Automatic electron beam adjustment when producing submicron structures - where scanning marks on substrate provide signals for electronic processing

An electron beam is rapidly and automatically adjusted with high accuracy in a processing plant w.r.t. reference marks provided on an object sensitive to radiation. When the marks are scanned by the beam, signals are emitted measuring the deviation of the object from its desired position. The improv...

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Bibliographische Detailangaben

Hauptverfasser:	BLOCHBERGER,PETER, HOCH,WOLFGANG, KUSCHEL,GEORG,DR, SONNEFELD,KLAUS, EICHHORN,HANS-GUENTHER
Format:	Patent
Sprache:	eng ; ger
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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