Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target
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creator | GRUNE, HARALD HEINRICH, HANS-JUERGEN HAEHNE, SVEN TESCHNER, GOETZ |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE102009056241A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE102009056241A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE102009056241A13</originalsourceid><addsrcrecordid>eNrjZPAOLjm8p6QqNTOvKDM5o6Q0L10h7fCeIgWgQKqCb2J6XmpJUX5eYl5-UUoeSDI3swQsl6tQlF-SmVqUmpeSmqcQkliUnlrCw8CalphTnMoLpbkZVN1cQ5w9dFML8uNTiwsSk1OBxsW7uBoaGBkYWBqYmhmZGDoaGhOrDgBfOjkp</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target</title><source>esp@cenet</source><creator>GRUNE, HARALD ; HEINRICH, HANS-JUERGEN ; HAEHNE, SVEN ; TESCHNER, GOETZ</creator><creatorcontrib>GRUNE, HARALD ; HEINRICH, HANS-JUERGEN ; HAEHNE, SVEN ; TESCHNER, GOETZ</creatorcontrib><language>ger</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2011</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110609&DB=EPODOC&CC=DE&NR=102009056241A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20110609&DB=EPODOC&CC=DE&NR=102009056241A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GRUNE, HARALD</creatorcontrib><creatorcontrib>HEINRICH, HANS-JUERGEN</creatorcontrib><creatorcontrib>HAEHNE, SVEN</creatorcontrib><creatorcontrib>TESCHNER, GOETZ</creatorcontrib><title>Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target</title><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2011</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZPAOLjm8p6QqNTOvKDM5o6Q0L10h7fCeIgWgQKqCb2J6XmpJUX5eYl5-UUoeSDI3swQsl6tQlF-SmVqUmpeSmqcQkliUnlrCw8CalphTnMoLpbkZVN1cQ5w9dFML8uNTiwsSk1OBxsW7uBoaGBkYWBqYmhmZGDoaGhOrDgBfOjkp</recordid><startdate>20110609</startdate><enddate>20110609</enddate><creator>GRUNE, HARALD</creator><creator>HEINRICH, HANS-JUERGEN</creator><creator>HAEHNE, SVEN</creator><creator>TESCHNER, GOETZ</creator><scope>EVB</scope></search><sort><creationdate>20110609</creationdate><title>Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target</title><author>GRUNE, HARALD ; HEINRICH, HANS-JUERGEN ; HAEHNE, SVEN ; TESCHNER, GOETZ</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE102009056241A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>2011</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>GRUNE, HARALD</creatorcontrib><creatorcontrib>HEINRICH, HANS-JUERGEN</creatorcontrib><creatorcontrib>HAEHNE, SVEN</creatorcontrib><creatorcontrib>TESCHNER, GOETZ</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GRUNE, HARALD</au><au>HEINRICH, HANS-JUERGEN</au><au>HAEHNE, SVEN</au><au>TESCHNER, GOETZ</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target</title><date>2011-06-09</date><risdate>2011</risdate><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target |
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