DE2723405
Disclosure is made of an electrochemical process for producing manganese dioxide by electrolyzing a solution containing 100 to 200 g/l of manganese sulphate and 20 to 100 g/l of sulphuric acid. The temperature of the solution is 90 DEG to 98 DEG C, and the anode current density is 100 to 300 A/m2. T...
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| creator | MELNIKOV-EICHENVALD, MICHAIL ALEKSEEVITSCH TSCHACHUNASCHVILI, TEMURI ALEKSANDROVITSCH OTIASCHVILI, DALI GEORGIEVNA, TIFLIS RYZYGRAEVA GEB. KOZYREVA, GALINA NIKOLAEVNA BOGDANOV, EDUARD ALIMOVITSCH, TIFLIS KERVALISCHVILI, ZURAB JASONOVITSCH TSCHAGUNAVA, RAUL VLADIMIROVITSCH SICHARULIDZE, NODAR GEORGIEVITSCH GOGOLADZE, GEORGIJ TROFIMOVITSCH, RUSTAVI, GRUZINSKAJA SSR TEISCHEVA GEB. ASKINAZI, ALLA ABELEVNA DSCHAPARIDZE, LEVAN NIKOLAEVITSCH DUBOV, JANSCHE MARKOVITSCH, MOSKOVSKAYA OBLAST, ODINCOVO MAISURADZE, VENERA ROMANOVNA RUSTAVI, GRUZINSKAJA SSR ROKVA, TEMURI VALERJANOVITSCH, TIFLIS |
| description | Disclosure is made of an electrochemical process for producing manganese dioxide by electrolyzing a solution containing 100 to 200 g/l of manganese sulphate and 20 to 100 g/l of sulphuric acid. The temperature of the solution is 90 DEG to 98 DEG C, and the anode current density is 100 to 300 A/m2. The anode is of titanium. On the surface of the anode there are provided uniformly spaced hollows whose total surface area is not less than 10 percent of that of the anode. Inside said hollows there is provided a coating consisting of two layers. The first layer is 0.8 to 5 mu thick and is of a metal selected from the platinum family; it may be of ruthenium dioxide or platinum oxide. It also may be of lead dioxide, in which case this first layer is 0.1 to 1 mm thick. The second layer has a thickness of 1 to 2 mm and is of manganese dioxide. The cathode is of chromium-nickel steel containing 18 to 23 mass percent of chromium, 20 to 28 mass percent of nickel, and alloy additions, including copper, molybdenum, titanium, silicon and manganese. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE2723405B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE2723405B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE2723405B23</originalsourceid><addsrcrecordid>eNrjZOB0cTUyNzI2MTDlYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxcPVORsZEKAEAylwaYg</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>DE2723405</title><source>esp@cenet</source><creator>MELNIKOV-EICHENVALD, MICHAIL ALEKSEEVITSCH ; TSCHACHUNASCHVILI, TEMURI ALEKSANDROVITSCH ; OTIASCHVILI, DALI GEORGIEVNA, TIFLIS ; RYZYGRAEVA GEB. KOZYREVA, GALINA NIKOLAEVNA ; BOGDANOV, EDUARD ALIMOVITSCH, TIFLIS ; KERVALISCHVILI, ZURAB JASONOVITSCH ; TSCHAGUNAVA, RAUL VLADIMIROVITSCH ; SICHARULIDZE, NODAR GEORGIEVITSCH ; GOGOLADZE, GEORGIJ TROFIMOVITSCH, RUSTAVI, GRUZINSKAJA SSR ; TEISCHEVA GEB. ASKINAZI, ALLA ABELEVNA ; DSCHAPARIDZE, LEVAN NIKOLAEVITSCH ; DUBOV, JANSCHE MARKOVITSCH, MOSKOVSKAYA OBLAST, ODINCOVO ; MAISURADZE, VENERA ROMANOVNA ; RUSTAVI, GRUZINSKAJA SSR ; ROKVA, TEMURI