VERFAHREN UND VORRICHTUNG ZUR INTERFEROMETRISCHEN INSPEKTION EINER OBERFLÄCHE EINES OBJEKTES

This invention provides apparatus for and a method of interferometrically inspecting a surface of an object. The invention is particularly well suited for inspecting semiconductor devices in the sub-micron range. A two beam interference microscope (102) obtains an image of an object (100) which is m...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	MONTGOMERY, PAUL, CHRISTOPHER, F-34090 MONTPELLIER, FR, FILLARD, JEAN-PIERRE, F-34980 S.-GELY-DU-FESC, FR
Format:	Patent
Sprache:	ger
Schlagworte:	BASIC ELECTRIC ELEMENTS COLORIMETRY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT,POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRA-RED,VISIBLE OR ULTRA-VIOLET LIGHT MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS RADIATION PYROMETRY SEMICONDUCTOR DEVICES TESTING
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