Vorrichtung zur Bildung einer dünnen Schicht

A thin film forming apparatus which forms a thin film over the film forming surface of a substrate (6) by spraying a mist of a source solution produced by atomization over the film forming surface of the substrate (6) heated at a given temperature. The substrate conveying direction is reversible, or...

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Hauptverfasser: SHIBA, NOBUYASU, SEKIGUCHI, MIKIO, IMAI, MIZUHO, IIDA, HIDEYO
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creator SHIBA, NOBUYASU
SEKIGUCHI, MIKIO
IMAI, MIZUHO
IIDA, HIDEYO
description A thin film forming apparatus which forms a thin film over the film forming surface of a substrate (6) by spraying a mist of a source solution produced by atomization over the film forming surface of the substrate (6) heated at a given temperature. The substrate conveying direction is reversible, or a nozzle (3) for spouting the mist into a film forming chamber (4) and an exhaust duct (5) are connected removably to a hearth (7) forming the bottom wall of the film forming chamber (4) for relocation. The film forming apparatus is capable of forming thin films of different laminate constructions.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE69013444TT2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE69013444TT2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE69013444TT23</originalsourceid><addsrcrecordid>eNrjZNANyy8qykzOKCnNS1eoKi1ScMrMSQGxUzPzUosUUg7vyctLzVMITs4AKeJhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfEurmaWBobGJiYmISFGxkQpAgBwuSui</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Vorrichtung zur Bildung einer dünnen Schicht</title><source>esp@cenet</source><creator>SHIBA, NOBUYASU ; SEKIGUCHI, MIKIO ; IMAI, MIZUHO ; IIDA, HIDEYO</creator><creatorcontrib>SHIBA, NOBUYASU ; SEKIGUCHI, MIKIO ; IMAI, MIZUHO ; IIDA, HIDEYO</creatorcontrib><description>A thin film forming apparatus which forms a thin film over the film forming surface of a substrate (6) by spraying a mist of a source solution produced by atomization over the film forming surface of the substrate (6) heated at a given temperature. The substrate conveying direction is reversible, or a nozzle (3) for spouting the mist into a film forming chamber (4) and an exhaust duct (5) are connected removably to a hearth (7) forming the bottom wall of the film forming chamber (4) for relocation. The film forming apparatus is capable of forming thin films of different laminate constructions.</description><edition>6</edition><language>ger</language><subject>BASIC ELECTRIC ELEMENTS ; CABLES ; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; CONDUCTORS ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; GLASS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INSULATORS ; JOINING GLASS TO GLASS OR OTHER MATERIALS ; METALLURGY ; MINERAL OR SLAG WOOL ; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS ; SURFACE TREATMENT OF GLASS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1995</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19950223&amp;DB=EPODOC&amp;CC=DE&amp;NR=69013444T2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19950223&amp;DB=EPODOC&amp;CC=DE&amp;NR=69013444T2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHIBA, NOBUYASU</creatorcontrib><creatorcontrib>SEKIGUCHI, MIKIO</creatorcontrib><creatorcontrib>IMAI, MIZUHO</creatorcontrib><creatorcontrib>IIDA, HIDEYO</creatorcontrib><title>Vorrichtung zur Bildung einer dünnen Schicht</title><description>A thin film forming apparatus which forms a thin film over the film forming surface of a substrate (6) by spraying a mist of a source solution produced by atomization over the film forming surface of the substrate (6) heated at a given temperature. The substrate conveying direction is reversible, or a nozzle (3) for spouting the mist into a film forming chamber (4) and an exhaust duct (5) are connected removably to a hearth (7) forming the bottom wall of the film forming chamber (4) for relocation. The film forming apparatus is capable of forming thin films of different laminate constructions.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CABLES</subject><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>CONDUCTORS</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>GLASS</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INSULATORS</subject><subject>JOINING GLASS TO GLASS OR OTHER MATERIALS</subject><subject>METALLURGY</subject><subject>MINERAL OR SLAG WOOL</subject><subject>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</subject><subject>SURFACE TREATMENT OF GLASS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1995</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNANyy8qykzOKCnNS1eoKi1ScMrMSQGxUzPzUosUUg7vyctLzVMITs4AKeJhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfEurmaWBobGJiYmISFGxkQpAgBwuSui</recordid><startdate>19950223</startdate><enddate>19950223</enddate><creator>SHIBA, NOBUYASU</creator><creator>SEKIGUCHI, MIKIO</creator><creator>IMAI, MIZUHO</creator><creator>IIDA, HIDEYO</creator><scope>EVB</scope></search><sort><creationdate>19950223</creationdate><title>Vorrichtung zur Bildung einer dünnen Schicht</title><author>SHIBA, NOBUYASU ; SEKIGUCHI, MIKIO ; IMAI, MIZUHO ; IIDA, HIDEYO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE69013444TT23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>1995</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CABLES</topic><topic>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>CONDUCTORS</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>GLASS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INSULATORS</topic><topic>JOINING GLASS TO GLASS OR OTHER MATERIALS</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><topic>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</topic><topic>SURFACE TREATMENT OF GLASS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SHIBA, NOBUYASU</creatorcontrib><creatorcontrib>SEKIGUCHI, MIKIO</creatorcontrib><creatorcontrib>IMAI, MIZUHO</creatorcontrib><creatorcontrib>IIDA, HIDEYO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SHIBA, NOBUYASU</au><au>SEKIGUCHI, MIKIO</au><au>IMAI, MIZUHO</au><au>IIDA, HIDEYO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Vorrichtung zur Bildung einer dünnen Schicht</title><date>1995-02-23</date><risdate>1995</risdate><abstract>A thin film forming apparatus which forms a thin film over the film forming surface of a substrate (6) by spraying a mist of a source solution produced by atomization over the film forming surface of the substrate (6) heated at a given temperature. The substrate conveying direction is reversible, or a nozzle (3) for spouting the mist into a film forming chamber (4) and an exhaust duct (5) are connected removably to a hearth (7) forming the bottom wall of the film forming chamber (4) for relocation. The film forming apparatus is capable of forming thin films of different laminate constructions.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
CABLES
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMICAL SURFACE TREATMENT
CHEMISTRY
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
COATING MATERIAL WITH METALLIC MATERIAL
COATING METALLIC MATERIAL
CONDUCTORS
DIFFUSION TREATMENT OF METALLIC MATERIAL
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
GLASS
INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL
INSULATORS
JOINING GLASS TO GLASS OR OTHER MATERIALS
METALLURGY
MINERAL OR SLAG WOOL
SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
title Vorrichtung zur Bildung einer dünnen Schicht
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-28T17%3A36%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SHIBA,%20NOBUYASU&rft.date=1995-02-23&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EDE69013444TT2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true