Device for conducting gas stream when venting within a vacuum housing, comprises a transport unit located in a transport direction for transporting flat substrates provided on a transport plane
The device comprises a transport unit (3) located in a transport direction for transporting flat substrates (5) provided on a transport plane. The substrates rest on a back side of the transport unit. A gas inlet (10) is directed in a vacuum housing (1) on the back of the substrate. The gas flowing...
Gespeichert in:
| Hauptverfasser: | , , , , |
|---|---|
| Format: | Patent |
| Sprache: | eng ; ger |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | MUCHAMEDJAROW, DAMIR BAUER, REINHARDT LESMANN, STEFFEN PUENSCH, THOMAS SMOLKE, MATTHIAS |
| description | The device comprises a transport unit (3) located in a transport direction for transporting flat substrates (5) provided on a transport plane. The substrates rest on a back side of the transport unit. A gas inlet (10) is directed in a vacuum housing (1) on the back of the substrate. The gas flowing via the gas inlet is directed towards a lateral edge of the substrate in the transport direction by an aperture. The aperture is formed in such a manner that the gas is directed centrally on a front side of the substrate and formed as a back side panel in cross-section at the axial plane. The device comprises a transport unit (3) located in a transport direction for transporting flat substrates (5) provided on a transport plane. The substrates rest on a back side of the transport unit. A gas inlet (10) is directed in a vacuum housing (1) on the back of the substrate. The gas flowing via the gas inlet is directed towards a lateral edge of the substrate in the transport direction by an aperture. The aperture is formed in such a manner that the gas is directed centrally on a front side of the substrate and formed as a back side panel in cross-section at the axial plane of the transport direction to form a C-shape, which is counterclockwise rotated by 90[deg] in horizontally aligned transport plane so that the substrate is surrounded by the shape of the back side panel, back sides and lateral sides. One further aperture is formed as a front side panel in cross section at the axial plane of the transport direction to form a V-shape, which is rotated by 180[deg] in a horizontally aligned transport plane. The front side panel and the back side panel are arranged such that the tip of the V-form lies on an extended line of a side wall of the back side panel. A first front side panel and a second front side panel are positioned at a side wall of the back side panel. A front side panel is laterally arranged on the wall of the vacuum housing that is adjacent to the transport direction. The front side panels are positioned and constructed such that each of the panels extends in the tolerance range of +- 10% over a third of the width of the vacuum housing. A length of the aperture of the substrate, and a maximum length corresponding to the vacuum enclosure are measured in the transport direction. The back side panel is pierced on the side walls and in a sieve-like central region, which is executed in the form of a releasable plate as a perforated plate. A plate-shaped burstin |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE102011011279A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE102011011279A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE102011011279A13</originalsourceid><addsrcrecordid>eNqNjs2KwlAMhbtxIeo7ZDM7B1pdiMvBH-YB3Eu8Te2FNrnc5LbPN2821yIOsxMCge_knJN58XOkwTuCRiI44To583yHOyqoRcIexpYYBuKJj95az4AwoEuph1aSZr7O3j5Er6RZs4isQaJBYm_QiUOjGibfn1b7SLlMeOp-8UdL06GBplv-IDsVQpTB1zlC_keEDpmWxazBTmn13Ivi43y6HL4_KciVNKAjJrseT1W5Kasqz2a3_6q27979AsiCZCE</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Device for conducting gas stream when venting within a vacuum housing, comprises a transport unit located in a transport direction for transporting flat substrates provided on a transport plane</title><source>esp@cenet</source><creator>MUCHAMEDJAROW, DAMIR ; BAUER, REINHARDT ; LESMANN, STEFFEN ; PUENSCH, THOMAS ; SMOLKE, MATTHIAS</creator><creatorcontrib>MUCHAMEDJAROW, DAMIR ; BAUER, REINHARDT ; LESMANN, STEFFEN ; PUENSCH, THOMAS ; SMOLKE, MATTHIAS</creatorcontrib><description>The device comprises a transport unit (3) located in a transport direction for transporting flat substrates (5) provided on a transport plane. The substrates rest on a back side of the transport unit. A gas inlet (10) is directed in a vacuum housing (1) on the back of the substrate. The gas flowing via the gas inlet is directed towards a lateral edge of the substrate in the transport direction by an aperture. The aperture is formed in such a manner that the gas is directed centrally on a front side of the substrate and formed as a back side panel in cross-section at the axial plane. The device comprises a transport unit (3) located in a transport direction for transporting flat substrates (5) provided on a transport plane. The substrates rest on a back side of the transport unit. A gas inlet (10) is directed in a vacuum housing (1) on the back of the substrate. The gas flowing via the gas inlet is directed towards a lateral edge of the substrate in the transport direction by an aperture. The aperture is formed in such a manner that the gas is directed centrally on a front side of the substrate and formed as a back side panel in cross-section at the axial plane of the transport direction to form a C-shape, which is counterclockwise rotated by 90[deg] in horizontally aligned transport plane so that the substrate is surrounded by the shape of the back side panel, back sides and lateral sides. One further aperture is formed as a front side panel in cross section at the axial plane of the transport direction to form a V-shape, which is rotated by 180[deg] in a horizontally aligned transport plane. The front side panel and the back side panel are arranged such that the tip of the V-form lies on an extended line of a side wall of the back side panel. A first front side panel and a