Radiation source esp. for radiation-induced etching and CVD installations - comprises adjustable spectrum obtd. by system parameter variation

The radiation source is used, in partic., for radiation-induced etching and CVD installations comprising a dielectric container for gas or gas mixt. (7), a vacuum process chamber (1), a device (10) for microwave application, and magnets (12) surrounding the container sidewall and producing a toroida...

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Bibliographische Detailangaben

Hauptverfasser:	GEGENWART, RAINER., 6074 ROEDERMARK, DE, KATZSCHNER, WERNER., 8752 KLEINKAHL, DE
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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