100Hz high repetition frequency and large energy DPL laser

The utility model discloses a 100Hz high repetition frequency and large energy DPL laser, which comprises a local oscillator structure, a secondary amplification structure, a tertiary amplification structure, a light path turn-back device, an integrated circulating water cooling device and a tempera...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: WU DENGXI, ZHANG LIMIN, XU HUANTIAN, CHEN NANYI, WU HANG, DOU FEIFEI, DENG QUAN, YANG BINGDE, ZHANG CHI
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator WU DENGXI
ZHANG LIMIN
XU HUANTIAN
CHEN NANYI
WU HANG
DOU FEIFEI
DENG QUAN
YANG BINGDE
ZHANG CHI
description The utility model discloses a 100Hz high repetition frequency and large energy DPL laser, which comprises a local oscillator structure, a secondary amplification structure, a tertiary amplification structure, a light path turn-back device, an integrated circulating water cooling device and a temperature control adjusting system, wherein the local oscillator structure, the secondary amplification structure and the tertiary amplification structure are arranged in a layered manner, and the light path turn-back device, the integrated circulating water cooling device and the temperature control adjusting system are matched with the structures. Wherein the pulse signal generation mechanism and the local oscillator structure are arranged on the upper layer, and the second-stage amplification structure and the third-stage amplification structure are arranged on the lower layer. According to the utility model, two resonant cavities work alternately, one resonant cavity works at 50Hz, alternate output is controlled by
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN219371669UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN219371669UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN219371669UU3</originalsourceid><addsrcrecordid>eNrjZLAyNDDwqFLIyEzPUChKLUgtySzJzM9TSCtKLSxNzUuuVEjMS1HISSxKT1VIzUstSq9UcAnwAQoUpxbxMLCmJeYUp_JCaW4GJTfXEGcP3dSC_PjU4oLEZKCOknhnPyNDS2NzQzMzy9BQY6IUAQBQfS7U</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>100Hz high repetition frequency and large energy DPL laser</title><source>esp@cenet</source><creator>WU DENGXI ; ZHANG LIMIN ; XU HUANTIAN ; CHEN NANYI ; WU HANG ; DOU FEIFEI ; DENG QUAN ; YANG BINGDE ; ZHANG CHI</creator><creatorcontrib>WU DENGXI ; ZHANG LIMIN ; XU HUANTIAN ; CHEN NANYI ; WU HANG ; DOU FEIFEI ; DENG QUAN ; YANG BINGDE ; ZHANG CHI</creatorcontrib><description>The utility model discloses a 100Hz high repetition frequency and large energy DPL laser, which comprises a local oscillator structure, a secondary amplification structure, a tertiary amplification structure, a light path turn-back device, an integrated circulating water cooling device and a temperature control adjusting system, wherein the local oscillator structure, the secondary amplification structure and the tertiary amplification structure are arranged in a layered manner, and the light path turn-back device, the integrated circulating water cooling device and the temperature control adjusting system are matched with the structures. Wherein the pulse signal generation mechanism and the local oscillator structure are arranged on the upper layer, and the second-stage amplification structure and the third-stage amplification structure are arranged on the lower layer. According to the utility model, two resonant cavities work alternately, one resonant cavity works at 50Hz, alternate output is controlled by</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; DEVICES USING STIMULATED EMISSION ; ELECTRICITY</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230718&amp;DB=EPODOC&amp;CC=CN&amp;NR=219371669U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20230718&amp;DB=EPODOC&amp;CC=CN&amp;NR=219371669U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>WU DENGXI</creatorcontrib><creatorcontrib>ZHANG LIMIN</creatorcontrib><creatorcontrib>XU HUANTIAN</creatorcontrib><creatorcontrib>CHEN NANYI</creatorcontrib><creatorcontrib>WU HANG</creatorcontrib><creatorcontrib>DOU FEIFEI</creatorcontrib><creatorcontrib>DENG QUAN</creatorcontrib><creatorcontrib>YANG BINGDE</creatorcontrib><creatorcontrib>ZHANG CHI</creatorcontrib><title>100Hz high repetition frequency and large energy DPL laser</title><description>The utility model discloses a 100Hz high repetition frequency and large energy DPL laser, which comprises a local oscillator structure, a secondary amplification structure, a tertiary amplification structure, a light path turn-back device, an integrated circulating water cooling device and a temperature control adjusting system, wherein the local oscillator structure, the secondary amplification structure and the tertiary amplification structure are arranged in a layered manner, and the light path turn-back device, the integrated circulating water cooling device and the temperature control adjusting system are matched with the structures. Wherein the pulse signal generation mechanism and the local oscillator structure are arranged on the upper layer, and the second-stage amplification structure and the third-stage amplification structure are arranged on the lower layer. According to the utility model, two resonant cavities work alternately, one resonant cavity works at 50Hz, alternate output is controlled by</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DEVICES USING STIMULATED EMISSION</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAyNDDwqFLIyEzPUChKLUgtySzJzM9TSCtKLSxNzUuuVEjMS1HISSxKT1VIzUstSq9UcAnwAQoUpxbxMLCmJeYUp_JCaW4GJTfXEGcP3dSC_PjU4oLEZKCOknhnPyNDS2NzQzMzy9BQY6IUAQBQfS7U</recordid><startdate>20230718</startdate><enddate>20230718</enddate><creator>WU DENGXI</creator><creator>ZHANG LIMIN</creator><creator>XU HUANTIAN</creator><creator>CHEN NANYI</creator><creator>WU HANG</creator><creator>DOU FEIFEI</creator><creator>DENG QUAN</creator><creator>YANG BINGDE</creator><creator>ZHANG CHI</creator><scope>EVB</scope></search><sort><creationdate>20230718</creationdate><title>100Hz high repetition frequency and large energy DPL laser</title><author>WU DENGXI ; ZHANG LIMIN ; XU HUANTIAN ; CHEN NANYI ; WU HANG ; DOU FEIFEI ; DENG QUAN ; YANG BINGDE ; ZHANG CHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN219371669UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DEVICES USING STIMULATED EMISSION</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>WU DENGXI</creatorcontrib><creatorcontrib>ZHANG LIMIN</creatorcontrib><creatorcontrib>XU HUANTIAN</creatorcontrib><creatorcontrib>CHEN NANYI</creatorcontrib><creatorcontrib>WU HANG</creatorcontrib><creatorcontrib>DOU FEIFEI</creatorcontrib><creatorcontrib>DENG QUAN</creatorcontrib><creatorcontrib>YANG BINGDE</creatorcontrib><creatorcontrib>ZHANG CHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>WU DENGXI</au><au>ZHANG LIMIN</au><au>XU HUANTIAN</au><au>CHEN NANYI</au><au>WU HANG</au><au>DOU FEIFEI</au><au>DENG QUAN</au><au>YANG BINGDE</au><au>ZHANG CHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>100Hz high repetition frequency and large energy DPL laser</title><date>2023-07-18</date><risdate>2023</risdate><abstract>The utility model discloses a 100Hz high repetition frequency and large energy DPL laser, which comprises a local oscillator structure, a secondary amplification structure, a tertiary amplification structure, a light path turn-back device, an integrated circulating water cooling device and a temperature control adjusting system, wherein the local oscillator structure, the secondary amplification structure and the tertiary amplification structure are arranged in a layered manner, and the light path turn-back device, the integrated circulating water cooling device and the temperature control adjusting system are matched with the structures. Wherein the pulse signal generation mechanism and the local oscillator structure are arranged on the upper layer, and the second-stage amplification structure and the third-stage amplification structure are arranged on the lower layer. According to the utility model, two resonant cavities work alternately, one resonant cavity works at 50Hz, alternate output is controlled by</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language chi ; eng
recordid cdi_epo_espacenet_CN219371669UU
source esp@cenet
subjects BASIC ELECTRIC ELEMENTS
DEVICES USING STIMULATED EMISSION
ELECTRICITY
title 100Hz high repetition frequency and large energy DPL laser
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-07T17%3A48%3A58IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=WU%20DENGXI&rft.date=2023-07-18&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN219371669UU%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true