Vorrichtung zur Bildung einer dünnen Schicht
A thin film forming apparatus which forms a thin film over the film forming surface of a substrate (6) by spraying a mist of a source solution produced by atomization over the film forming surface of the substrate (6) heated at a given temperature. The substrate conveying direction is reversible, or...
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creator | SHIBA, NOBUYASU SEKIGUCHI, MIKIO IMAI, MIZUHO IIDA, HIDEYO |
description | A thin film forming apparatus which forms a thin film over the film forming surface of a substrate (6) by spraying a mist of a source solution produced by atomization over the film forming surface of the substrate (6) heated at a given temperature. The substrate conveying direction is reversible, or a nozzle (3) for spouting the mist into a film forming chamber (4) and an exhaust duct (5) are connected removably to a hearth (7) forming the bottom wall of the film forming chamber (4) for relocation. The film forming apparatus is capable of forming thin films of different laminate constructions. |
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The substrate conveying direction is reversible, or a nozzle (3) for spouting the mist into a film forming chamber (4) and an exhaust duct (5) are connected removably to a hearth (7) forming the bottom wall of the film forming chamber (4) for relocation. The film forming apparatus is capable of forming thin films of different laminate constructions.</description><edition>6</edition><language>ger</language><subject>BASIC ELECTRIC ELEMENTS ; CABLES ; CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; CONDUCTORS ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; GLASS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INSULATORS ; JOINING GLASS TO GLASS OR OTHER MATERIALS ; METALLURGY ; MINERAL OR SLAG WOOL ; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS ; SURFACE TREATMENT OF GLASS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1995</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19950223&DB=EPODOC&CC=DE&NR=69013444T2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19950223&DB=EPODOC&CC=DE&NR=69013444T2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SHIBA, NOBUYASU</creatorcontrib><creatorcontrib>SEKIGUCHI, MIKIO</creatorcontrib><creatorcontrib>IMAI, MIZUHO</creatorcontrib><creatorcontrib>IIDA, HIDEYO</creatorcontrib><title>Vorrichtung zur Bildung einer dünnen Schicht</title><description>A thin film forming apparatus which forms a thin film over the film forming surface of a substrate (6) by spraying a mist of a source solution produced by atomization over the film forming surface of the substrate (6) heated at a given temperature. The substrate conveying direction is reversible, or a nozzle (3) for spouting the mist into a film forming chamber (4) and an exhaust duct (5) are connected removably to a hearth (7) forming the bottom wall of the film forming chamber (4) for relocation. 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The substrate conveying direction is reversible, or a nozzle (3) for spouting the mist into a film forming chamber (4) and an exhaust duct (5) are connected removably to a hearth (7) forming the bottom wall of the film forming chamber (4) for relocation. The film forming apparatus is capable of forming thin films of different laminate constructions.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record> |
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language | ger |
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subjects | BASIC ELECTRIC ELEMENTS CABLES CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONDUCTORS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INSULATORS JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SEMICONDUCTOR DEVICES SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Vorrichtung zur Bildung einer dünnen Schicht |
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