Substrate processing apparatus
The utility model relates to a substrate processing device which can properly replace a processing liquid container. The substrate processing apparatus includes: a plurality of processing liquid containers (51) for accommodating a processing liquid; a plurality of supply pipes (84) connected to the...
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| creator | NISHIYAMA YUTA TSUCHIYAMA MASASHI YAMAMOTO TARO TAKAGI SHINSUKE OSONO KEI |
| description | The utility model relates to a substrate processing device which can properly replace a processing liquid container. The substrate processing apparatus includes: a plurality of processing liquid containers (51) for accommodating a processing liquid; a plurality of supply pipes (84) connected to the plurality of processing liquid containers (51), respectively; and a control unit that controls the movement of the plurality of supply pipes. The control unit controls the movement of the supply pipe in the vertical direction so as to switch between a state in which the processing liquid can be supplied and a state in which the processing liquid can be replaced with respect to the processing liquid container (51).
本实用新型涉及基板处理装置，可适当地进行处理液容器的更换。基板处理装置具有：多个处理液容器(51)，其收容处理液；多个作为供给管的管(84)，其与多个处理液容器(51)分别连接；以及控制部，其控制多个供给管的移动。控制部控制供给管的上下方向上的移动，从而针对处理液容器(51)切换可供给处理液的状态和可更换的状态。 |
| format | Patent |
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本实用新型涉及基板处理装置，可适当地进行处理液容器的更换。基板处理装置具有：多个处理液容器(51)，其收容处理液；多个作为供给管的管(84)，其与多个处理液容器(51)分别连接；以及控制部，其控制多个供给管的移动。控制部控制供给管的上下方向上的移动，从而针对处理液容器(51)切换可供给处理液的状态和可更换的状态。</description><language>chi ; eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; BASIC ELECTRIC ELEMENTS ; CINEMATOGRAPHY ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; SEMICONDUCTOR DEVICES</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230908&DB=EPODOC&CC=CN&NR=219658667U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230908&DB=EPODOC&CC=CN&NR=219658667U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>NISHIYAMA YUTA</creatorcontrib><creatorcontrib>TSUCHIYAMA MASASHI</creatorcontrib><creatorcontrib>YAMAMOTO TARO</creatorcontrib><creatorcontrib>TAKAGI SHINSUKE</creatorcontrib><creatorcontrib>OSONO KEI</creatorcontrib><title>Substrate processing apparatus</title><description>The utility model relates to a substrate processing device which can properly replace a processing liquid container. The substrate processing apparatus includes: a plurality of processing liquid containers (51) for accommodating a processing liquid; a plurality of supply pipes (84) connected to the plurality of processing liquid containers (51), respectively; and a control unit that controls the movement of the plurality of supply pipes. The control unit controls the movement of the supply pipe in the vertical direction so as to switch between a state in which the processing liquid can be supplied and a state in which the processing liquid can be replaced with respect to the processing liquid container (51).
本实用新型涉及基板处理装置，可适当地进行处理液容器的更换。基板处理装置具有：多个处理液容器(51)，其收容处理液；多个作为供给管的管(84)，其与多个处理液容器(51)分别连接；以及控制部，其控制多个供给管的移动。控制部控制供给管的上下方向上的移动，从而针对处理液容器(51)切换可供给处理液的状态和可更换的状态。</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJALLk0qLilKLElVKCjKT04tLs7MS1dILChIBIqVFvMwsKYl5hSn8kJpbgYlN9cQZw_d1IL8-NTigsTk1LzUknhnPyNDSzNTCzMz89BQY6IUAQCHlyYI</recordid><startdate>20230908</startdate><enddate>20230908</enddate><creator>NISHIYAMA YUTA</creator><creator>TSUCHIYAMA MASASHI</creator><creator>YAMAMOTO TARO</creator><creator>TAKAGI SHINSUKE</creator><creator>OSONO KEI</creator><scope>EVB</scope></search><sort><creationdate>20230908</creationdate><title>Substrate processing apparatus</title><author>NISHIYAMA YUTA ; TSUCHIYAMA MASASHI ; YAMAMOTO TARO ; TAKAGI SHINSUKE ; OSONO KEI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN219658667UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>NISHIYAMA YUTA</creatorcontrib><creatorcontrib>TSUCHIYAMA MASASHI</creatorcontrib><creatorcontrib>YAMAMOTO TARO</creatorcontrib><creatorcontrib>TAKAGI SHINSUKE</creatorcontrib><creatorcontrib>OSONO KEI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>NISHIYAMA YUTA</au><au>TSUCHIYAMA MASASHI</au><au>YAMAMOTO TARO</au><au>TAKAGI SHINSUKE</au><au>OSONO KEI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate processing apparatus</title><date>2023-09-08</date><risdate>2023</risdate><abstract>The utility model relates to a substrate processing device which can properly replace a processing liquid container. The substrate processing apparatus includes: a plurality of processing liquid containers (51) for accommodating a processing liquid; a plurality of supply pipes (84) connected to the plurality of processing liquid containers (51), respectively; and a control unit that controls the movement of the plurality of supply pipes. The control unit controls the movement of the supply pipe in the vertical direction so as to switch between a state in which the processing liquid can be supplied and a state in which the processing liquid can be replaced with respect to the processing liquid container (51).
本实用新型涉及基板处理装置，可适当地进行处理液容器的更换。基板处理装置具有：多个处理液容器(51)，其收容处理液；多个作为供给管的管(84)，其与多个处理液容器(51)分别连接；以及控制部，其控制多个供给管的移动。控制部控制供给管的上下方向上的移动，从而针对处理液容器(51)切换可供给处理液的状态和可更换的状态。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES |
| title | Substrate processing apparatus |
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