second front side panel are positioned at a side wall of the back side panel. A front side panel is laterally arranged on the wall of the vacuum housing that is adjacent to the transport direction. The front side panels are positioned and constructed such that each of the panels extends in the tolerance range of +- 10% over a third of the width of the vacuum housing. A length of the aperture of the substrate, and a maximum length corresponding to the vacuum enclosure are measured in the transport direction. The back side panel is pierced on the side walls and in a sieve-like central region, which is executed in the form of a releasable plate as a perforated plate. A plate-shaped bursting diaphragm is arranged between the central region and the gas inlet. A single aperture is connected with the vacuum housing by rod-shaped spacers, and consists of detachably connected individual segments. The substrate is moved in the transport direction during pressurization by the transport unit. The transport plane is disposed horizontally or vertically.
Die Erfindung betrifft eine Apparatur zur Leitung des Gasstromes beim Belüften innerhalb eines Vakuumgehäuses. Diese eignet sich angewandt in der Vakuumbeschichtung großflächiger Substrate beispielsweise in einer Kammer beziehungsweise Gehäuse, das als Schleuse zur Herausgabe des Substrats an die atmosphärische Umgebungsbedingung mit Mitteln zur Belüftung vorgesehen ist. Sie schafft eine Lösung, die die Belüftung unterseitig des Substrats und zudem schnelles Entlüften mit festem Halt des Substrats auf den Transportmitteln vorsieht, die thermische Kühlung vorrangig in der Substratmitte realisiert und die optimale Gaszufuhr gewährleistet. Erfindungsgemäß kennzeichnend ist, dass bezüglich des rückseitig auf dem Transportmittel (3) aufliegenden Substrates (5) ein Gaseinlass (10) in das Vakuumgehäuse (1) auf die Rückseite des Substrates (7) gerichtet ist und dass das über den Gaseinlass (10) einströmende Gas durch mindestens eine Blende (11) zum in Transportrichtung (3) seitlichen Rand des Substrates (8) hin, um diesen herum umgelenkt und auf die Vorderseite des Substrates (6) auftreffend geleitet ist.</description><language>eng ; ger</language><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; GLASS ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; JOINING GLASS TO GLASS OR OTHER MATERIALS ; METALLURGY ; MINERAL OR SLAG WOOL ; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS ; SURFACE TREATMENT OF GLASS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2012</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120816&DB=EPODOC&CC=DE&NR=102011011279A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20120816&DB=EPODOC&CC=DE&NR=102011011279A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>MUCHAMEDJAROW, DAMIR</creatorcontrib><creatorcontrib>BAUER, REINHARDT</creatorcontrib><creatorcontrib>LESMANN, STEFFEN</creatorcontrib><creatorcontrib>PUENSCH, THOMAS</creatorcontrib><creatorcontrib>SMOLKE, MATTHIAS</creatorcontrib><title>Device for conducting gas stream when venting within a vacuum housing, comprises a transport unit located in a transport direction for transporting flat substrates provided on a transport plane</title><description>The device comprises a transport unit (3) located in a transport direction for transporting flat substrates (5) provided on a transport plane. The substrates rest on a back side of the transport unit. A gas inlet (10) is directed in a vacuum housing (1) on the back of the substrate. The gas flowing via the gas inlet is directed towards a lateral edge of the substrate in the transport direction by an aperture. The aperture is formed in such a manner that the gas is directed centrally on a front side of the substrate and formed as a back side panel in cross-section at the axial plane. The device comprises a transport unit (3) located in a transport direction for transporting flat substrates (5) provided on a transport plane. The substrates rest on a back side of the transport unit. A gas inlet (10) is directed in a vacuum housing (1) on the back of the substrate. The gas flowing via the gas inlet is directed towards a lateral edge of the substrate in the transport direction by an aperture. The aperture is formed in such a manner that the gas is directed centrally on a front side of the substrate and formed as a back side panel in cross-section at the axial plane of the transport direction to form a C-shape, which is counterclockwise rotated by 90[deg] in horizontally aligned transport plane so that the substrate is surrounded by the shape of the back side panel, back sides and lateral sides. One further aperture is formed as a front side panel in cross section at the axial plane of the transport direction to form a V-shape, which is rotated by 180[deg] in a horizontally aligned transport plane. The front side panel and the back side panel are arranged such that the tip of the V-form lies on an extended line of a side wall of the back side panel. A first front side panel and a second front side panel are positioned at a side wall of the back side panel. A front side panel is laterally arranged on the wall of the vacuum housing that is adjacent to the transport direction. The front side panels are positioned and constructed such that each of the panels extends in the tolerance range of +- 10% over a third of the width of the vacuum housing. A length of the aperture of the substrate, and a maximum length corresponding to the vacuum enclosure are measured in the transport direction. The back side panel is pierced on the side walls and in a sieve-like central region, which is executed in the form of a releasable plate as a perforated plate. A plate-shaped bursting diaphragm is arranged between the central region and the gas inlet. A single aperture is connected with the vacuum housing by rod-shaped spacers, and consists of detachably connected individual segments. The substrate is moved in the transport direction during pressurization by the transport unit. The transport plane is disposed horizontally or vertically.
