POSITIV ARBEITENDES STRAHLUNGSEMPFINDLICHES GEMISCH UND VERFAHREN ZUR HERSTELLUNG VON RELIEFMUSTERN
Gespeichert in:
| Hauptverfasser: | , , , , |
|---|---|
| Format: | Patent |
| Sprache: | ger |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | SCHWALM, REINHOLD., 6706 WACHENHEIM, DE FUNHOFF, DIRK., 6900 HEIDELBERG, DE FUNHOFF, ANGELIKA., 6900 HEIDELBERG, DE BINDER, HORST, 6840 LAMPERTHEIM, DE ROSER, JOACHIM., 6800 MANNHEIM, DE |
| description | |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE4121199A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE4121199A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE4121199A13</originalsourceid><addsrcrecordid>eNqNi7EKwjAQQLs4iPoP9wMOUZeOsbk0B-m1XJIOLqWUOIkW6v9jBT_A6cHjvW0xdW2gSD1ouSJFZIMBQhTtfOI6YNNZYuOpcquvsaFQOUhsoEex2gky3JKAQwkR_feBvmUQ9IS2SasU3heb-_hY8uHHXQEWY-WOeX4NeZnHKT_zezB4USelylKr8x_JBzXbNLg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>POSITIV ARBEITENDES STRAHLUNGSEMPFINDLICHES GEMISCH UND VERFAHREN ZUR HERSTELLUNG VON RELIEFMUSTERN</title><source>esp@cenet</source><creator>SCHWALM, REINHOLD., 6706 WACHENHEIM, DE ; FUNHOFF, DIRK., 6900 HEIDELBERG, DE ; FUNHOFF, ANGELIKA., 6900 HEIDELBERG, DE ; BINDER, HORST, 6840 LAMPERTHEIM, DE ; ROSER, JOACHIM., 6800 MANNHEIM, DE</creator><creatorcontrib>SCHWALM, REINHOLD., 6706 WACHENHEIM, DE ; FUNHOFF, DIRK., 6900 HEIDELBERG, DE ; FUNHOFF, ANGELIKA., 6900 HEIDELBERG, DE ; BINDER, HORST, 6840 LAMPERTHEIM, DE ; ROSER, JOACHIM., 6800 MANNHEIM, DE</creatorcontrib><language>ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>1993</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930107&DB=EPODOC&CC=DE&NR=4121199A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19930107&DB=EPODOC&CC=DE&NR=4121199A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SCHWALM, REINHOLD., 6706 WACHENHEIM, DE</creatorcontrib><creatorcontrib>FUNHOFF, DIRK., 6900 HEIDELBERG, DE</creatorcontrib><creatorcontrib>FUNHOFF, ANGELIKA., 6900 HEIDELBERG, DE</creatorcontrib><creatorcontrib>BINDER, HORST, 6840 LAMPERTHEIM, DE</creatorcontrib><creatorcontrib>ROSER, JOACHIM., 6800 MANNHEIM, DE</creatorcontrib><title>POSITIV ARBEITENDES STRAHLUNGSEMPFINDLICHES GEMISCH UND VERFAHREN ZUR HERSTELLUNG VON RELIEFMUSTERN</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1993</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNi7EKwjAQQLs4iPoP9wMOUZeOsbk0B-m1XJIOLqWUOIkW6v9jBT_A6cHjvW0xdW2gSD1ouSJFZIMBQhTtfOI6YNNZYuOpcquvsaFQOUhsoEex2gky3JKAQwkR_feBvmUQ9IS2SasU3heb-_hY8uHHXQEWY-WOeX4NeZnHKT_zezB4USelylKr8x_JBzXbNLg</recordid><startdate>19930107</startdate><enddate>19930107</enddate><creator>SCHWALM, REINHOLD., 6706 WACHENHEIM, DE</creator><creator>FUNHOFF, DIRK., 6900 HEIDELBERG, DE</creator><creator>FUNHOFF, ANGELIKA., 6900 HEIDELBERG, DE</creator><creator>BINDER, HORST, 6840 LAMPERTHEIM, DE</creator><creator>ROSER, JOACHIM., 6800 MANNHEIM, DE</creator><scope>EVB</scope></search><sort><creationdate>19930107</creationdate><title>POSITIV ARBEITENDES STRAHLUNGSEMPFINDLICHES GEMISCH UND VERFAHREN ZUR HERSTELLUNG VON RELIEFMUSTERN</title><author>SCHWALM, REINHOLD., 6706 WACHENHEIM, DE ; FUNHOFF, DIRK., 6900 HEIDELBERG, DE ; FUNHOFF, ANGELIKA., 6900 HEIDELBERG, DE ; BINDER, HORST, 6840 LAMPERTHEIM, DE ; ROSER, JOACHIM., 6800 MANNHEIM, DE</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE4121199A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>1993</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>SCHWALM, REINHOLD., 6706 WACHENHEIM, DE</creatorcontrib><creatorcontrib>FUNHOFF, DIRK., 6900 HEIDELBERG, DE</creatorcontrib><creatorcontrib>FUNHOFF, ANGELIKA., 6900 HEIDELBERG, DE</creatorcontrib><creatorcontrib>BINDER, HORST, 6840 LAMPERTHEIM, DE</creatorcontrib><creatorcontrib>ROSER, JOACHIM., 6800 MANNHEIM, DE</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SCHWALM, REINHOLD., 6706 WACHENHEIM, DE</au><au>FUNHOFF, DIRK., 6900 HEIDELBERG, DE</au><au>FUNHOFF, ANGELIKA., 6900 HEIDELBERG, DE</au><au>BINDER, HORST, 6840 LAMPERTHEIM, DE</au><au>ROSER, JOACHIM., 6800 MANNHEIM, DE</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POSITIV ARBEITENDES STRAHLUNGSEMPFINDLICHES GEMISCH UND VERFAHREN ZUR HERSTELLUNG VON RELIEFMUSTERN</title><date>1993-01-07</date><risdate>1993</risdate><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | ger |
| recordid | cdi_epo_espacenet_DE4121199A1 |
| source | esp@cenet |
| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | POSITIV ARBEITENDES STRAHLUNGSEMPFINDLICHES GEMISCH UND VERFAHREN ZUR HERSTELLUNG VON RELIEFMUSTERN |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-03T08%3A55%3A41IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=SCHWALM,%20REINHOLD.,%206706%20WACHENHEIM,%20DE&rft.date=1993-01-07&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EDE4121199A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |