Film making equipment
The utility model provides film manufacturing equipment. The film manufacturing equipment comprises a vacuum device, a coating device and an annealing device. The vacuum device comprises a box body, a vacuum pump and an inflator pump, a working cavity is formed in the box body, the vacuum pump and t...
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| creator | LI ZIKUN ZHANG MENG TIAN GANGQI HUANG YOUYUAN XU FAN |
| description | The utility model provides film manufacturing equipment. The film manufacturing equipment comprises a vacuum device, a coating device and an annealing device. The vacuum device comprises a box body, a vacuum pump and an inflator pump, a working cavity is formed in the box body, the vacuum pump and the inflator pump are both communicated with the working cavity, the vacuum pump is used for pumping out gas in the working cavity, and the inflator pump is used for filling inert gas into the working cavity. The coating device is mounted in the working cavity and is used for coating a preset substrate with a film layer; the annealing device is installed in the working cavity and used for conducting annealing treatment on the substrate coated with the film layer. Wherein the annealing device is located on one side of the coating device, and the distance between the annealing device and the coating device is smaller than or equal to 5 cm. According to the film preparation equipment provided by the invention, the tech |
| format | Patent |
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The vacuum device comprises a box body, a vacuum pump and an inflator pump, a working cavity is formed in the box body, the vacuum pump and the inflator pump are both communicated with the working cavity, the vacuum pump is used for pumping out gas in the working cavity, and the inflator pump is used for filling inert gas into the working cavity. The coating device is mounted in the working cavity and is used for coating a preset substrate with a film layer; the annealing device is installed in the working cavity and used for conducting annealing treatment on the substrate coated with the film layer. Wherein the annealing device is located on one side of the coating device, and the distance between the annealing device and the coating device is smaller than or equal to 5 cm. According to the film preparation equipment provided by the invention, the tech</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240920&DB=EPODOC&CC=CN&NR=221740442U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240920&DB=EPODOC&CC=CN&NR=221740442U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LI ZIKUN</creatorcontrib><creatorcontrib>ZHANG MENG</creatorcontrib><creatorcontrib>TIAN GANGQI</creatorcontrib><creatorcontrib>HUANG YOUYUAN</creatorcontrib><creatorcontrib>XU FAN</creatorcontrib><title>Film making equipment</title><description>The utility model provides film manufacturing equipment. The film manufacturing equipment comprises a vacuum device, a coating device and an annealing device. The vacuum device comprises a box body, a vacuum pump and an inflator pump, a working cavity is formed in the box body, the vacuum pump and the inflator pump are both communicated with the working cavity, the vacuum pump is used for pumping out gas in the working cavity, and the inflator pump is used for filling inert gas into the working cavity. The coating device is mounted in the working cavity and is used for coating a preset substrate with a film layer; the annealing device is installed in the working cavity and used for conducting annealing treatment on the substrate coated with the film layer. Wherein the annealing device is located on one side of the coating device, and the distance between the annealing device and the coating device is smaller than or equal to 5 cm. According to the film preparation equipment provided by the invention, the tech</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZBB1y8zJVchNzM7MS1dILSzNLMhNzSvhYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxzn5GRobmJgYmJkahocZEKQIAtZsh2w</recordid><startdate>20240920</startdate><enddate>20240920</enddate><creator>LI ZIKUN</creator><creator>ZHANG MENG</creator><creator>TIAN GANGQI</creator><creator>HUANG YOUYUAN</creator><creator>XU FAN</creator><scope>EVB</scope></search><sort><creationdate>20240920</creationdate><title>Film making equipment</title><author>LI ZIKUN ; ZHANG MENG ; TIAN GANGQI ; HUANG YOUYUAN ; XU FAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN221740442UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>LI ZIKUN</creatorcontrib><creatorcontrib>ZHANG MENG</creatorcontrib><creatorcontrib>TIAN GANGQI</creatorcontrib><creatorcontrib>HUANG YOUYUAN</creatorcontrib><creatorcontrib>XU FAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LI ZIKUN</au><au>ZHANG MENG</au><au>TIAN GANGQI</au><au>HUANG YOUYUAN</au><au>XU FAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Film making equipment</title><date>2024-09-20</date><risdate>2024</risdate><abstract>The utility model provides film manufacturing equipment. The film manufacturing equipment comprises a vacuum device, a coating device and an annealing device. The vacuum device comprises a box body, a vacuum pump and an inflator pump, a working cavity is formed in the box body, the vacuum pump and the inflator pump are both communicated with the working cavity, the vacuum pump is used for pumping out gas in the working cavity, and the inflator pump is used for filling inert gas into the working cavity. The coating device is mounted in the working cavity and is used for coating a preset substrate with a film layer; the annealing device is installed in the working cavity and used for conducting annealing treatment on the substrate coated with the film layer. Wherein the annealing device is located on one side of the coating device, and the distance between the annealing device and the coating device is smaller than or equal to 5 cm. According to the film preparation equipment provided by the invention, the tech</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Film making equipment |
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