Multi-field coupling enhanced plasma surface treatment device

The utility model discloses a multi-field coupling enhanced plasma surface treatment device, and relates to the technical field of plasmas. The multi-field coupling enhanced plasma surface treatment device comprises a microwave source, a circulator, a rectangular waveguide, a reaction cavity, a dual...

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Bibliographische Detailangaben
Hauptverfasser: ZHENG CHANGKUAN, CHEN BAIQIAO, LI YONGQING, WANG QUN
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The utility model discloses a multi-field coupling enhanced plasma surface treatment device, and relates to the technical field of plasmas. The multi-field coupling enhanced plasma surface treatment device comprises a microwave source, a circulator, a rectangular waveguide, a reaction cavity, a dual-electrode electric field auxiliary enhancement structure and a magnetic field auxiliary enhancement structure. According to the device, energy with specific frequency and mode is fed into a reaction cavity through a microwave assembly to excite plasma; a dual-electrode electric field auxiliary enhancement structure is introduced into the reaction cavity, and a local electric field is formed in the reaction cavity; in addition, a magnetic field auxiliary enhancing structure is arranged at the lower bottom of the reaction cavity, and a static magnetic field is applied to the reaction area; according to the device, under the condition that the adjustable range of microwave source voltage and frequency is limited, the