VALERJANOVITSCH, TIFLIS</creator><creatorcontrib>MELNIKOV-EICHENVALD, MICHAIL ALEKSEEVITSCH ; TSCHACHUNASCHVILI, TEMURI ALEKSANDROVITSCH ; OTIASCHVILI, DALI GEORGIEVNA, TIFLIS ; RYZYGRAEVA GEB. KOZYREVA, GALINA NIKOLAEVNA ; BOGDANOV, EDUARD ALIMOVITSCH, TIFLIS ; KERVALISCHVILI, ZURAB JASONOVITSCH ; TSCHAGUNAVA, RAUL VLADIMIROVITSCH ; SICHARULIDZE, NODAR GEORGIEVITSCH ; GOGOLADZE, GEORGIJ TROFIMOVITSCH, RUSTAVI, GRUZINSKAJA SSR ; TEISCHEVA GEB. ASKINAZI, ALLA ABELEVNA ; DSCHAPARIDZE, LEVAN NIKOLAEVITSCH ; DUBOV, JANSCHE MARKOVITSCH, MOSKOVSKAYA OBLAST, ODINCOVO ; MAISURADZE, VENERA ROMANOVNA ; RUSTAVI, GRUZINSKAJA SSR ; ROKVA, TEMURI VALERJANOVITSCH, TIFLIS</creatorcontrib><description>Disclosure is made of an electrochemical process for producing manganese dioxide by electrolyzing a solution containing 100 to 200 g/l of manganese sulphate and 20 to 100 g/l of sulphuric acid. The temperature of the solution is 90 DEG to 98 DEG C, and the anode current density is 100 to 300 A/m2. The anode is of titanium. On the surface of the anode there are provided uniformly spaced hollows whose total surface area is not less than 10 percent of that of the anode. Inside said hollows there is provided a coating consisting of two layers. The first layer is 0.8 to 5 mu thick and is of a metal selected from the platinum family; it may be of ruthenium dioxide or platinum oxide. It also may be of lead dioxide, in which case this first layer is 0.1 to 1 mm thick. The second layer has a thickness of 1 to 2 mm and is of manganese dioxide. The cathode is of chromium-nickel steel containing 18 to 23 mass percent of chromium, 20 to 28 mass percent of nickel, and alloy additions, including copper, molybdenum, titanium, silicon and manganese.</description><edition>3</edition><language>eng</language><subject>APPARATUS THEREFOR ; CHEMISTRY ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES ; ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS ; METALLURGY</subject><creationdate>1980</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19800313&DB=EPODOC&CC=DE&NR=2723405B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19800313&DB=EPODOC&CC=DE&NR=2723405B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MELNIKOV-EICHENVALD, MICHAIL ALEKSEEVITSCH</creatorcontrib><creatorcontrib>TSCHACHUNASCHVILI, TEMURI ALEKSANDROVITSCH</creatorcontrib><creatorcontrib>OTIASCHVILI, DALI GEORGIEVNA, TIFLIS</creatorcontrib><creatorcontrib>RYZYGRAEVA GEB. KOZYREVA, GALINA NIKOLAEVNA</creatorcontrib><creatorcontrib>BOGDANOV, EDUARD ALIMOVITSCH, TIFLIS</creatorcontrib><creatorcontrib>KERVALISCHVILI, ZURAB JASONOVITSCH</creatorcontrib><creatorcontrib>TSCHAGUNAVA, RAUL VLADIMIROVITSCH</creatorcontrib><creatorcontrib>SICHARULIDZE, NODAR GEORGIEVITSCH</creatorcontrib><creatorcontrib>GOGOLADZE, GEORGIJ TROFIMOVITSCH, RUSTAVI, GRUZINSKAJA SSR</creatorcontrib><creatorcontrib>TEISCHEVA GEB. ASKINAZI, ALLA ABELEVNA</creatorcontrib><creatorcontrib>DSCHAPARIDZE, LEVAN NIKOLAEVITSCH</creatorcontrib><creatorcontrib>DUBOV, JANSCHE MARKOVITSCH, MOSKOVSKAYA