Herstellung integrierter Schaltungen

Herstellung integrierter Schaltungen

Techniques are provided for manufacturing phase-shifted masks. According to one technique, a facilitator provides, on behalf of a set of one or more parties that desire masks, subsidies for production of phase-shifted masks. The manufacture of the phase-shifted masks is paid using compensation that...

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Hauptverfasser: PIERRAT, CHRISTOPHE, SHARAN, ATUL, PATI, YAGYENSH BUNO, WEED, TRACY J
Format: Patent
Sprache:ger
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APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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creator PIERRAT, CHRISTOPHE
SHARAN, ATUL
PATI, YAGYENSH BUNO
WEED, TRACY J
description Techniques are provided for manufacturing phase-shifted masks. According to one technique, a facilitator provides, on behalf of a set of one or more parties that desire masks, subsidies for production of phase-shifted masks. The manufacture of the phase-shifted masks is paid using compensation that includes the subsidies from the facilitator. One or more mask makers manufacture the phase-shifted masks for the compensation. The facilitator receives, from the set of one or more parties, compensation for the subsidies based on one or more factors including a factor that reflects market success of integrated circuits produced using the phase-shifted masks. In addition to the subsidies, the facilitator may provide a variety of value-added services.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE10197112TT1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE10197112TT1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE10197112TT13</originalsourceid><addsrcrecordid>eNrjZFDxSC0qLknNySnNS1fIzCtJTS_KTC0qSS1SCE7OSMwpAQqn5vEwsKYl5hSn8kJpbgYlN9cQZw_d1IL8-NTigsTk1LzUkngXV0MDQ0tzQ0OjkBBDY6IUAQCk_SgW</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Herstellung integrierter Schaltungen</title><source>esp@cenet</source><creator>PIERRAT, CHRISTOPHE ; SHARAN, ATUL ; PATI, YAGYENSH BUNO ; WEED, TRACY J</creator><creatorcontrib>PIERRAT, CHRISTOPHE ; SHARAN, ATUL ; PATI, YAGYENSH BUNO ; WEED, TRACY J</creatorcontrib><description>Techniques are provided for manufacturing phase-shifted masks. According to one technique, a facilitator provides, on behalf of a set of one or more parties that desire masks, subsidies for production of phase-shifted masks. The manufacture of the phase-shifted masks is paid using compensation that includes the subsidies from the facilitator. One or more mask makers manufacture the phase-shifted masks for the compensation. The facilitator receives, from the set of one or more parties, compensation for the subsidies based on one or more factors including a factor that reflects market success of integrated circuits produced using the phase-shifted masks. In addition to the subsidies, the facilitator may provide a variety of value-added services.</description><edition>7</edition><language>ger</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20031120&amp;DB=EPODOC&amp;CC=DE&amp;NR=10197112T1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20031120&amp;DB=EPODOC&amp;CC=DE&amp;NR=10197112T1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>PIERRAT, CHRISTOPHE</creatorcontrib><creatorcontrib>SHARAN, ATUL</creatorcontrib><creatorcontrib>PATI, YAGYENSH BUNO</creatorcontrib><creatorcontrib>WEED, TRACY J</creatorcontrib><title>Herstellung integrierter Schaltungen</title><description>Techniques are provided for manufacturing phase-shifted masks. According to one technique, a facilitator provides, on behalf of a set of one or more parties that desire masks, subsidies for production of phase-shifted masks. The manufacture of the phase-shifted masks is paid using compensation that includes the subsidies from the facilitator. One or more mask makers manufacture the phase-shifted masks for the compensation. The facilitator receives, from the set of one or more parties, compensation for the subsidies based on one or more factors including a factor that reflects market success of integrated circuits produced using the phase-shifted masks. In addition to the subsidies, the facilitator may provide a variety of value-added services.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFDxSC0qLknNySnNS1fIzCtJTS_KTC0qSS1SCE7OSMwpAQqn5vEwsKYl5hSn8kJpbgYlN9cQZw_d1IL8-NTigsTk1LzUkngXV0MDQ0tzQ0OjkBBDY6IUAQCk_SgW</recordid><startdate>20031120</startdate><enddate>20031120</enddate><creator>PIERRAT, CHRISTOPHE</creator><creator>SHARAN, ATUL</creator><creator>PATI, YAGYENSH BUNO</creator><creator>WEED, TRACY J</creator><scope>EVB</scope></search><sort><creationdate>20031120</creationdate><title>Herstellung integrierter Schaltungen</title><author>PIERRAT, CHRISTOPHE ; SHARAN, ATUL ; PATI, YAGYENSH BUNO ; WEED, TRACY J</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE10197112TT13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>2003</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>PIERRAT, CHRISTOPHE</creatorcontrib><creatorcontrib>SHARAN, ATUL</creatorcontrib><creatorcontrib>PATI, YAGYENSH BUNO</creatorcontrib><creatorcontrib>WEED, TRACY J</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>PIERRAT, CHRISTOPHE</au><au>SHARAN, ATUL</au><au>PATI, YAGYENSH BUNO</au><au>WEED, TRACY J</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Herstellung integrierter Schaltungen</title><date>2003-11-20</date><risdate>2003</risdate><abstract>Techniques are provided for manufacturing phase-shifted masks. According to one technique, a facilitator provides, on behalf of a set of one or more parties that desire masks, subsidies for production of phase-shifted masks. The manufacture of the phase-shifted masks is paid using compensation that includes the subsidies from the facilitator. One or more mask makers manufacture the phase-shifted masks for the compensation. The facilitator receives, from the set of one or more parties, compensation for the subsidies based on one or more factors including a factor that reflects market success of integrated circuits produced using the phase-shifted masks. In addition to the subsidies, the facilitator may provide a variety of value-added services.</abstract><edition>7</edition><oa>free_for_read</oa></addata></record>
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source esp@cenet
subjects APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
title Herstellung integrierter Schaltungen
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-02T06%3A59%3A58IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=PIERRAT,%20CHRISTOPHE&rft.date=2003-11-20&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EDE10197112TT1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true