Dressing wheel and dressing device
The utility model relates to a dressing wheel and a dressing device, and the dressing wheel is arranged on a rack of the dressing device and can revolve and rotate relative to a polishing pad so as to dressing the polishing pad. The dressing wheel comprises a dressing wheel body and a dressing piece...
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creator | ZHU LIANG CHEN JIANGUO ZHANG XUECHUN DUAN AOQIANG LI YANGJIAN |
description | The utility model relates to a dressing wheel and a dressing device, and the dressing wheel is arranged on a rack of the dressing device and can revolve and rotate relative to a polishing pad so as to dressing the polishing pad. The dressing wheel comprises a dressing wheel body and a dressing piece, the dressing wheel body is provided with a first through hole and a through hole group, the first through hole and the dressing wheel body are concentrically arranged, and the through hole group comprises a second through hole which is arranged at an interval with the first through hole; the dressing piece is detachably installed in at least one of the first through hole and the second through hole, and the thickness of the dressing piece is larger than that of the dressing wheel body. In this way, the dressing range of the dressing wheel can be adjusted by adjusting the mounting position of the dressing piece, the overall shape and the local shape of the polishing pad can be dressed under the condition that the |
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fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN220740734UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN220740734UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN220740734UU3</originalsourceid><addsrcrecordid>eNrjZFByKUotLs7MS1coz0hNzVFIzEtRSIEJpaSWZSan8jCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeGc_IyMDcxMDc2OT0FBjohQBAPPzJq0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Dressing wheel and dressing device</title><source>esp@cenet</source><creator>ZHU LIANG ; CHEN JIANGUO ; ZHANG XUECHUN ; DUAN AOQIANG ; LI YANGJIAN</creator><creatorcontrib>ZHU LIANG ; CHEN JIANGUO ; ZHANG XUECHUN ; DUAN AOQIANG ; LI YANGJIAN</creatorcontrib><description>The utility model relates to a dressing wheel and a dressing device, and the dressing wheel is arranged on a rack of the dressing device and can revolve and rotate relative to a polishing pad so as to dressing the polishing pad. The dressing wheel comprises a dressing wheel body and a dressing piece, the dressing wheel body is provided with a first through hole and a through hole group, the first through hole and the dressing wheel body are concentrically arranged, and the through hole group comprises a second through hole which is arranged at an interval with the first through hole; the dressing piece is detachably installed in at least one of the first through hole and the second through hole, and the thickness of the dressing piece is larger than that of the dressing wheel body. In this way, the dressing range of the dressing wheel can be adjusted by adjusting the mounting position of the dressing piece, the overall shape and the local shape of the polishing pad can be dressed under the condition that the</description><language>chi ; eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240409&DB=EPODOC&CC=CN&NR=220740734U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240409&DB=EPODOC&CC=CN&NR=220740734U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZHU LIANG</creatorcontrib><creatorcontrib>CHEN JIANGUO</creatorcontrib><creatorcontrib>ZHANG XUECHUN</creatorcontrib><creatorcontrib>DUAN AOQIANG</creatorcontrib><creatorcontrib>LI YANGJIAN</creatorcontrib><title>Dressing wheel and dressing device</title><description>The utility model relates to a dressing wheel and a dressing device, and the dressing wheel is arranged on a rack of the dressing device and can revolve and rotate relative to a polishing pad so as to dressing the polishing pad. The dressing wheel comprises a dressing wheel body and a dressing piece, the dressing wheel body is provided with a first through hole and a through hole group, the first through hole and the dressing wheel body are concentrically arranged, and the through hole group comprises a second through hole which is arranged at an interval with the first through hole; the dressing piece is detachably installed in at least one of the first through hole and the second through hole, and the thickness of the dressing piece is larger than that of the dressing wheel body. In this way, the dressing range of the dressing wheel can be adjusted by adjusting the mounting position of the dressing piece, the overall shape and the local shape of the polishing pad can be dressed under the condition that the</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFByKUotLs7MS1coz0hNzVFIzEtRSIEJpaSWZSan8jCwpiXmFKfyQmluBiU31xBnD93Ugvz41OKCxOTUvNSSeGc_IyMDcxMDc2OT0FBjohQBAPPzJq0</recordid><startdate>20240409</startdate><enddate>20240409</enddate><creator>ZHU LIANG</creator><creator>CHEN JIANGUO</creator><creator>ZHANG XUECHUN</creator><creator>DUAN AOQIANG</creator><creator>LI YANGJIAN</creator><scope>EVB</scope></search><sort><creationdate>20240409</creationdate><title>Dressing wheel and dressing device</title><author>ZHU LIANG ; CHEN JIANGUO ; ZHANG XUECHUN ; DUAN AOQIANG ; LI YANGJIAN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN220740734UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2024</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>ZHU LIANG</creatorcontrib><creatorcontrib>CHEN JIANGUO</creatorcontrib><creatorcontrib>ZHANG XUECHUN</creatorcontrib><creatorcontrib>DUAN AOQIANG</creatorcontrib><creatorcontrib>LI YANGJIAN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZHU LIANG</au><au>CHEN JIANGUO</au><au>ZHANG XUECHUN</au><au>DUAN AOQIANG</au><au>LI YANGJIAN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Dressing wheel and dressing device</title><date>2024-04-09</date><risdate>2024</risdate><abstract>The utility model relates to a dressing wheel and a dressing device, and the dressing wheel is arranged on a rack of the dressing device and can revolve and rotate relative to a polishing pad so as to dressing the polishing pad. The dressing wheel comprises a dressing wheel body and a dressing piece, the dressing wheel body is provided with a first through hole and a through hole group, the first through hole and the dressing wheel body are concentrically arranged, and the through hole group comprises a second through hole which is arranged at an interval with the first through hole; the dressing piece is detachably installed in at least one of the first through hole and the second through hole, and the thickness of the dressing piece is larger than that of the dressing wheel body. In this way, the dressing range of the dressing wheel can be adjusted by adjusting the mounting position of the dressing piece, the overall shape and the local shape of the polishing pad can be dressed under the condition that the</abstract><oa>free_for_read</oa></addata></record> |
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language | chi ; eng |
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subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
title | Dressing wheel and dressing device |
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