Long-durability type semiconductor CVD (Chemical Vapor Deposition) cavity sealing device
The utility model discloses a long durable semiconductor CVD cavity sealing device which comprises a cover body and a base, the cover body is embedded in the upper end face of the base, an annular hydraulic cavity is formed in the bottom of the base, a sealing ring connected in a sliding and sealing...
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| creator | HE TINGTING WANG FAN TAO YUEYU TAO JINWENG QIU LIGONG |
| description | The utility model discloses a long durable semiconductor CVD cavity sealing device which comprises a cover body and a base, the cover body is embedded in the upper end face of the base, an annular hydraulic cavity is formed in the bottom of the base, a sealing ring connected in a sliding and sealing mode is arranged in the annular hydraulic cavity, and a hydraulic sleeve is arranged on the upper end face of the base. The hydraulic sleeve is in through connection with the annular hydraulic cavity, and hydraulic oil and a hydraulic piston are arranged in the hydraulic sleeve. A traditional silica gel sealing ring is replaced by the hydraulic sealing ring structure, the oxidation resistance of the sealing ring is greatly improved, the service life of the sealing ring is prolonged, the equipment maintenance frequency is reduced, the labor cost is reduced, and the service life of the sealing ring is prolonged through cooperation of the lead screw, the hydraulic piston and the hydraulic sleeve under the condition t |
| format | Patent |
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The hydraulic sleeve is in through connection with the annular hydraulic cavity, and hydraulic oil and a hydraulic piston are arranged in the hydraulic sleeve. A traditional silica gel sealing ring is replaced by the hydraulic sealing ring structure, the oxidation resistance of the sealing ring is greatly improved, the service life of the sealing ring is prolonged, the equipment maintenance frequency is reduced, the labor cost is reduced, and the service life of the sealing ring is prolonged through cooperation of the lead screw, the hydraulic piston and the hydraulic sleeve under the condition t</description><language>chi ; eng</language><subject>BLASTING ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; CYLINDERS ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ENGINEERING ELEMENTS AND UNITS ; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS ; HEATING ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; LIGHTING ; MECHANICAL ENGINEERING ; METALLURGY ; PISTONS ; SEALINGS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION ; THERMAL INSULATION IN GENERAL ; WEAPONS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240531&DB=EPODOC&CC=CN&NR=221054281U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240531&DB=EPODOC&CC=CN&NR=221054281U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>HE TINGTING</creatorcontrib><creatorcontrib>WANG FAN</creatorcontrib><creatorcontrib>TAO YUEYU</creatorcontrib><creatorcontrib>TAO JINWENG</creatorcontrib><creatorcontrib>QIU LIGONG</creatorcontrib><title>Long-durability type semiconductor CVD (Chemical Vapor Deposition) cavity sealing device</title><description>The utility model discloses a long durable semiconductor CVD cavity sealing device which comprises a cover body and a base, the cover body is embedded in the upper end face of the base, an annular hydraulic cavity is formed in the bottom of the base, a sealing ring connected in a sliding and sealing mode is arranged in the annular hydraulic cavity, and a hydraulic sleeve is arranged on the upper end face of the base. The hydraulic sleeve is in through connection with the annular hydraulic cavity, and hydraulic oil and a hydraulic piston are arranged in the hydraulic sleeve. A traditional silica gel sealing ring is replaced by the hydraulic sealing ring structure, the oxidation resistance of the sealing ring is greatly improved, the service life of the sealing ring is prolonged, the equipment maintenance frequency is reduced, the labor cost is reduced, and the service life of the sealing ring is prolonged through cooperation of the lead screw, the hydraulic piston and the hydraulic sleeve under the condition t</description><subject>BLASTING</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>CYLINDERS</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ENGINEERING ELEMENTS AND UNITS</subject><subject>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</subject><subject>HEATING</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>LIGHTING</subject><subject>MECHANICAL ENGINEERING</subject><subject>METALLURGY</subject><subject>PISTONS</subject><subject>SEALINGS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><subject>THERMAL INSULATION IN GENERAL</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZIjwyc9L100pLUpMyszJLKlUKKksSFUoTs3NTM7PSylNLskvUnAOc1HQcM4AiSXmKIQlFgDFXFIL8oszSzLz8zQVkhPLQDqLUxNzMvPSFVJSyzKTU3kYWNMSc4pTeaE0N4OSm2uIs4cuUGN8anFBYnJqXmpJvLOfkZGhgamJkYVhaKgxUYoA6nE6qQ</recordid><startdate>20240531</startdate><enddate>20240531</enddate><creator>HE TINGTING</creator><creator>WANG FAN</creator><creator>TAO YUEYU</creator><creator>TAO JINWENG</creator><creator>QIU LIGONG</creator><scope>EVB</scope></search><sort><creationdate>20240531</creationdate><title>Long-durability type semiconductor CVD (Chemical Vapor Deposition) cavity sealing device</title><author>HE TINGTING ; WANG FAN ; TAO YUEYU ; TAO JINWENG ; QIU LIGONG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN221054281UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>BLASTING</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>CYLINDERS</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ENGINEERING ELEMENTS AND UNITS</topic><topic>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</topic><topic>HEATING</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>LIGHTING</topic><topic>MECHANICAL ENGINEERING</topic><topic>METALLURGY</topic><topic>PISTONS</topic><topic>SEALINGS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><topic>THERMAL INSULATION IN GENERAL</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>HE TINGTING</creatorcontrib><creatorcontrib>WANG FAN</creatorcontrib><creatorcontrib>TAO YUEYU</creatorcontrib><creatorcontrib>TAO JINWENG</creatorcontrib><creatorcontrib>QIU LIGONG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HE TINGTING</au><au>WANG FAN</au><au>TAO YUEYU</au><au>TAO JINWENG</au><au>QIU LIGONG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Long-durability type semiconductor CVD (Chemical Vapor Deposition) cavity sealing device</title><date>2024-05-31</date><risdate>2024</risdate><abstract>The utility model discloses a long durable semiconductor CVD cavity sealing device which comprises a cover body and a base, the cover body is embedded in the upper end face of the base, an annular hydraulic cavity is formed in the bottom of the base, a sealing ring connected in a sliding and sealing mode is arranged in the annular hydraulic cavity, and a hydraulic sleeve is arranged on the upper end face of the base. The hydraulic sleeve is in through connection with the annular hydraulic cavity, and hydraulic oil and a hydraulic piston are arranged in the hydraulic sleeve. A traditional silica gel sealing ring is replaced by the hydraulic sealing ring structure, the oxidation resistance of the sealing ring is greatly improved, the service life of the sealing ring is prolonged, the equipment maintenance frequency is reduced, the labor cost is reduced, and the service life of the sealing ring is prolonged through cooperation of the lead screw, the hydraulic piston and the hydraulic sleeve under the condition t</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | BLASTING CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL CYLINDERS DIFFUSION TREATMENT OF METALLIC MATERIAL ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL LIGHTING MECHANICAL ENGINEERING METALLURGY PISTONS SEALINGS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION THERMAL INSULATION IN GENERAL WEAPONS |
| title | Long-durability type semiconductor CVD (Chemical Vapor Deposition) cavity sealing device |
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