Die Erfindung betrifft eine Apparatur zur Leitung des Gasstromes beim Belüften innerhalb eines Vakuumgehäuses. Diese eignet sich angewandt in der Vakuumbeschichtung großflächiger Substrate beispielsweise in einer Kammer beziehungsweise Gehäuse, das als Schleuse zur Herausgabe des Substrats an die atmosphärische Umgebungsbedingung mit Mitteln zur Belüftung vorgesehen ist. Sie schafft eine Lösung, die die Belüftung unterseitig des Substrats und zudem schnelles Entlüften mit festem Halt des Substrats auf den Transportmitteln vorsieht, die thermische Kühlung vorrangig in der Substratmitte realisiert und die optimale Gaszufuhr gewährleistet. Erfindungsgemäß kennzeichnend ist, dass bezüglich des rückseitig auf dem Transportmittel (3) aufliegenden Substrates (5) ein Gaseinlass (10) in das Vakuumgehäuse (1) auf die Rückseite des Substrates (7) gerichtet ist und dass das über den Gaseinlass (10) einströmende Gas durch mindestens eine Blende (11) zum in Transportrichtung (3) seitlichen Rand des Substrates (8) hin, um diesen herum umgelenkt und auf die Vorderseite des Substrates (6) auftreffend geleitet ist.</description><subject>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>GLASS</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>JOINING GLASS TO GLASS OR OTHER MATERIALS</subject><subject>METALLURGY</subject><subject>MINERAL OR SLAG WOOL</subject><subject>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</subject><subject>SURFACE TREATMENT OF GLASS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2012</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjs2KwlAMhbtxIeo7ZDM7B1pdiMvBH-YB3Eu8Te2FNrnc5LbPN2821yIOsxMCge_knJN58XOkwTuCRiI44To583yHOyqoRcIexpYYBuKJj95az4AwoEuph1aSZr7O3j5Er6RZs4isQaJBYm_QiUOjGibfn1b7SLlMeOp-8UdL06GBplv-IDsVQpTB1zlC_keEDpmWxazBTmn13Ivi43y6HL4_KciVNKAjJrseT1W5Kasqz2a3_6q27979AsiCZCE</recordid><startdate>20120816</startdate><enddate>20120816</enddate><creator>MUCHAMEDJAROW, DAMIR</creator><creator>BAUER, REINHARDT</creator><creator>LESMANN, STEFFEN</creator><creator>PUENSCH, THOMAS</creator><creator>SMOLKE, MATTHIAS</creator><scope>EVB</scope></search><sort><creationdate>20120816</creationdate><title>Device for conducting gas stream when venting within a vacuum housing, comprises a transport unit located in a transport direction for transporting flat substrates provided on a transport plane</title><author>MUCHAMEDJAROW, DAMIR ; BAUER, REINHARDT ; LESMANN, STEFFEN ; PUENSCH, THOMAS ; SMOLKE, MATTHIAS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE102011011279A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng ; ger</language><creationdate>2012</creationdate><topic>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>GLASS</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>JOINING GLASS TO GLASS OR OTHER MATERIALS</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><topic>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</topic><topic>SURFACE TREATMENT OF GLASS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>MUCHAMEDJAROW, DAMIR</creatorcontrib><creatorcontrib>BAUER, REINHARDT</creatorcontrib><creatorcontrib>LESMANN, STEFFEN</creatorcontrib><creatorcontrib>PUENSCH, THOMAS</creatorcontrib><creatorcontrib>SMOLKE, MATTHIAS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>MUCHAMEDJAROW, DAMIR</au><au>BAUER, REINHARDT</au><au>LESMANN, STEFFEN</au><au>PUENSCH, THOMAS</au><au>SMOLKE, MATTHIAS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Device for conducting gas stream when venting within a vacuum housing, comprises a transport unit located in a transport direction for transporting flat substrates provided on a transport plane</title><date>2012-08-16</date><risdate>2012</risdate><abstract>The device comprises a transport unit (3) located in a transport direction for transporting flat substrates (5) provided on a transport plane. The substrates rest on a back side of the transport unit. A gas inlet (10) is directed in a vacuum housing (1) on the back of the substrate. The gas flowing via the gas inlet is directed towards a lateral edge of the substrate in the transport direction by an aperture. The aperture is formed in such a manner that the gas is directed centrally on a front side of the substrate and formed as a back side panel