Verfahren zur Messung der stofflichen Zusammensetzung des Dampfes einer Schmelze im Vakuum
The invention concerns a method for the continuous measurement of the composition of the vapour over a melt under vacuum, in particular in electron-beam fusion and electron-beam evaporation processes. Prior art methods, such as the analysis of melt samples, monitoring by means of X-rays and the use...
Gespeichert in:
Hauptverfasser: | , , , , |
---|---|
Format: | Patent |
Sprache: | ger |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | SCHILLER, SIEGFRIED, DR., O-8051 DRESDEN, DE KIRCHHOFF, VOLKER, O-8051 DRESDEN, DE SCHILLER, NICOLAS, O-8351 HELMSDORF, DE GOEDICKE, KLAUS, O-8019 DRESDEN, DE NEDON, WOLFGANG, O-8060 DRESDEN, DE |
description | The invention concerns a method for the continuous measurement of the composition of the vapour over a melt under vacuum, in particular in electron-beam fusion and electron-beam evaporation processes. Prior art methods, such as the analysis of melt samples, monitoring by means of X-rays and the use of the optical emission spectrum, do not give sufficiently accurate results. The aim of the invention is to make continuous measurement possible using axial electron guns. This is achieved by setting the ratio between the pressure of the vapour over the melt and the beam-acceleration voltage at a value such that at least 3 % of the beam energy is absorbed by the vapour. At the same time, the intensity of at least one characteristic line in the emission spectrum of a component of the melt is measured. One or more operating parameters of the electron gun are then adjusted so that the intensity of this emission line remains constant. |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE4304612A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE4304612A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE4304612A13</originalsourceid><addsrcrecordid>eNqNyrEOgjAURuEuDkZ9h_sCJiLE3QjGxUnDwEJu6l_aSAvppQtPL4k-gNMZvrNWTY1o2EYEmlOkO0RS6OiFSDINxvRO28WaJOw9gmCavy5Ush_NUriw3A9tPfoZ5DzV_E7Jb9XKcC_Y_bpRdK2el9se49BCRtYImNqyKvJDccqO5yz_Y_kA30U6xg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Verfahren zur Messung der stofflichen Zusammensetzung des Dampfes einer Schmelze im Vakuum</title><source>esp@cenet</source><creator>SCHILLER, SIEGFRIED, DR., O-8051 DRESDEN, DE ; KIRCHHOFF, VOLKER, O-8051 DRESDEN, DE ; SCHILLER, NICOLAS, O-8351 HELMSDORF, DE ; GOEDICKE, KLAUS, O-8019 DRESDEN, DE ; NEDON, WOLFGANG, O-8060 DRESDEN, DE</creator><creatorcontrib>SCHILLER, SIEGFRIED, DR., O-8051 DRESDEN, DE ; KIRCHHOFF, VOLKER, O-8051 DRESDEN, DE ; SCHILLER, NICOLAS, O-8351 HELMSDORF, DE ; GOEDICKE, KLAUS, O-8019 DRESDEN, DE ; NEDON, WOLFGANG, O-8060 DRESDEN, DE</creatorcontrib><description>The invention concerns a method for the continuous measurement of the composition of the vapour over a melt under vacuum, in particular in electron-beam fusion and electron-beam evaporation processes. Prior art methods, such as the analysis of melt samples, monitoring by means of X-rays and the use of the optical emission spectrum, do not give sufficiently accurate results. The aim of the invention is to make continuous measurement possible using axial electron guns. This is achieved by setting the ratio between the pressure of the vapour over the melt and the beam-acceleration voltage at a value such that at least 3 % of the beam energy is absorbed by the vapour. At the same time, the intensity of at least one characteristic line in the emission spectrum of a component of the melt is measured. One or more operating parameters of the electron gun are then adjusted so that the intensity of this emission line remains constant.</description><edition>5</edition><language>ger</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; METALLURGY ; PHYSICS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TESTING</subject><creationdate>1994</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19940818&DB=EPODOC&CC=DE&NR=4304612A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19940818&DB=EPODOC&CC=DE&NR=4304612A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHILLER, SIEGFRIED, DR., O-8051 DRESDEN, DE</creatorcontrib><creatorcontrib>KIRCHHOFF, VOLKER, O-8051 DRESDEN, DE</creatorcontrib><creatorcontrib>SCHILLER, NICOLAS, O-8351 HELMSDORF, DE</creatorcontrib><creatorcontrib>GOEDICKE, KLAUS, O-8019 DRESDEN, DE</creatorcontrib><creatorcontrib>NEDON, WOLFGANG, O-8060 DRESDEN, DE</creatorcontrib><title>Verfahren zur Messung der stofflichen Zusammensetzung des Dampfes einer Schmelze im Vakuum</title><description>The invention concerns a method for the continuous measurement of the composition of the vapour over a melt under vacuum, in particular in electron-beam