Verfahren und Vorrichtung zum Isolieren einer Hochleistungs-Radiofrequenzelektrode durch die Plasmaentladegase in eine Prozesskammer eingespritzt werden
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creator | GOLOVATO, STEPHEN N MILGATE, ROBERT W CONSOLI, PAUL LOUIS |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_DE10081173TT1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>DE10081173TT1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_DE10081173TT13</originalsourceid><addsrcrecordid>eNqNjLsKwkAQRdNYiPoPg71gsNDeB9qJBFsZsjfJks2uzuwi5Ev8XCP6AVYXzj2ccfa6QipuBJ6SN3QNIrZsYvI19amjkwZn8XlhPYSOoWwcrH4EXVzY2FAJHgm-h0MbJRiQSVI2ZCzo7Fg7ho-ODWpWkP2W6Cyhh2rLXTdkB1RD72JjH-kJMfDTbFSxU8x-O8nmh32xPS5wD7fB5RIe8bbb58vlJs_Xq6LIV39JbzIpVO0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Verfahren und Vorrichtung zum Isolieren einer Hochleistungs-Radiofrequenzelektrode durch die Plasmaentladegase in eine Prozesskammer eingespritzt werden</title><source>esp@cenet</source><creator>GOLOVATO, STEPHEN N ; MILGATE, ROBERT W ; CONSOLI, PAUL LOUIS</creator><creatorcontrib>GOLOVATO, STEPHEN N ; MILGATE, ROBERT W ; CONSOLI, PAUL LOUIS</creatorcontrib><edition>7</edition><language>ger</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2001</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010613&DB=EPODOC&CC=DE&NR=10081173T1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20010613&DB=EPODOC&CC=DE&NR=10081173T1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GOLOVATO, STEPHEN N</creatorcontrib><creatorcontrib>MILGATE, ROBERT W</creatorcontrib><creatorcontrib>CONSOLI, PAUL LOUIS</creatorcontrib><title>Verfahren und Vorrichtung zum Isolieren einer Hochleistungs-Radiofrequenzelektrode durch die Plasmaentladegase in eine Prozesskammer eingespritzt werden</title><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2001</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjLsKwkAQRdNYiPoPg71gsNDeB9qJBFsZsjfJks2uzuwi5Ev8XCP6AVYXzj2ccfa6QipuBJ6SN3QNIrZsYvI19amjkwZn8XlhPYSOoWwcrH4EXVzY2FAJHgm-h0MbJRiQSVI2ZCzo7Fg7ho-ODWpWkP2W6Cyhh2rLXTdkB1RD72JjH-kJMfDTbFSxU8x-O8nmh32xPS5wD7fB5RIe8bbb58vlJs_Xq6LIV39JbzIpVO0</recordid><startdate>20010613</startdate><enddate>20010613</enddate><creator>GOLOVATO, STEPHEN N</creator><creator>MILGATE, ROBERT W</creator><creator>CONSOLI, PAUL LOUIS</creator><scope>EVB</scope></search><sort><creationdate>20010613</creationdate><title>Verfahren und Vorrichtung zum Isolieren einer Hochleistungs-Radiofrequenzelektrode durch die Plasmaentladegase in eine Prozesskammer eingespritzt werden</title><author>GOLOVATO, STEPHEN N ; MILGATE, ROBERT W ; CONSOLI, PAUL LOUIS</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_DE10081173TT13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>ger</language><creationdate>2001</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>GOLOVATO, STEPHEN N</creatorcontrib><creatorcontrib>MILGATE, ROBERT W</creatorcontrib><creatorcontrib>CONSOLI, PAUL LOUIS</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GOLOVATO, STEPHEN N</au><au>MILGATE, ROBERT W</au><au>CONSOLI, PAUL LOUIS</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Verfahren und Vorrichtung zum Isolieren einer Hochleistungs-Radiofrequenzelektrode durch die Plasmaentladegase in eine Prozesskammer eingespritzt werden</title><date>2001-06-13</date><risdate>2001</risdate><edition>7</edition><oa>free_for_read</oa></addata></record> |
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subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
title | Verfahren und Vorrichtung zum Isolieren einer Hochleistungs-Radiofrequenzelektrode durch die Plasmaentladegase in eine Prozesskammer eingespritzt werden |
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