OBLAST, ODINCOVO</creatorcontrib><creatorcontrib>MAISURADZE, VENERA ROMANOVNA</creatorcontrib><creatorcontrib>RUSTAVI, GRUZINSKAJA SSR</creatorcontrib><creatorcontrib>ROKVA, TEMURI VALERJANOVITSCH, TIFLIS</creatorcontrib><title>DE2723405</title><description>Disclosure is made of an electrochemical process for producing manganese dioxide by electrolyzing a solution containing 100 to 200 g/l of manganese sulphate and 20 to 100 g/l of sulphuric acid. The temperature of the solution is 90 DEG to 98 DEG C, and the anode current density is 100 to 300 A/m2. The anode is of titanium. On the surface of the anode there are provided uniformly spaced hollows whose total surface area is not less than 10 percent of that of the anode. Inside said hollows there is provided a coating consisting of two layers. The first layer is 0.8 to 5 mu thick and is of a metal selected from the platinum family; it may be of ruthenium dioxide or platinum oxide. It also may be of lead dioxide, in which case this first layer is 0.1 to 1 mm thick. The second layer has a thickness of 1 to 2 mm and is of manganese dioxide. The cathode is of chromium-nickel steel containing 18 to 23 mass percent of chromium, 20 to 28 mass percent of nickel, and alloy additions, including copper, molybdenum, titanium, silicon and manganese.</description><subject>APPARATUS THEREFOR</subject><subject>CHEMISTRY</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</subject><subject>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS</subject><subject>METALLURGY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1980</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZOB0cTUyNzI2MTDlYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxcPVORsZEKAEAylwaYg</recordid><startdate>19800313</startdate><enddate>19800313</enddate><creator>MELNIKOV-EICHENVALD, MICHAIL ALEKSEEVITSCH</creator><creator>TSCHACHUNASCHVILI, TEMURI ALEKSANDROVITSCH</creator><creator>OTIASCHVILI, DALI GEORGIEVNA, TIFLIS</creator><creator>RYZYGRAEVA GEB. 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KOZYREVA, GALINA NIKOLAEVNA ; BOGDANOV, EDUARD ALIMOVITSCH, TIFLIS ; KERVALISCHVILI, ZURAB JASONOVITSCH ; TSCHAGUNAVA, RAUL VLADIMIROVITSCH ; SICHARULIDZE, NODAR GEORGIEVITSCH ; GOGOLADZE, GEORGIJ TROFIMOVITSCH, RUSTAVI, GRUZINSKAJA SSR ; TEISCHEVA GEB. ASKINAZI, ALLA ABELEVNA ; DSCHAPARIDZE, LEVAN NIKOLAEVITSCH ; DUBOV, JANSCHE MARKOVITSCH, MOSKOVSKAYA OBLAST, ODINCOVO ; MAISURADZE, VENERA ROMANOVNA ; RUSTAVI, GRUZINSKAJA SSR ; ROKVA, TEMURI VALERJANOVITSCH, TIFLIS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE2723405B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1980</creationdate><topic>APPARATUS THEREFOR</topic><topic>CHEMISTRY</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES</topic><topic>ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTIONOF COMPOUNDS OR NON-METALS</topic><topic>METALLURGY</topic><toplevel>online_resources</toplevel><creatorcontrib>MELNIKOV-EICHENVALD, MICHAIL ALEKSEEVITSCH</creatorcontrib><creatorcontrib>TSCHACHUNASCHVILI, TEMURI