fusion and electron-beam evaporation processes. Prior art methods, such as the analysis of melt samples, monitoring by means of X-rays and the use of the optical emission spectrum, do not give sufficiently accurate results. The aim of the invention is to make continuous measurement possible using axial electron guns. This is achieved by setting the ratio between the pressure of the vapour over the melt and the beam-acceleration voltage at a value such that at least 3 % of the beam energy is absorbed by the vapour. At the same time, the intensity of at least one characteristic line in the emission spectrum of a component of the melt is measured. One or more operating parameters of the electron gun are then adjusted so that the intensity of this emission line remains constant.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</subject><subject>MEASURING</subject><subject>METALLURGY</subject><subject>PHYSICS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TESTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1994</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEOgjAURuEuDkZ9h_sCJiLE3QjGxUnDwEJu6l_aSAvppQtPL4k-gNMZvrNWTY1o2EYEmlOkO0RS6OiFSDINxvRO28WaJOw9gmCavy5Ush_NUriw3A9tPfoZ5DzV_E7Jb9XKcC_Y_bpRdK2el9se49BCRtYImNqyKvJDccqO5yz_Y_kA30U6xg</recordid><startdate>19940818</startdate><enddate>19940818</enddate><creator>SCHILLER, SIEGFRIED, DR., O-8051 DRESDEN, DE</creator><creator>KIRCHHOFF, VOLKER, O-8051 DRESDEN, DE</creator><creator>SCHILLER, NICOLAS, O-8351 HELMSDORF, DE</creator><creator>GOEDICKE, KLAUS, O-8019 DRESDEN, DE</creator><creator>NEDON, WOLFGANG, O-8060 DRESDEN, DE</creator><scope>EVB</scope></search><sort><creationdate>19940818</creationdate><title>Verfahren zur Messung der stofflichen Zusammensetzung des Dampfes einer Schmelze im Vakuum</title><author>SCHILLER, SIEGFRIED, DR., O-8051 DRESDEN, DE ; KIRCHHOFF, VOLKER, O-8051 DRESDEN, DE ; SCHILLER, NICOLAS, O-8351 HELMSDORF, DE ; GOEDICKE, KLAUS, O-8019 DRESDEN, DE ; NEDON, WOLFGANG, O-8060 DRESDEN, DE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE4304612A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>1994</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>METALLURGY</topic><topic>PHYSICS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHILLER, SIEGFRIED, DR., O-8051 DRESDEN, DE</creatorcontrib><creatorcontrib>KIRCHHOFF, VOLKER, O-8051 DRESDEN, DE</creatorcontrib><creatorcontrib>SCHILLER, NICOLAS, O-8351 HELMSDORF, DE</creatorcontrib><creatorcontrib>GOEDICKE, KLAUS, O-8019 DRESDEN, DE</creatorcontrib><creatorcontrib>NEDON, WOLFGANG, O-8060 DRESDEN, DE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHILLER, SIEGFRIED, DR., O-8051 DRESDEN, DE</au><au>KIRCHHOFF, VOLKER, O-8051 DRESDEN, DE</au><au>SCHILLER, NICOLAS, O-8351 HELMSDORF, DE</au><au>GOEDICKE, KLAUS, O-8019 DRESDEN, DE</au><au>NEDON, WOLFGANG, O-8060 DRESDEN, DE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Verfahren zur Messung der stofflichen Zusammensetzung des Dampfes einer Schmelze im Vakuum</title><date>1994-08-18</date><risdate>1994</risdate><abstract>The invention concerns a method for the continuous measurement of the composition of the vapour over a melt under vacuum, in particular in electron-beam fusion and electron-beam evaporation processes. Prior art methods, such as the analysis of melt samples, monitoring by means of X-rays and the use of the optical emission spectrum, do not give sufficiently accurate results. The aim of the invention is to make continuous measurement possible using axial electron guns. This is achieved by setting the ratio between the pressure of the vapour over the melt and the beam-acceleration voltage at a value such that at least 3 % of the beam energy is absorbed by the vapour. At the same time, the intensity of at least one characteristic line in the emission spectrum of a component of the melt is measured. One or more operating parameters of the electron gun are then adjusted so that the intensity of this emission line remains constant.</abstract><edition>5</edition><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | ger |
recordid | cdi_epo_espacenet_DE4304612A1 |
source | esp@cenet |
subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING METALLURGY PHYSICS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TESTING |
title | Verfahren zur Messung der stofflichen Zusammensetzung des Dampfes einer Schmelze im Vakuum |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-10T12%3A37%3A32IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SCHILLER,%20SIEGFRIED,%20DR.,%20O-8051%20DRESDEN,%20DE&rft.date=1994-08-18&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EDE4304612A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |