Vorrichtung für RF-Plasma-Verarbeitung
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| creator | SCHMIDT, HOWARD WILLIAM, JR., GILROY CALIFORNIA 95020, US WARD, ERNEST SPENCER, SAN JOSE CALIFORNIA 95131, US HENDRIX, HOWARD ALLAN, MORGAN HILL CALIFORNIA 95037, US |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE68909262TT2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE68909262TT2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE68909262TT23</originalsourceid><addsrcrecordid>eNrjZFAPyy8qykzOKCnNS1dIO7ynSCHITTcgJ7E4N1E3LLUosSgpNRMkx8PAmpaYU5zKC6W5GZTcXEOcPXRTC_LjU4sLEpNT81JL4l1czSwsDSyNzIxCQoyMiVIEADpaKVY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Vorrichtung für RF-Plasma-Verarbeitung</title><source>esp@cenet</source><creator>SCHMIDT, HOWARD WILLIAM, JR., GILROY CALIFORNIA 95020, US ; WARD, ERNEST SPENCER, SAN JOSE CALIFORNIA 95131, US ; HENDRIX, HOWARD ALLAN, MORGAN HILL CALIFORNIA 95037, US</creator><creatorcontrib>SCHMIDT, HOWARD WILLIAM, JR., GILROY CALIFORNIA 95020, US ; WARD, ERNEST SPENCER, SAN JOSE CALIFORNIA 95131, US ; HENDRIX, HOWARD ALLAN, MORGAN HILL CALIFORNIA 95037, US</creatorcontrib><edition>5</edition><language>ger</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>1994</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19940421&DB=EPODOC&CC=DE&NR=68909262T2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19940421&DB=EPODOC&CC=DE&NR=68909262T2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHMIDT, HOWARD WILLIAM, JR., GILROY CALIFORNIA 95020, US</creatorcontrib><creatorcontrib>WARD, ERNEST SPENCER, SAN JOSE CALIFORNIA 95131, US</creatorcontrib><creatorcontrib>HENDRIX, HOWARD ALLAN, MORGAN HILL CALIFORNIA 95037, US</creatorcontrib><title>Vorrichtung für RF-Plasma-Verarbeitung</title><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1994</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFAPyy8qykzOKCnNS1dIO7ynSCHITTcgJ7E4N1E3LLUosSgpNRMkx8PAmpaYU5zKC6W5GZTcXEOcPXRTC_LjU4sLEpNT81JL4l1czSwsDSyNzIxCQoyMiVIEADpaKVY</recordid><startdate>19940421</startdate><enddate>19940421</enddate><creator>SCHMIDT, HOWARD WILLIAM, JR., GILROY CALIFORNIA 95020, US</creator><creator>WARD, ERNEST SPENCER, SAN JOSE CALIFORNIA 95131, US</creator><creator>HENDRIX, HOWARD ALLAN, MORGAN HILL CALIFORNIA 95037, US</creator><scope>EVB</scope></search><sort><creationdate>19940421</creationdate><title>Vorrichtung für RF-Plasma-Verarbeitung</title><author>SCHMIDT, HOWARD WILLIAM, JR., GILROY CALIFORNIA 95020, US ; WARD, ERNEST SPENCER, SAN JOSE CALIFORNIA 95131, US ; HENDRIX, HOWARD ALLAN, MORGAN HILL CALIFORNIA 95037, US</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE68909262TT23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>1994</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHMIDT, HOWARD WILLIAM, JR., GILROY CALIFORNIA 95020, US</creatorcontrib><creatorcontrib>WARD, ERNEST SPENCER, SAN JOSE CALIFORNIA 95131, US</creatorcontrib><creatorcontrib>HENDRIX, HOWARD ALLAN, MORGAN HILL CALIFORNIA 95037, US</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHMIDT, HOWARD WILLIAM, JR., GILROY CALIFORNIA 95020, US</au><au>WARD, ERNEST SPENCER, SAN JOSE CALIFORNIA 95131, US</au><au>HENDRIX, HOWARD ALLAN, MORGAN HILL CALIFORNIA 95037, US</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Vorrichtung für RF-Plasma-Verarbeitung</title><date>1994-04-21</date><risdate>1994</risdate><edition>5</edition><oa>free_for_read</oa></addata></record> |
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| language | ger |
| recordid | cdi_epo_espacenet_DE68909262TT2 |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Vorrichtung für RF-Plasma-Verarbeitung |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-03T07%3A45%3A04IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SCHMIDT,%20HOWARD%20WILLIAM,%20JR.,%20GILROY%20CALIFORNIA%2095020,%20US&rft.date=1994-04-21&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EDE68909262TT2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |