Reciprocating rectilinear motion device for base
The utility model discloses a base reciprocating rectilinear motion device, which relates to the technical field of grinding machine grinding wheel dressing bases and comprises a bottom supporting piece, the two sides of the bottom supporting piece are respectively arranged on a grinding machine thr...
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| creator | TANG PEIXIAN GUI SHAOWEN TANG XIAOQI LIU CHENGYONG LIU ZEMIN GUO HAIPING ZHANG QIANG LIU YINHUI ZENG ZHAOLI SHU HUI MA YUNFEI DENG YUSHU LIN GANG WANG ZHIGANG |
| description | The utility model discloses a base reciprocating rectilinear motion device, which relates to the technical field of grinding machine grinding wheel dressing bases and comprises a bottom supporting piece, the two sides of the bottom supporting piece are respectively arranged on a grinding machine through a first clamping mechanism and a second clamping mechanism, and a guide piece arranged on the bottom supporting piece in parallel is matched with a sliding piece below a base body. A supporting seat is arranged on the base body, and the base body can do reciprocating rectilinear motion above the guiding piece. The silicon carbide grinding wheel dressing device can be borne, detachable connection between the silicon carbide grinding wheel dressing device and a grinding machine can be achieved, reciprocating rectilinear motion of the base can be achieved, a traditional machining mode that enterprise staff disassemble frequently is replaced, influences caused by reduction of circle run-out precision due to repeat |
| format | Patent |
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A supporting seat is arranged on the base body, and the base body can do reciprocating rectilinear motion above the guiding piece. The silicon carbide grinding wheel dressing device can be borne, detachable connection between the silicon carbide grinding wheel dressing device and a grinding machine can be achieved, reciprocating rectilinear motion of the base can be achieved, a traditional machining mode that enterprise staff disassemble frequently is replaced, influences caused by reduction of circle run-out precision due to repeat</description><language>chi ; eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230926&DB=EPODOC&CC=CN&NR=219747447U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25544,76293</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230926&DB=EPODOC&CC=CN&NR=219747447U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TANG PEIXIAN</creatorcontrib><creatorcontrib>GUI SHAOWEN</creatorcontrib><creatorcontrib>TANG XIAOQI</creatorcontrib><creatorcontrib>LIU CHENGYONG</creatorcontrib><creatorcontrib>LIU ZEMIN</creatorcontrib><creatorcontrib>GUO HAIPING</creatorcontrib><creatorcontrib>ZHANG QIANG</creatorcontrib><creatorcontrib>LIU YINHUI</creatorcontrib><creatorcontrib>ZENG ZHAOLI</creatorcontrib><creatorcontrib>SHU HUI</creatorcontrib><creatorcontrib>MA YUNFEI</creatorcontrib><creatorcontrib>DENG YUSHU</creatorcontrib><creatorcontrib>LIN GANG</creatorcontrib><creatorcontrib>WANG ZHIGANG</creatorcontrib><title>Reciprocating rectilinear motion device for base</title><description>The utility model discloses a base reciprocating rectilinear motion device, which relates to the technical field of grinding machine grinding wheel dressing bases and comprises a bottom supporting piece, the two sides of the bottom supporting piece are respectively arranged on a grinding machine through a first clamping mechanism and a second clamping mechanism, and a guide piece arranged on the bottom supporting piece in parallel is matched with a sliding piece below a base body. A supporting seat is arranged on the base body, and the base body can do reciprocating rectilinear motion above the guiding piece. The silicon carbide grinding wheel dressing device can be borne, detachable connection between the silicon carbide grinding wheel dressing device and a grinding machine can be achieved, reciprocating rectilinear motion of the base can be achieved, a traditional machining mode that enterprise staff disassemble frequently is replaced, influences caused by reduction of circle run-out precision due to repeat</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZDAISk3OLCjKT04sycxLVyhKTS7JzMnMS00sUsjNL8nMz1NISS3LTE5VSMsvUkhKLE7lYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxzn5GhpbmJuYmJuahocZEKQIA4CwsaQ</recordid><startdate>20230926</startdate><enddate>20230926</enddate><creator>TANG PEIXIAN</creator><creator>GUI SHAOWEN</creator><creator>TANG XIAOQI</creator><creator>LIU CHENGYONG</creator><creator>LIU ZEMIN</creator><creator>GUO HAIPING</creator><creator>ZHANG QIANG</creator><creator>LIU YINHUI</creator><creator>ZENG ZHAOLI</creator><creator>SHU HUI</creator><creator>MA YUNFEI</creator><creator>DENG YUSHU</creator><creator>LIN GANG</creator><creator>WANG ZHIGANG</creator><scope>EVB</scope></search><sort><creationdate>20230926</creationdate><title>Reciprocating rectilinear motion device for base</title><author>TANG PEIXIAN ; GUI SHAOWEN ; TANG XIAOQI ; LIU CHENGYONG ; LIU ZEMIN ; GUO HAIPING ; ZHANG QIANG ; LIU YINHUI ; ZENG ZHAOLI ; SHU HUI ; MA YUNFEI ; DENG YUSHU ; LIN GANG ; WANG ZHIGANG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN219747447UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>TANG PEIXIAN</creatorcontrib><creatorcontrib>GUI SHAOWEN</creatorcontrib><creatorcontrib>TANG XIAOQI</creatorcontrib><creatorcontrib>LIU CHENGYONG</creatorcontrib><creatorcontrib>LIU ZEMIN</creatorcontrib><creatorcontrib>GUO HAIPING</creatorcontrib><creatorcontrib>ZHANG QIANG</creatorcontrib><creatorcontrib>LIU YINHUI</creatorcontrib><creatorcontrib>ZENG ZHAOLI</creatorcontrib><creatorcontrib>SHU HUI</creatorcontrib><creatorcontrib>MA YUNFEI</creatorcontrib><creatorcontrib>DENG YUSHU</creatorcontrib><creatorcontrib>LIN GANG</creatorcontrib><creatorcontrib>WANG ZHIGANG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TANG PEIXIAN</au><au>GUI SHAOWEN</au><au>TANG XIAOQI</au><au>LIU CHENGYONG</au><au>LIU ZEMIN</au><au>GUO HAIPING</au><au>ZHANG QIANG</au><au>LIU YINHUI</au><au>ZENG ZHAOLI</au><au>SHU HUI</au><au>MA YUNFEI</au><au>DENG YUSHU</au><au>LIN GANG</au><au>WANG ZHIGANG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Reciprocating rectilinear motion device for base</title><date>2023-09-26</date><risdate>2023</risdate><abstract>The utility model discloses a base reciprocating rectilinear motion device, which relates to the technical field of grinding machine grinding wheel dressing bases and comprises a bottom supporting piece, the two sides of the bottom supporting piece are respectively arranged on a grinding machine through a first clamping mechanism and a second clamping mechanism, and a guide piece arranged on the bottom supporting piece in parallel is matched with a sliding piece below a base body. A supporting seat is arranged on the base body, and the base body can do reciprocating rectilinear motion above the guiding piece. The silicon carbide grinding wheel dressing device can be borne, detachable connection between the silicon carbide grinding wheel dressing device and a grinding machine can be achieved, reciprocating rectilinear motion of the base can be achieved, a traditional machining mode that enterprise staff disassemble frequently is replaced, influences caused by reduction of circle run-out precision due to repeat</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
| title | Reciprocating rectilinear motion device for base |
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