ZPUSOB KONTROLY VYVOLAVANI FOTOCHEMICKYCH MATERIALU

Gespeichert in:

Bibliographische Detailangaben
1. Verfasser:	HOLAN JIRI RNCSC
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

container_end_page
container_issue
container_start_page
container_title
container_volume
creator	HOLAN JIRI RNCSC
description
format	Patent
fullrecord	<record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CS8502071A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CS8502071A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CS8502071A13</originalsourceid><addsrcrecordid>eNrjZDCOCggN9ndS8Pb3Cwny94lUCIsM8_dxDHP081Rw8w_xd_Zw9fV09o509lDwdQxxDfJ09AnlYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxzsEWpgZGBuaGjobGRCgBAKShJ1o</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ZPUSOB KONTROLY VYVOLAVANI FOTOCHEMICKYCH MATERIALU</title><source>esp@cenet</source><creator>HOLAN JIRI RNCSC</creator><creatorcontrib>HOLAN JIRI RNCSC</creatorcontrib><edition>3</edition><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>1985</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19850815&DB=EPODOC&CC=CS&NR=8502071A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19850815&DB=EPODOC&CC=CS&NR=8502071A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HOLAN JIRI RNCSC</creatorcontrib><title>ZPUSOB KONTROLY VYVOLAVANI FOTOCHEMICKYCH MATERIALU</title><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1985</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDCOCggN9ndS8Pb3Cwny94lUCIsM8_dxDHP081Rw8w_xd_Zw9fV09o509lDwdQxxDfJ09AnlYWBNS8wpTuWF0twMCm6uIc4euqkF-fGpxQWJyal5qSXxzsEWpgZGBuaGjobGRCgBAKShJ1o</recordid><startdate>19850815</startdate><enddate>19850815</enddate><creator>HOLAN JIRI RNCSC</creator><scope>EVB</scope></search><sort><creationdate>19850815</creationdate><title>ZPUSOB KONTROLY VYVOLAVANI FOTOCHEMICKYCH MATERIALU</title><author>HOLAN JIRI RNCSC</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CS8502071A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1985</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>HOLAN JIRI RNCSC</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HOLAN JIRI RNCSC</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ZPUSOB KONTROLY VYVOLAVANI FOTOCHEMICKYCH MATERIALU</title><date>1985-08-15</date><risdate>1985</risdate><edition>3</edition><oa>free_for_read</oa></addata></record>
fulltext	fulltext_linktorsrc
identifier
ispartof
issn
language	eng
recordid	cdi_epo_espacenet_CS8502071A1
source	esp@cenet
subjects	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
title	ZPUSOB KONTROLY VYVOLAVANI FOTOCHEMICKYCH MATERIALU
url	https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-29T10%3A15%3A33IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=HOLAN%20JIRI%20RNCSC&rft.date=1985-08-15&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECS8502071A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true