GLASS FOR SUBSTRATES INTENDED FOR PRODUCING ELECTRONIC PRODUCTS AND USE THEREOF

Sklo obsahuje tyto složky vyjádřené jako procentní podíly kationtů: SiO.sub.2 .n.+ B.sub.2.n.O.sub.3 .n.57 až 67 % s B.sub.2.n.O.sub.3 .n.5 až 20 % Al.sub.2.n.O.sub.3 .n.14 až 18 % RO (C.sub.a.n.O + MgO + BaO + Sro) 18 až 25 % kde CaO/RO ^sY^q 0,7 a CaO ^sY^q 18 % Na.sub.2.n.O + K.sub.2.n.O 0 až 0,5...

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Hauptverfasser: JOUSSE DIDIER, PETITMAIRE DENIS, PONTHIEU CHRISTINE, FOURNIER PASCAL
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creator JOUSSE DIDIER
PETITMAIRE DENIS
PONTHIEU CHRISTINE
FOURNIER PASCAL
description Sklo obsahuje tyto složky vyjádřené jako procentní podíly kationtů: SiO.sub.2 .n.+ B.sub.2.n.O.sub.3 .n.57 až 67 % s B.sub.2.n.O.sub.3 .n.5 až 20 % Al.sub.2.n.O.sub.3 .n.14 až 18 % RO (C.sub.a.n.O + MgO + BaO + Sro) 18 až 25 % kde CaO/RO ^sY^q 0,7 a CaO ^sY^q 18 % Na.sub.2.n.O + K.sub.2.n.O 0 až 0,5 % TiO.sub.2 .n.0 až 2,5 % Fe.sub.2.n.O.sub.3 .n.^sZ^q 0,5 % F.sub.2 .n.0 až 3 % kde F.sub.2 .n.je uvažován jako kation. Použití k výrobě aktivních maticových displejů.ŕ Glass compositions intended to form a substrate employed for the production of electronic hardware. The glasses according to the invention comprise the following constituents within the limits below, expressed as cation percentages: SiO2 + B2O3 57 to 67 % with B2O3 5 to 20 % Al2O3 14 to 18 % RO (CaO + MgO + BaO + SrO) 18 to 25 % with CaO/RO >/= 0.7 and CaO >/= 18 % Na2O + K2O 0 to 0.5 % TiO2 0 to 2.5 % Fe2O3
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Použití k výrobě aktivních maticových displejů.ŕ Glass compositions intended to form a substrate employed for the production of electronic hardware. The glasses according to the invention comprise the following constituents within the limits below, expressed as cation percentages: SiO2 + B2O3 57 to 67 % with B2O3 5 to 20 % Al2O3 14 to 18 % RO (CaO + MgO + BaO + SrO) 18 to 25 % with CaO/RO &gt;/= 0.7 and CaO &gt;/= 18 % Na2O + K2O 0 to 0.5 % TiO2 0 to 2.5 % Fe2O3 &lt;/= 0.5 % F2 0 to 3 % F2 being treated as a cation. 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Použití k výrobě aktivních maticových displejů.ŕ Glass compositions intended to form a substrate employed for the production of electronic hardware. The glasses according to the invention comprise the following constituents within the limits below, expressed as cation percentages: SiO2 + B2O3 57 to 67 % with B2O3 5 to 20 % Al2O3 14 to 18 % RO (CaO + MgO + BaO + SrO) 18 to 25 % with CaO/RO &gt;/= 0.7 and CaO &gt;/= 18 % Na2O + K2O 0 to 0.5 % TiO2 0 to 2.5 % Fe2O3 &lt;/= 0.5 % F2 0 to 3 % F2 being treated as a cation. 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PETITMAIRE DENIS ; PONTHIEU CHRISTINE ; FOURNIER PASCAL</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CZ285653B63</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>cze ; eng</language><creationdate>1999</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS</topic><topic>CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS</topic><topic>CHEMISTRY</topic><topic>DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FREQUENCY-CHANGING</topic><topic>GLASS</topic><topic>JOINING GLASS TO GLASS OR OTHER MATERIALS</topic><topic>MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS</topic><topic>METALLURGY</topic><topic>MINERAL OR SLAG WOOL</topic><topic>NON-LINEAR OPTICS</topic><topic>OPTICAL ANALOGUE/DIGITAL CONVERTERS</topic><topic>OPTICAL LOGIC ELEMENTS</topic><topic>OPTICS</topic><topic>PHYSICS</topic><topic>PRINTED CIRCUITS</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS</topic><topic>SURFACE TREATMENT OF GLASS</topic><topic>TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF</topic><toplevel>online_resources</toplevel><creatorcontrib>JOUSSE DIDIER</creatorcontrib><creatorcontrib>PETITMAIRE DENIS</creatorcontrib><creatorcontrib>PONTHIEU CHRISTINE</creatorcontrib><creatorcontrib>FOURNIER PASCAL</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>JOUSSE DIDIER</au><au>PETITMAIRE DENIS</au><au>PONTHIEU CHRISTINE</au><au>FOURNIER PASCAL</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>GLASS FOR SUBSTRATES INTENDED FOR PRODUCING ELECTRONIC PRODUCTS AND USE THEREOF</title><date>1999-10-13</date><risdate>1999</risdate><abstract>Sklo obsahuje tyto složky vyjádřené jako procentní podíly kationtů: SiO.sub.2 .n.+ B.sub.2.n.O.sub.3 .n.57 až 67 % s B.sub.2.n.O.sub.3 .n.5 až 20 % Al.sub.2.n.O.sub.3 .n.14 až 18 % RO (C.sub.a.n.O + MgO + BaO + Sro) 18 až 25 % kde CaO/RO ^sY^q 0,7 a CaO ^sY^q 18 % Na.sub.2.n.O + K.sub.2.n.O 0 až 0,5 % TiO.sub.2 .n.0 až 2,5 % Fe.sub.2.n.O.sub.3 .n.^sZ^q 0,5 % F.sub.2 .n.0 až 3 % kde F.sub.2 .n.je uvažován jako kation. Použití k výrobě aktivních maticových displejů.ŕ Glass compositions intended to form a substrate employed for the production of electronic hardware. The glasses according to the invention comprise the following constituents within the limits below, expressed as cation percentages: SiO2 + B2O3 57 to 67 % with B2O3 5 to 20 % Al2O3 14 to 18 % RO (CaO + MgO + BaO + SrO) 18 to 25 % with CaO/RO &gt;/= 0.7 and CaO &gt;/= 18 % Na2O + K2O 0 to 0.5 % TiO2 0 to 2.5 % Fe2O3 &lt;/= 0.5 % F2 0 to 3 % F2 being treated as a cation. Application to the production of active matrix screens.</abstract><edition>6</edition><oa>free_for_read</oa></addata></record>
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language cze ; eng
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subjects BASIC ELECTRIC ELEMENTS
CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS
CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS
CHEMISTRY
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FREQUENCY-CHANGING
GLASS
JOINING GLASS TO GLASS OR OTHER MATERIALS
MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
METALLURGY
MINERAL OR SLAG WOOL
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
PRINTED CIRCUITS
SEMICONDUCTOR DEVICES
SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS
SURFACE TREATMENT OF GLASS
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
title GLASS FOR SUBSTRATES INTENDED FOR PRODUCING ELECTRONIC PRODUCTS AND USE THEREOF
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