ALEKSANDROVITSCH</creatorcontrib><creatorcontrib>OTIASCHVILI, DALI GEORGIEVNA, TIFLIS</creatorcontrib><creatorcontrib>RYZYGRAEVA GEB. KOZYREVA, GALINA NIKOLAEVNA</creatorcontrib><creatorcontrib>BOGDANOV, EDUARD ALIMOVITSCH, TIFLIS</creatorcontrib><creatorcontrib>KERVALISCHVILI, ZURAB JASONOVITSCH</creatorcontrib><creatorcontrib>TSCHAGUNAVA, RAUL VLADIMIROVITSCH</creatorcontrib><creatorcontrib>SICHARULIDZE, NODAR GEORGIEVITSCH</creatorcontrib><creatorcontrib>GOGOLADZE, GEORGIJ TROFIMOVITSCH, RUSTAVI, GRUZINSKAJA SSR</creatorcontrib><creatorcontrib>TEISCHEVA GEB. ASKINAZI, ALLA ABELEVNA</creatorcontrib><creatorcontrib>DSCHAPARIDZE, LEVAN NIKOLAEVITSCH</creatorcontrib><creatorcontrib>DUBOV, JANSCHE MARKOVITSCH, MOSKOVSKAYA OBLAST, ODINCOVO</creatorcontrib><creatorcontrib>MAISURADZE, VENERA ROMANOVNA</creatorcontrib><creatorcontrib>RUSTAVI, GRUZINSKAJA SSR</creatorcontrib><creatorcontrib>ROKVA, TEMURI VALERJANOVITSCH, TIFLIS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MELNIKOV-EICHENVALD, MICHAIL ALEKSEEVITSCH</au><au>TSCHACHUNASCHVILI, TEMURI ALEKSANDROVITSCH</au><au>OTIASCHVILI, DALI GEORGIEVNA, TIFLIS</au><au>RYZYGRAEVA GEB. KOZYREVA, GALINA NIKOLAEVNA</au><au>BOGDANOV, EDUARD ALIMOVITSCH, TIFLIS</au><au>KERVALISCHVILI, ZURAB JASONOVITSCH</au><au>TSCHAGUNAVA, RAUL VLADIMIROVITSCH</au><au>SICHARULIDZE, NODAR GEORGIEVITSCH</au><au>GOGOLADZE, GEORGIJ TROFIMOVITSCH, RUSTAVI, GRUZINSKAJA SSR</au><au>TEISCHEVA GEB. ASKINAZI, ALLA ABELEVNA</au><au>DSCHAPARIDZE, LEVAN NIKOLAEVITSCH</au><au>DUBOV, JANSCHE MARKOVITSCH, MOSKOVSKAYA OBLAST, ODINCOVO</au><au>MAISURADZE, VENERA ROMANOVNA</au><au>RUSTAVI, GRUZINSKAJA SSR</au><au>ROKVA, TEMURI VALERJANOVITSCH, TIFLIS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>DE2723405</title><date>1980-03-13</date><risdate>1980</risdate><abstract>Disclosure is made of an electrochemical process for producing manganese dioxide by electrolyzing a solution containing 100 to 200 g/l of manganese sulphate and 20 to 100 g/l of sulphuric acid. The temperature of the solution is 90 DEG to 98 DEG C, and the anode current density is 100 to 300 A/m2. The anode is of titanium. On the surface of the anode there are provided uniformly spaced hollows whose total surface area is not less than 10 percent of that of the anode. Inside said hollows there is provided a coating consisting of two layers. The first layer is 0.8 to 5 mu thick and is of a metal selected from the platinum family; it may be of ruthenium dioxide or platinum oxide. It also may be of lead dioxide, in which case this first layer is 0.1 to 1 mm thick. The second layer has a thickness of 1 to 2 mm and is of manganese dioxide. The cathode is of chromium-nickel steel containing 18 to 23 mass percent of chromium, 20 to 28 mass percent of nickel, and alloy additions, including copper, molybdenum, titanium, silicon and manganese.</abstract><edition>3</edition><oa>free_for_read</oa></addata></record> |
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| title | DE2723405 |
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