CEPHEMVERBINDUNGEN UND VERFAHREN ZU IHRER HERSTELLUNG

1. A compound of the formula: wherein R is lower alkyl, lower alkanoyl, aryl, ar(lower)alkyl or a heterocyclic group, each of which may have suitable substituent(s), R is carboxy or protected carboxy, R is hydrogen, halogen, hydroxy, lower alkoxy, acyloxy, lower alkylthio, lower alkenyl, lower alken...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: TOZUKA, ZENZABURO, TOYONAKA-SHI OSAKA 565, JP, YASUDA, NOBUYOSHI, NISHINOMIYA-SHI HYOGO 662, JP, TAKAYA, TAKAO, KAWANISHI-SHI HYOGO 666-01, JP, NISHIMURA, SHINTARO, SETTSU-SHI OSAKA 566, JP
Format: Patent
Sprache:ger
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator TOZUKA, ZENZABURO, TOYONAKA-SHI OSAKA 565, JP
YASUDA, NOBUYOSHI, NISHINOMIYA-SHI HYOGO 662, JP
TAKAYA, TAKAO, KAWANISHI-SHI HYOGO 666-01, JP
NISHIMURA, SHINTARO, SETTSU-SHI OSAKA 566, JP
description 1. A compound of the formula: wherein R is lower alkyl, lower alkanoyl, aryl, ar(lower)alkyl or a heterocyclic group, each of which may have suitable substituent(s), R is carboxy or protected carboxy, R is hydrogen, halogen, hydroxy, lower alkoxy, acyloxy, lower alkylthio, lower alkenyl, lower alkenylthio, lower alkynyl, heterocyclicthio or a heterocyclic group, in which lower alkylthio, lower alkenyl, lower alkenylthio, heterocylicthio and a heterocyclic group may have suitable substituent(s), R and R are each hydrogen, halogen or arylthio, A is lower alkylene, and n is an integer of 0 or 1, and a pharmaceutically acceptable salt thereof, processes for preparation thereof and pharmaceutical composition comprising the same.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE3686979TT2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE3686979TT2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE3686979TT23</originalsourceid><addsrcrecordid>eNrjZDB1dg3wcPUNcw1y8vRzCfVzd_VTCPVzUQAKuDl6BAF5UaEKnkBGkIKHa1BwiKuPD1ARDwNrWmJOcSovlOZmUHRzDXH20E0tyI9PLS5ITE7NSy2Jd3E1NrMwszS3DAkxMiZGDQAb7Sh1</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>CEPHEMVERBINDUNGEN UND VERFAHREN ZU IHRER HERSTELLUNG</title><source>esp@cenet</source><creator>TOZUKA, ZENZABURO, TOYONAKA-SHI OSAKA 565, JP ; YASUDA, NOBUYOSHI, NISHINOMIYA-SHI HYOGO 662, JP ; TAKAYA, TAKAO, KAWANISHI-SHI HYOGO 666-01, JP ; NISHIMURA, SHINTARO, SETTSU-SHI OSAKA 566, JP</creator><creatorcontrib>TOZUKA, ZENZABURO, TOYONAKA-SHI OSAKA 565, JP ; YASUDA, NOBUYOSHI, NISHINOMIYA-SHI HYOGO 662, JP ; TAKAYA, TAKAO, KAWANISHI-SHI HYOGO 666-01, JP ; NISHIMURA, SHINTARO, SETTSU-SHI OSAKA 566, JP</creatorcontrib><description>1. A compound of the formula: wherein R is lower alkyl, lower alkanoyl, aryl, ar(lower)alkyl or a heterocyclic group, each of which may have suitable substituent(s), R is carboxy or protected carboxy, R is hydrogen, halogen, hydroxy, lower alkoxy, acyloxy, lower alkylthio, lower alkenyl, lower alkenylthio, lower alkynyl, heterocyclicthio or a heterocyclic group, in which lower alkylthio, lower alkenyl, lower alkenylthio, heterocylicthio and a heterocyclic group may have suitable substituent(s), R and R are each hydrogen, halogen or arylthio, A is lower alkylene, and n is an integer of 0 or 1, and a pharmaceutically acceptable salt thereof, processes for preparation thereof and pharmaceutical composition comprising the same.</description><edition>5</edition><language>ger</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; CHEMISTRY ; HETEROCYCLIC COMPOUNDS ; HUMAN NECESSITIES ; HYGIENE ; MEDICAL OR VETERINARY SCIENCE ; METALLURGY ; ORGANIC CHEMISTRY ; PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES ; SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS ORMEDICINAL PREPARATIONS</subject><creationdate>1993</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19930311&amp;DB=EPODOC&amp;CC=DE&amp;NR=3686979T2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=19930311&amp;DB=EPODOC&amp;CC=DE&amp;NR=3686979T2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TOZUKA, ZENZABURO, TOYONAKA-SHI OSAKA 565, JP</creatorcontrib><creatorcontrib>YASUDA, NOBUYOSHI, NISHINOMIYA-SHI HYOGO 662, JP</creatorcontrib><creatorcontrib>TAKAYA, TAKAO, KAWANISHI-SHI HYOGO 666-01, JP</creatorcontrib><creatorcontrib>NISHIMURA, SHINTARO, SETTSU-SHI OSAKA 566, JP</creatorcontrib><title>CEPHEMVERBINDUNGEN UND VERFAHREN ZU IHRER HERSTELLUNG</title><description>1. A compound of the formula: wherein R is lower alkyl, lower alkanoyl, aryl, ar(lower)alkyl or a heterocyclic group, each of which may have suitable substituent(s), R is carboxy or protected carboxy, R is hydrogen, halogen, hydroxy, lower alkoxy, acyloxy, lower alkylthio, lower alkenyl, lower alkenylthio, lower alkynyl, heterocyclicthio or a heterocyclic group, in which lower alkylthio, lower alkenyl, lower alkenylthio, heterocylicthio and a heterocyclic group may have suitable substituent(s), R and R are each hydrogen, halogen or arylthio, A is lower alkylene, and n is an integer of 0 or 1, and a pharmaceutically acceptable salt thereof, processes for preparation thereof and pharmaceutical composition comprising the same.