Clean type drying tunnel equipment
The utility model relates to the field of silicon wafer drying equipment, in particular to clean type drying tunnel equipment. The embodiment of the utility model provides clean type drying tunnel equipment which comprises a plurality of continuously arranged drying chambers, and air inlets are form...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The utility model relates to the field of silicon wafer drying equipment, in particular to clean type drying tunnel equipment. The embodiment of the utility model provides clean type drying tunnel equipment which comprises a plurality of continuously arranged drying chambers, and air inlets are formed in the tops of the drying chambers. And the air inlet is formed in the top of the drying chamber, so that air is blown from top to bottom, and the silicon wafers are uniformly dried. And the isolation doors are arranged between the drying chambers, so that hot air in the drying chambers is prevented from running away. And the exhaust fan is arranged, hot air circulation is formed, and the drying effect is good. A water guide tip is installed at the movable end of the jacking device, the piece basket can be jacked up in the feeding process, and large water drops on a bottom rod of the piece basket are removed.
本实用新型涉及硅片烘干设备领域,具体涉及一种洁净型烘干隧道设备。本实用新型实施例提供了一种洁净型烘干隧道设备,包括:若干连续设置的烘干腔室,所述烘干腔室的顶部设置有进气口。通过在烘干腔室顶部设置进气口,使得风 |
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