Adjustable CTI electrode polishing device
The utility model discloses an adjustable CTI electrode polishing device which comprises a base and a rotating seat, rotating shafts are symmetrically arranged behind the base and the rotating seat, an adjusting mechanism is arranged on the rotating shaft behind the other side of the base and the ot...
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| creator | GE XIN XU DONG YAN ZEJUN GU CAIYING |
| description | The utility model discloses an adjustable CTI electrode polishing device which comprises a base and a rotating seat, rotating shafts are symmetrically arranged behind the base and the rotating seat, an adjusting mechanism is arranged on the rotating shaft behind the other side of the base and the other side of the rotating seat, a containing groove is formed in the front face of the base, and an adjusting mechanism is arranged in the containing groove. A locking mechanism is arranged on the surface, close to the containing groove, of the base, and a grinding mechanism is arranged on the front face of the rotating base. The adjusting mechanism is arranged, the threaded rod is rotated, the inner threaded cylinder moves along the threaded rod, then the base is driven to rotate around the double-hole connecting strip and the rotating base to the angle where the CTI electrode needs to be polished, the CTI electrode needing to be polished is placed in the containing groove, the rotating blocking strip is rotated to |
| format | Patent |
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A locking mechanism is arranged on the surface, close to the containing groove, of the base, and a grinding mechanism is arranged on the front face of the rotating base. The adjusting mechanism is arranged, the threaded rod is rotated, the inner threaded cylinder moves along the threaded rod, then the base is driven to rotate around the double-hole connecting strip and the rotating base to the angle where the CTI electrode needs to be polished, the CTI electrode needing to be polished is placed in the containing groove, the rotating blocking strip is rotated to</description><language>chi ; eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230704&DB=EPODOC&CC=CN&NR=219293565U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230704&DB=EPODOC&CC=CN&NR=219293565U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GE XIN</creatorcontrib><creatorcontrib>XU DONG</creatorcontrib><creatorcontrib>YAN ZEJUN</creatorcontrib><creatorcontrib>GU CAIYING</creatorcontrib><title>Adjustable CTI electrode polishing device</title><description>The utility model discloses an adjustable CTI electrode polishing device which comprises a base and a rotating seat, rotating shafts are symmetrically arranged behind the base and the rotating seat, an adjusting mechanism is arranged on the rotating shaft behind the other side of the base and the other side of the rotating seat, a containing groove is formed in the front face of the base, and an adjusting mechanism is arranged in the containing groove. A locking mechanism is arranged on the surface, close to the containing groove, of the base, and a grinding mechanism is arranged on the front face of the rotating base. The adjusting mechanism is arranged, the threaded rod is rotated, the inner threaded cylinder moves along the threaded rod, then the base is driven to rotate around the double-hole connecting strip and the rotating base to the angle where the CTI electrode needs to be polished, the CTI electrode needing to be polished is placed in the containing groove, the rotating blocking strip is rotated to</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNB0TMkqLS5JTMpJVXAO8VRIzUlNLinKT0lVKMjPySzOyMxLV0hJLctMTuVhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfHOfkaGlkaWxqZmpqGhxkQpAgA4ailL</recordid><startdate>20230704</startdate><enddate>20230704</enddate><creator>GE XIN</creator><creator>XU DONG</creator><creator>YAN ZEJUN</creator><creator>GU CAIYING</creator><scope>EVB</scope></search><sort><creationdate>20230704</creationdate><title>Adjustable CTI electrode polishing device</title><author>GE XIN ; XU DONG ; YAN ZEJUN ; GU CAIYING</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN219293565UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>GE XIN</creatorcontrib><creatorcontrib>XU DONG</creatorcontrib><creatorcontrib>YAN ZEJUN</creatorcontrib><creatorcontrib>GU CAIYING</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GE XIN</au><au>XU DONG</au><au>YAN ZEJUN</au><au>GU CAIYING</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Adjustable CTI electrode polishing device</title><date>2023-07-04</date><risdate>2023</risdate><abstract>The utility model discloses an adjustable CTI electrode polishing device which comprises a base and a rotating seat, rotating shafts are symmetrically arranged behind the base and the rotating seat, an adjusting mechanism is arranged on the rotating shaft behind the other side of the base and the other side of the rotating seat, a containing groove is formed in the front face of the base, and an adjusting mechanism is arranged in the containing groove. A locking mechanism is arranged on the surface, close to the containing groove, of the base, and a grinding mechanism is arranged on the front face of the rotating base. The adjusting mechanism is arranged, the threaded rod is rotated, the inner threaded cylinder moves along the threaded rod, then the base is driven to rotate around the double-hole connecting strip and the rotating base to the angle where the CTI electrode needs to be polished, the CTI electrode needing to be polished is placed in the containing groove, the rotating blocking strip is rotated to</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN219293565UU |
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| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
| title | Adjustable CTI electrode polishing device |
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