in cross-section at the axial plane. The device comprises a transport unit (3) located in a transport direction for transporting flat substrates (5) provided on a transport plane. The substrates rest on a back side of the transport unit. A gas inlet (10) is directed in a vacuum housing (1) on the back of the substrate. The gas flowing via the gas inlet is directed towards a lateral edge of the substrate in the transport direction by an aperture. The aperture is formed in such a manner that the gas is directed centrally on a front side of the substrate and formed as a back side panel in cross-section at the axial plane of the transport direction to form a C-shape, which is counterclockwise rotated by 90[deg] in horizontally aligned transport plane so that the substrate is surrounded by the shape of the back side panel, back sides and lateral sides. One further aperture is formed as a front side panel in cross section at the axial plane of the transport direction to form a V-shape, which is rotated by 180[deg] in a horizontally aligned transport plane. The front side panel and the back side panel are arranged such that the tip of the V-form lies on an extended line of a side wall of the back side panel. A first front side panel and a second front side panel are positioned at a side wall of the back side panel. A front side panel is laterally arranged on the wall of the vacuum housing that is adjacent to the transport direction. The front side panels are positioned and constructed such that each of the panels extends in the tolerance range of +- 10% over a third of the width of the vacuum housing. A length of the aperture of the substrate, and a maximum length corresponding to the vacuum enclosure are measured in the transport direction. The back side panel is pierced on the side walls and in a sieve-like central region, which is executed in the form of a releasable plate as a perforated plate. A plate-shaped bursting diaphragm is arranged between the central region and the gas inlet. A single aperture is connected with the vacuum housing by rod-shaped spacers, and consists of detachably connected individual segments. The substrate is moved in the transport direction during pressurization by the transport unit. The transport plane is disposed horizontally or vertically.
Die Erfindung betrifft eine Apparatur zur Leitung des Gasstromes beim Belüften innerhalb eines Vakuumgehäuses. Diese eignet sich angewandt in der Vakuumbeschichtung großflächiger Substrate beispielsweise in einer Kammer beziehungsweise Gehäuse, das als Schleuse zur Herausgabe des Substrats an die atmosphärische Umgebungsbedingung mit Mitteln zur Belüftung vorgesehen ist. Sie schafft eine Lösung, die die Belüftung unterseitig des Substrats und zudem schnelles Entlüften mit festem Halt des Substrats auf den Transportmitteln vorsieht, die thermische Kühlung vorrangig in der Substratmitte realisiert und die optimale Gaszufuhr gewährleistet. Erfindungsgemäß kennzeichnend ist, dass bezüglich des rückseitig auf dem Transportmittel (3) aufliegenden Substrates (5) ein Gaseinlass (10) in das Vakuumgehäuse (1) auf die Rückseite des Substrates (7) gerichtet ist und dass das über den Gaseinlass (10) einströmende Gas durch mindestens eine Blende (11) zum in Transportrichtung (3) seitlichen Rand des Substrates (8) hin, um diesen herum umgelenkt und auf die Vorderseite des Substrates (6) auftreffend geleitet ist.</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng ; ger |
| recordid | cdi_epo_espacenet_DE102011011279A1 |
| source | esp@cenet |
| subjects | CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL GLASS INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL JOINING GLASS TO GLASS OR OTHER MATERIALS METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Device for conducting gas stream when venting within a vacuum housing, comprises a transport unit located in a transport direction for transporting flat substrates provided on a transport plane |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T15%3A33%3A35IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=MUCHAMEDJAROW,%20DAMIR&rft.date=2012-08-16&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EDE102011011279A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |