TRANSPARENTER LEITER UND ORGANISCHE VORRICHTUNG
Ein transparenter Leiter (10) umfasst ein transparentes Substrat (11), eine erste Metalloxidschicht (12), eine Metallschicht (18), die eine Silberlegierung enthält, eine dritte Metalloxidschicht (14) und eine zweite Metalloxidschicht (16) in der angegebenen Reihenfolge. Die erste Metalloxidschicht (...
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| creator | Harada, Shouhei Shingai, Hiroshi Nishizawa, Akinori |
| description | Ein transparenter Leiter (10) umfasst ein transparentes Substrat (11), eine erste Metalloxidschicht (12), eine Metallschicht (18), die eine Silberlegierung enthält, eine dritte Metalloxidschicht (14) und eine zweite Metalloxidschicht (16) in der angegebenen Reihenfolge. Die erste Metalloxidschicht (12) besteht aus einem Metalloxid, welches sich von ITO unterscheidet, die zweite Metalloxidschicht (16) enthält ITO, und die Austrittsarbeit der Oberfläche (16a) der zweiten Metalloxidschicht (16), die der Seite der Metallschicht (18) gegenüberliegt, beträgt 4,5 eV oder mehr.
A transparent conductor includes a transparent substrate, a first metal oxide layer, a metal layer containing a silver alloy, a third metal oxide layer, and a second metal oxide layer in the order presented. The first metal oxide layer is composed of a metal oxide which is different from ITO, the second metal oxide layer contains ITO, and the work function of the surface of the second metal oxide layer opposite to the metal layer side is 4.5 eV or higher. |
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A transparent conductor includes a transparent substrate, a first metal oxide layer, a metal layer containing a silver alloy, a third metal oxide layer, and a second metal oxide layer in the order presented. The first metal oxide layer is composed of a metal oxide which is different from ITO, the second metal oxide layer contains ITO, and the work function of the surface of the second metal oxide layer opposite to the metal layer side is 4.5 eV or higher.</description><language>ger</language><subject>BASIC ELECTRIC ELEMENTS ; CABLES ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; CONDUCTORS ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC HEATING ; ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; INSULATORS ; LAYERED PRODUCTS ; LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM ; METALLURGY ; PERFORMING OPERATIONS ; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; TRANSPORTING</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200610&DB=EPODOC&CC=DE&NR=112018004850T5$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200610&DB=EPODOC&CC=DE&NR=112018004850T5$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Harada, Shouhei</creatorcontrib><creatorcontrib>Shingai, Hiroshi</creatorcontrib><creatorcontrib>Nishizawa, Akinori</creatorcontrib><title>TRANSPARENTER LEITER UND ORGANISCHE VORRICHTUNG</title><description>Ein transparenter Leiter (10) umfasst ein transparentes Substrat (11), eine erste Metalloxidschicht (12), eine Metallschicht (18), die eine Silberlegierung enthält, eine dritte Metalloxidschicht (14) und eine zweite Metalloxidschicht (16) in der angegebenen Reihenfolge. Die erste Metalloxidschicht (12) besteht aus einem Metalloxid, welches sich von ITO unterscheidet, die zweite Metalloxidschicht (16) enthält ITO, und die Austrittsarbeit der Oberfläche (16a) der zweiten Metalloxidschicht (16), die der Seite der Metallschicht (18) gegenüberliegt, beträgt 4,5 eV oder mehr.
A transparent conductor includes a transparent substrate, a first metal oxide layer, a metal layer containing a silver alloy, a third metal oxide layer, and a second metal oxide layer in the order presented. The first metal oxide layer is composed of a metal oxide which is different from ITO, the second metal oxide layer contains ITO, and the work function of the surface of the second metal oxide layer opposite to the metal layer side is 4.5 eV or higher.</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CABLES</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>CONDUCTORS</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC HEATING</subject><subject>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>INSULATORS</subject><subject>LAYERED PRODUCTS</subject><subject>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</subject><subject>METALLURGY</subject><subject>PERFORMING OPERATIONS</subject><subject>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAPCXL0Cw5wDHL1C3ENUvBx9QRRoX4uCv5B7o5-nsHOHq4KYf5BQZ7OHiGhfu48DKxpiTnFqbxQmptBzc01xNlDN7UgPz61uCAxOTUvtSTexdXQ0MjA0MLAwMTC1CAkxNSYaIUAuJsotw</recordid><startdate>20200610</startdate><enddate>20200610</enddate><creator>Harada, Shouhei</creator><creator>Shingai, Hiroshi</creator><creator>Nishizawa, Akinori</creator><scope>EVB</scope></search><sort><creationdate>20200610</creationdate><title>TRANSPARENTER LEITER UND ORGANISCHE VORRICHTUNG</title><author>Harada, Shouhei ; Shingai, Hiroshi ; Nishizawa, Akinori</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE112018004850TT53</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CABLES</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>CONDUCTORS</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC HEATING</topic><topic>ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>INSULATORS</topic><topic>LAYERED PRODUCTS</topic><topic>LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM</topic><topic>METALLURGY</topic><topic>PERFORMING OPERATIONS</topic><topic>SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Harada, Shouhei</creatorcontrib><creatorcontrib>Shingai, Hiroshi</creatorcontrib><creatorcontrib>Nishizawa, Akinori</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Harada, Shouhei</au><au>Shingai, Hiroshi</au><au>Nishizawa, Akinori</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>TRANSPARENTER LEITER UND ORGANISCHE VORRICHTUNG</title><date>2020-06-10</date><risdate>2020</risdate><abstract>Ein transparenter Leiter (10) umfasst ein transparentes Substrat (11), eine erste Metalloxidschicht (12), eine Metallschicht (18), die eine Silberlegierung enthält, eine dritte Metalloxidschicht (14) und eine zweite Metalloxidschicht (16) in der angegebenen Reihenfolge. Die erste Metalloxidschicht (12) besteht aus einem Metalloxid, welches sich von ITO unterscheidet, die zweite Metalloxidschicht (16) enthält ITO, und die Austrittsarbeit der Oberfläche (16a) der zweiten Metalloxidschicht (16), die der Seite der Metallschicht (18) gegenüberliegt, beträgt 4,5 eV oder mehr.
A transparent conductor includes a transparent substrate, a first metal oxide layer, a metal layer containing a silver alloy, a third metal oxide layer, and a second metal oxide layer in the order presented. The first metal oxide layer is composed of a metal oxide which is different from ITO, the second metal oxide layer contains ITO, and the work function of the surface of the second metal oxide layer opposite to the metal layer side is 4.5 eV or higher.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS CABLES CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CONDUCTORS DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC HEATING ELECTRIC LIGHTING NOT OTHERWISE PROVIDED FOR ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL INSULATORS LAYERED PRODUCTS LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT ORNON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM METALLURGY PERFORMING OPERATIONS SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING ORDIELECTRIC PROPERTIES SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION TRANSPORTING |
| title | TRANSPARENTER LEITER UND ORGANISCHE VORRICHTUNG |
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