Device useful for plasma coating of surface of substrate by plasma spraying method, comprises anode, cathode, gas feed, wire feed for wire that is meltable by gas heated to plasma temperature, and nozzle for supplying auxiliary gas jet
Device (1) for plasma coating of a surface of a substrate (3) by plasma spraying method, comprises an anode (8) and a cathode (9), between which an arc is generated by applying a voltage, a gas feed, a wire feed for a wire, which is meltable by a gas that is heated to plasma temperature such that mo...
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description | Device (1) for plasma coating of a surface of a substrate (3) by plasma spraying method, comprises an anode (8) and a cathode (9), between which an arc is generated by applying a voltage, a gas feed, a wire feed for a wire, which is meltable by a gas that is heated to plasma temperature such that molten particles of the wire are transported and deposited in the direction of the surface of the substrate by an atomizing gas jet (12), and at least one nozzle arranged adjacently, preferably in flanking manner to the atomizing gas outlet opening, through which an auxiliary gas jet is supplied. Device (1) for plasma coating of a surface of a substrate (3) by plasma spraying method, comprises an anode (8) and a cathode (9), between which an arc is generated by applying a voltage, a gas feed, a wire feed for a wire, which is meltable by a gas that is heated to plasma temperature such that molten particles of the wire are transported and deposited in the direction of the surface of the substrate by an atomizing gas jet (12) along a beam axis through an atomizing gas outlet opening, and at least one nozzle arranged adjacently, preferably in flanking manner to the atomizing gas outlet opening, through which an auxiliary gas jet, which encloses the atomizing gas jet, or is externally tangential to the atomizing gas jet, is supplied. An independent claim is also included for plasma spraying method for using in the above device, comprising generating the arc between the anode and the cathode, supplying a gas and heating it to plasma temperature, supplying a wire-shaped spraying material such that molten spraying material is deposited on the surface of the substrate by the atomizing gas jet, and generating the auxiliary gas jet.
Die Erfindung betrifft eine Vorrichtung (1) und ein Verfahren zum Plasmabeschichten einer Oberfläche (2) eines Substrats (3), wobei die Vorrichtung (1) mit einem Brennerkopf (4) ausgestattet ist, welcher am unteren Ende eines eine nicht dargestellte Gaszuführung aufnehmenden Brennerschafts (5) angeordnet ist. Der Brennerschaft (5) der Vorrichtung (1) ragt in einen inneren Bereich des hohlzylindrischen Substrats (3) hinein und ist um eine vertikale Achse (6) schwenkbeweglich angeordnet. Auf diese Weise kann eine die Innwandfläche bildende Oberfläche (2) mit einer Beschichtung (7) versehen werden, indem der Brennerschaft (5) rotierend angetrieben wird. An dem Brennerschaft (5) ist eine Drahtzuführung (10) für einen Draht angeordnet, welcher dem auf |
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Die Erfindung betrifft eine Vorrichtung (1) und ein Verfahren zum Plasmabeschichten einer Oberfläche (2) eines Substrats (3), wobei die Vorrichtung (1) mit einem Brennerkopf (4) ausgestattet ist, welcher am unteren Ende eines eine nicht dargestellte Gaszuführung aufnehmenden Brennerschafts (5) angeordnet ist. Der Brennerschaft (5) der Vorrichtung (1) ragt in einen inneren Bereich des hohlzylindrischen Substrats (3) hinein und ist um eine vertikale Achse (6) schwenkbeweglich angeordnet. Auf diese Weise kann eine die Innwandfläche bildende Oberfläche (2) mit einer Beschichtung (7) versehen werden, indem der Brennerschaft (5) rotierend angetrieben wird. An dem Brennerschaft (5) ist eine Drahtzuführung (10) für einen Draht angeordnet, welcher dem auf Plasmatemperatur erhitzten Gas zugeführt und in dem Gasstrom aufgeschmolzen wird. Die geschmolzenen Partikel des Drahtmaterials gelangen somit dem Zerstäubergasstrahl (12) entlang einer im Wesentlichen horizontalen Strahlachse (13) durch eine Zerstäubergasaustrittsöffnung (14) auf die Oberfläche (2) des Substrats (3). Flankierend zu der Zerstäubergasaustrittsöffnung (14) sind vier Düsen (15) vorgesehen, durch die jeweils ein den Zerstäubergasstrahl (12) außenseitig einschließender Hilfsgasstrahl zugeführt wird. Hierdurch werden eine Strahlformung, insbesondere Bündelung, sowie eine Beschleunigung des Zerstäubergasstrahls (12) erreicht, um so die zielgenaue Zuführung der aufgeschmolzenen Partikel auf den vorbestimmten Bereich der Oberfläche (2) zu erreichen.</description><language>eng ; ger</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2013</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130822&DB=EPODOC&CC=DE&NR=102012003307A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25543,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20130822&DB=EPODOC&CC=DE&NR=102012003307A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>KLIMEK, KLAUS STEFAN</creatorcontrib><creatorcontrib>VOGELSANG, REINHARD</creatorcontrib><title>Device useful for plasma coating of surface of substrate by plasma spraying method, comprises anode, cathode, gas feed, wire feed for wire that is meltable by gas heated to plasma temperature, and nozzle for supplying auxiliary gas jet</title><description>Device (1) for plasma coating of a surface of a substrate (3) by plasma spraying method, comprises an anode (8) and a cathode (9), between which an arc is generated by applying a voltage, a gas feed, a wire feed for a wire, which is meltable by a gas that is heated to plasma temperature such that molten particles of the wire are transported and deposited in the direction of the surface of the substrate by an atomizing gas jet (12), and at least one nozzle arranged adjacently, preferably in flanking manner to the atomizing gas outlet opening, through which an auxiliary gas jet is supplied. Device (1) for plasma coating of a surface of a substrate (3) by plasma spraying method, comprises an anode (8) and a cathode (9), between which an arc is generated by applying a voltage, a gas feed, a wire feed for a wire, which is meltable by a gas that is heated to plasma temperature such that molten particles of the wire are transported and deposited in the direction of the surface of the substrate by an atomizing gas jet (12) along a beam axis through an atomizing gas outlet opening, and at least one nozzle arranged adjacently, preferably in flanking manner to the atomizing gas outlet opening, through which an auxiliary gas jet, which encloses the atomizing gas jet, or is externally tangential to the atomizing gas jet, is supplied. An independent claim is also included for plasma spraying method for using in the above device, comprising generating the arc between the anode and the cathode, supplying a gas and heating it to plasma temperature, supplying a wire-shaped spraying material such that molten spraying material is deposited on the surface of the substrate by the atomizing gas jet, and generating the auxiliary gas jet.
Die Erfindung betrifft eine Vorrichtung (1) und ein Verfahren zum Plasmabeschichten einer Oberfläche (2) eines Substrats (3), wobei die Vorrichtung (1) mit einem Brennerkopf (4) ausgestattet ist, welcher am unteren Ende eines eine nicht dargestellte Gaszuführung aufnehmenden Brennerschafts (5) angeordnet ist. Der Brennerschaft (5) der Vorrichtung (1) ragt in einen inneren Bereich des hohlzylindrischen Substrats (3) hinein und ist um eine vertikale Achse (6) schwenkbeweglich angeordnet. Auf diese Weise kann eine die Innwandfläche bildende Oberfläche (2) mit einer Beschichtung (7) versehen werden, indem der Brennerschaft (5) rotierend angetrieben wird. An dem Brennerschaft (5) ist eine Drahtzuführung (10) für einen Draht angeordnet, welcher dem auf Plasmatemperatur erhitzten Gas zugeführt und in dem Gasstrom aufgeschmolzen wird. Die geschmolzenen Partikel des Drahtmaterials gelangen somit dem Zerstäubergasstrahl (12) entlang einer im Wesentlichen horizontalen Strahlachse (13) durch eine Zerstäubergasaustrittsöffnung (14) auf die Oberfläche (2) des Substrats (3). Flankierend zu der Zerstäubergasaustrittsöffnung (14) sind vier Düsen (15) vorgesehen, durch die jeweils ein den Zerstäubergasstrahl (12) außenseitig einschließender Hilfsgasstrahl zugeführt wird. Hierdurch werden eine Strahlformung, insbesondere Bündelung, sowie eine Beschleunigung des Zerstäubergasstrahls (12) erreicht, um so die zielgenaue Zuführung der aufgeschmolzenen Partikel auf den vorbestimmten Bereich der Oberfläche (2) zu erreichen.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2013</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjzFuwzAMRb10KNLegUu3BpDjoXPRJOgBugd0TMUKZEkQqabJlXOJ0Gqzd-In9fg_9dhc1_Tt9gSFyRYPNmZIHnlC2EcUFw4QLXDJFhWqsmfJKAT9-U5yynie0YlkjMOrrk4pOyYGDHEgHeD8oOKADJZImZPLVGXNrJ2MKOBYbbxg72vEvDCS5g0g8R4oNCXSI0pWSwwDhHi5KD87cUnJ12uw_DjvMP-aHEmemgeLnun5ry6al-3m6-NzSSnuiJN-MZDs1pvWrEy7MqbrzNt72_2XuwFMZ3F_</recordid><startdate>20130822</startdate><enddate>20130822</enddate><creator>KLIMEK, KLAUS STEFAN</creator><creator>VOGELSANG, REINHARD</creator><scope>EVB</scope></search><sort><creationdate>20130822</creationdate><title>Device useful for plasma coating of surface of substrate by plasma spraying method, comprises anode, cathode, gas feed, wire feed for wire that is meltable by gas heated to plasma temperature, and nozzle for supplying auxiliary gas jet</title><author>KLIMEK, KLAUS STEFAN ; VOGELSANG, REINHARD</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE102012003307A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; ger</language><creationdate>2013</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>KLIMEK, KLAUS STEFAN</creatorcontrib><creatorcontrib>VOGELSANG, REINHARD</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>KLIMEK, KLAUS STEFAN</au><au>VOGELSANG, REINHARD</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Device useful for plasma coating of surface of substrate by plasma spraying method, comprises anode, cathode, gas feed, wire feed for wire that is meltable by gas heated to plasma temperature, and nozzle for supplying auxiliary gas jet</title><date>2013-08-22</date><risdate>2013</risdate><abstract>Device (1) for plasma coating of a surface of a substrate (3) by plasma spraying method, comprises an anode (8) and a cathode (9), between which an arc is generated by applying a voltage, a gas feed, a wire feed for a wire, which is meltable by a gas that is heated to plasma temperature such that molten particles of the wire are transported and deposited in the direction of the surface of the substrate by an atomizing gas jet (12), and at least one nozzle arranged adjacently, preferably in flanking manner to the atomizing gas outlet opening, through which an auxiliary gas jet is supplied. Device (1) for plasma coating of a surface of a substrate (3) by plasma spraying method, comprises an anode (8) and a cathode (9), between which an arc is generated by applying a voltage, a gas feed, a wire feed for a wire, which is meltable by a gas that is heated to plasma temperature such that molten particles of the wire are transported and deposited in the direction of the surface of the substrate by an atomizing gas jet (12) along a beam axis through an atomizing gas outlet opening, and at least one nozzle arranged adjacently, preferably in flanking manner to the atomizing gas outlet opening, through which an auxiliary gas jet, which encloses the atomizing gas jet, or is externally tangential to the atomizing gas jet, is supplied. An independent claim is also included for plasma spraying method for using in the above device, comprising generating the arc between the anode and the cathode, supplying a gas and heating it to plasma temperature, supplying a wire-shaped spraying material such that molten spraying material is deposited on the surface of the substrate by the atomizing gas jet, and generating the auxiliary gas jet.
Die Erfindung betrifft eine Vorrichtung (1) und ein Verfahren zum Plasmabeschichten einer Oberfläche (2) eines Substrats (3), wobei die Vorrichtung (1) mit einem Brennerkopf (4) ausgestattet ist, welcher am unteren Ende eines eine nicht dargestellte Gaszuführung aufnehmenden Brennerschafts (5) angeordnet ist. Der Brennerschaft (5) der Vorrichtung (1) ragt in einen inneren Bereich des hohlzylindrischen Substrats (3) hinein und ist um eine vertikale Achse (6) schwenkbeweglich angeordnet. Auf diese Weise kann eine die Innwandfläche bildende Oberfläche (2) mit einer Beschichtung (7) versehen werden, indem der Brennerschaft (5) rotierend angetrieben wird. An dem Brennerschaft (5) ist eine Drahtzuführung (10) für einen Draht angeordnet, welcher dem auf Plasmatemperatur erhitzten Gas zugeführt und in dem Gasstrom aufgeschmolzen wird. Die geschmolzenen Partikel des Drahtmaterials gelangen somit dem Zerstäubergasstrahl (12) entlang einer im Wesentlichen horizontalen Strahlachse (13) durch eine Zerstäubergasaustrittsöffnung (14) auf die Oberfläche (2) des Substrats (3). Flankierend zu der Zerstäubergasaustrittsöffnung (14) sind vier Düsen (15) vorgesehen, durch die jeweils ein den Zerstäubergasstrahl (12) außenseitig einschließender Hilfsgasstrahl zugeführt wird. Hierdurch werden eine Strahlformung, insbesondere Bündelung, sowie eine Beschleunigung des Zerstäubergasstrahls (12) erreicht, um so die zielgenaue Zuführung der aufgeschmolzenen Partikel auf den vorbestimmten Bereich der Oberfläche (2) zu erreichen.</abstract><oa>free_for_read</oa></addata></record> |
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subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Device useful for plasma coating of surface of substrate by plasma spraying method, comprises anode, cathode, gas feed, wire feed for wire that is meltable by gas heated to plasma temperature, and nozzle for supplying auxiliary gas jet |
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