Substrate processing apparatus

The utility model provides a substrate processing device which can improve convenience related to coating of coating liquid on a substrate. The resist coating device is provided with: a rotation holding plate that holds and rotates a substrate; a cup disposed so as to surround the substrate held by the rotation holding disk; and a coating liquid nozzle configured so as to be able to discharge the coating liquid onto the substrate. Furthermore, the resist coating device is provided with a removal liquid nozzle and a nozzle tracking camera, the nozzle tracking camera moves in a manner of tracking the coating liquid nozzle by being mounted on a nozzle arm for holding the coating liquid nozzle, and the nozzle tracking camera is configured to be capable of shooting the coating liquid nozzle. Moreover, the resist coating device is provided with a processing space camera, and the processing space camera is configured to be capable of shooting the processing space on the rotation holding disc. 本实用新型提供一种基板处理装置，能够提高与对基