Multi-field coupling enhanced plasma surface treatment device
The utility model discloses a multi-field coupling enhanced plasma surface treatment device, and relates to the technical field of plasmas. The multi-field coupling enhanced plasma surface treatment device comprises a microwave source, a circulator, a rectangular waveguide, a reaction cavity, a dual...
Gespeichert in:
Hauptverfasser: | , , , |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The utility model discloses a multi-field coupling enhanced plasma surface treatment device, and relates to the technical field of plasmas. The multi-field coupling enhanced plasma surface treatment device comprises a microwave source, a circulator, a rectangular waveguide, a reaction cavity, a dual-electrode electric field auxiliary enhancement structure and a magnetic field auxiliary enhancement structure. According to the device, energy with specific frequency and mode is fed into a reaction cavity through a microwave assembly to excite plasma; a dual-electrode electric field auxiliary enhancement structure is introduced into the reaction cavity, and a local electric field is formed in the reaction cavity; in addition, a magnetic field auxiliary enhancing structure is arranged at the lower bottom of the reaction cavity, and a static magnetic field is applied to the reaction area; according to the device, under the condition that the adjustable range of microwave source voltage and frequency is limited, the |
---|