</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>CHEMISTRY</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>HUMAN NECESSITIES</subject><subject>HYGIENE</subject><subject>MEDICAL OR VETERINARY SCIENCE</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES</subject><subject>SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS ORMEDICINAL PREPARATIONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1993</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDB1dg3wcPUNcw1y8vRzCfVzd_VTCPVzUQAKuDl6BAF5UaEKnkBGkIKHa1BwiKuPD1ARDwNrWmJOcSovlOZmUHRzDXH20E0tyI9PLS5ITE7NSy2Jd3E1NrMwszS3DAkxMiZGDQAb7Sh1</recordid><startdate>19930311</startdate><enddate>19930311</enddate><creator>TOZUKA, ZENZABURO, TOYONAKA-SHI OSAKA 565, JP</creator><creator>YASUDA, NOBUYOSHI, NISHINOMIYA-SHI HYOGO 662, JP</creator><creator>TAKAYA, TAKAO, KAWANISHI-SHI HYOGO 666-01, JP</creator><creator>NISHIMURA, SHINTARO, SETTSU-SHI OSAKA 566, JP</creator><scope>EVB</scope></search><sort><creationdate>19930311</creationdate><title>CEPHEMVERBINDUNGEN UND VERFAHREN ZU IHRER HERSTELLUNG</title><author>TOZUKA, ZENZABURO, TOYONAKA-SHI OSAKA 565, JP ; YASUDA, NOBUYOSHI, NISHINOMIYA-SHI HYOGO 662, JP ; TAKAYA, TAKAO, KAWANISHI-SHI HYOGO 666-01, JP ; NISHIMURA, SHINTARO, SETTSU-SHI OSAKA 566, JP</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE3686979TT23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>1993</creationdate><topic>ACYCLIC OR CARBOCYCLIC COMPOUNDS</topic><topic>CHEMISTRY</topic><topic>HETEROCYCLIC COMPOUNDS</topic><topic>HUMAN NECESSITIES</topic><topic>HYGIENE</topic><topic>MEDICAL OR VETERINARY SCIENCE</topic><topic>METALLURGY</topic><topic>ORGANIC CHEMISTRY</topic><topic>PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES</topic><topic>SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS ORMEDICINAL PREPARATIONS</topic><toplevel>online_resources</toplevel><creatorcontrib>TOZUKA, ZENZABURO, TOYONAKA-SHI OSAKA 565, JP</creatorcontrib><creatorcontrib>YASUDA, NOBUYOSHI, NISHINOMIYA-SHI HYOGO 662, JP</creatorcontrib><creatorcontrib>TAKAYA, TAKAO, KAWANISHI-SHI HYOGO 666-01, JP</creatorcontrib><creatorcontrib>NISHIMURA, SHINTARO, SETTSU-SHI OSAKA 566, JP</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TOZUKA, ZENZABURO, TOYONAKA-SHI OSAKA 565, JP</au><au>YASUDA, NOBUYOSHI, NISHINOMIYA-SHI HYOGO 662, JP</au><au>TAKAYA, TAKAO, KAWANISHI-SHI HYOGO 666-01, JP</au><au>NISHIMURA, SHINTARO, SETTSU-SHI OSAKA 566, JP</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CEPHEMVERBINDUNGEN UND VERFAHREN ZU IHRER HERSTELLUNG</title><date>1993-03-11</date><risdate>1993</risdate><abstract>1. A compound of the formula: wherein R is lower alkyl, lower alkanoyl, aryl, ar(lower)alkyl or a heterocyclic group, each of which may have suitable substituent(s), R is carboxy or protected carboxy, R is hydrogen, halogen, hydroxy, lower alkoxy, acyloxy, lower alkylthio, lower alkenyl, lower alkenylthio, lower alkynyl, heterocyclicthio or a heterocyclic group, in which lower alkylthio, lower alkenyl, lower alkenylthio, heterocylicthio and a heterocyclic group may have suitable substituent(s), R and R are each hydrogen, halogen or arylthio, A is lower alkylene, and n is an integer of 0 or 1, and a pharmaceutically acceptable salt thereof, processes for preparation thereof and pharmaceutical composition comprising the same.</abstract><edition>5</edition><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language ger
recordid cdi_epo_espacenet_DE3686979TT2
source esp@cenet
subjects ACYCLIC OR CARBOCYCLIC COMPOUNDS
CHEMISTRY
HETEROCYCLIC COMPOUNDS
HUMAN NECESSITIES
HYGIENE
MEDICAL OR VETERINARY SCIENCE
METALLURGY
ORGANIC CHEMISTRY
PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES
SPECIFIC THERAPEUTIC ACTIVITY OF CHEMICAL COMPOUNDS ORMEDICINAL PREPARATIONS
title CEPHEMVERBINDUNGEN UND VERFAHREN ZU IHRER HERSTELLUNG
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T15%3A54%3A42IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TOZUKA,%20ZENZABURO,%20TOYONAKA-SHI%20OSAKA%20565,%20JP&rft.date=1993-03-11&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EDE3686979TT2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true