beam from said radiant energy beam, a second beam splitting means (606) for creating a first positional beam and a second positional beam from said alignment beam, a first sensor (608) to detect the position of said radiant energy beam at said first point in space from said first positional beam, and a second sensor (607) to detect the position of said radiant energy beam at a second point in space from said second positional beam.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>CLADDING OR PLATING BY SOLDERING OR WELDING</subject><subject>CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING</subject><subject>ELECTRIC COMMUNICATION TECHNIQUE</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MACHINE TOOLS</subject><subject>MATERIALS THEREFOR</subject><subject>MEASURING</subject><subject>MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE</subject><subject>MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR</subject><subject>METAL-WORKING NOT OTHERWISE PROVIDED FOR</subject><subject>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</subject><subject>OPTICS</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PICTORIAL COMMUNICATION, e.g. TELEVISION</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SOLDERING OR UNSOLDERING</subject><subject>TARIFF METERING APPARATUS</subject><subject>TESTING</subject><subject>TRANSPORTING</subject><subject>WELDING</subject><subject>WORKING BY LASER BEAM</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDD1LS0uSS1KLapKLU0vzUsvTiwoSCxKLFEozQMKK4SlFpWn5qUAJRRSM_NSixV8EotTi4p5GFjTEnOKU3mhNDeDkptriLOHbmpBfnxqcUFicmpeakm8i6uZpbGxkbGhSUiIkTFRigBIoC7n</recordid><startdate>20030710</startdate><enddate>20030710</enddate><creator>ALLEN, PAUL C</creator><creator>JOLLEY, MATTHEW J</creator><creator>RIEGER, MICHAEL</creator><creator>TEITZEL, ROBIN L</creator><scope>EVB</scope></search><sort><creationdate>20030710</creationdate><title>Mustererzeugungsapparat unter Verwendung eines Lasers</title><author>ALLEN, PAUL C ; JOLLEY, MATTHEW J ; RIEGER, MICHAEL ; TEITZEL, ROBIN L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE69332314TT23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>2003</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>CLADDING OR PLATING BY SOLDERING OR WELDING</topic><topic>CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING</topic><topic>ELECTRIC COMMUNICATION TECHNIQUE</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MACHINE TOOLS</topic><topic>MATERIALS THEREFOR</topic><topic>MEASURING</topic><topic>MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE</topic><topic>MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR</topic><topic>METAL-WORKING NOT OTHERWISE PROVIDED FOR</topic><topic>OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS</topic><topic>OPTICS</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PICTORIAL COMMUNICATION, e.g. TELEVISION</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SOLDERING OR UNSOLDERING</topic><topic>TARIFF METERING APPARATUS</topic><topic>TESTING</topic><topic>TRANSPORTING</topic><topic>WELDING</topic><topic>WORKING BY LASER BEAM</topic><toplevel>online_resources</toplevel><creatorcontrib>ALLEN, PAUL C</creatorcontrib><creatorcontrib>JOLLEY, MATTHEW J</creatorcontrib><creatorcontrib>RIEGER, MICHAEL</creatorcontrib><creatorcontrib>TEITZEL, ROBIN L</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ALLEN, PAUL C</au><au>JOLLEY, MATTHEW J</au><au>RIEGER, MICHAEL</au><au>TEITZEL, ROBIN L</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Mustererzeugungsapparat unter Verwendung eines Lasers</title><date>2003-07-10</date><risdate>2003</risdate><abstract>A beam steering apparatus (502) for use in a laser pattern generation apparatus, having a steering mirror (602) for deflecting the radiant energy beam to a first point in space, a second steering mirror (604) for deflecting the radiant energy beam to a second point in space, and a position detection means (605-608) comprising a first beam splitting means (605) for creating an alignment beam from said radiant energy beam, a second beam splitting means (606) for creating a first positional beam and a second positional beam from said alignment beam, a first sensor (608) to detect the position of said radiant energy beam at said first point in space from said first positional beam, and a second sensor (607) to detect the position of said radiant energy beam at a second point in space from said second positional beam.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language ger
recordid cdi_epo_espacenet_DE69332314TT2
source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVEREDIN A SINGLE OTHER SUBCLASS
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
CLADDING OR PLATING BY SOLDERING OR WELDING
CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING
ELECTRIC COMMUNICATION TECHNIQUE
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
HOLOGRAPHY
MACHINE TOOLS
MATERIALS THEREFOR
MEASURING
MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE
MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
METAL-WORKING NOT OTHERWISE PROVIDED FOR
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICS
ORIGINALS THEREFOR
PERFORMING OPERATIONS
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
PICTORIAL COMMUNICATION, e.g. TELEVISION
SEMICONDUCTOR DEVICES
SOLDERING OR UNSOLDERING
TARIFF METERING APPARATUS
TESTING
TRANSPORTING
WELDING
WORKING BY LASER BEAM
title Mustererzeugungsapparat unter Verwendung eines Lasers
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-16T11%3A51%3A32IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=ALLEN,%20PAUL%20C&rft.date=2003-07-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EDE69332314TT2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true