Semi-automatic manipulator capable of lifting up and down and rotating back and forth and rotating wafer in groove
The utility model relates to the technical field of wafer cleaning, in particular to an up-down lifting and front-back rotating in-groove wafer rotating semi-automatic manipulator which comprises a lifting mechanism, a front-back rotating mechanism and an in-groove wafer rotating mechanism. The top...
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creator | GU QUANMING ZUO GUOJUN FU ZHENGCHAO CHENG XU REN JINZHI |
description | The utility model relates to the technical field of wafer cleaning, in particular to an up-down lifting and front-back rotating in-groove wafer rotating semi-automatic manipulator which comprises a lifting mechanism, a front-back rotating mechanism and an in-groove wafer rotating mechanism. The top suspension mode is adopted, the structure is simple, the occupied space is small, and installation and maintenance are convenient. By adopting the lifting mechanism, the front-back rotating mechanism and the in-groove wafer rotating mechanism, the wafer box can move up and down and rotate left and right, and in the process, the in-groove wafer rotating mechanism can also drive the wafer to rotate in the wafer box.
本实用新型涉及晶圆清洗技术领域,具体涉及一种上下升降前后旋转槽内晶圆旋转半自动机械手,包括:升降机构、前后旋转机构、槽内晶圆旋转机构。采用顶部悬挂的方式,结构简单,占用空间小,便于安装和检修。本实用新型通过采用升降机构、前后旋转机构、槽内晶圆旋转机构,能够使得晶圆盒能够上下运动和左右旋转,在这个过程中槽内晶圆旋转机构还能带动晶圆在晶圆盒内旋转。 |
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本实用新型涉及晶圆清洗技术领域,具体涉及一种上下升降前后旋转槽内晶圆旋转半自动机械手,包括:升降机构、前后旋转机构、槽内晶圆旋转机构。采用顶部悬挂的方式,结构简单,占用空间小,便于安装和检修。本实用新型通过采用升降机构、前后旋转机构、槽内晶圆旋转机构,能够使得晶圆盒能够上下运动和左右旋转,在这个过程中槽内晶圆旋转机构还能带动晶圆在晶圆盒内旋转。</description><language>chi ; eng</language><subject>CLEANING ; CLEANING IN GENERAL ; PERFORMING OPERATIONS ; PREVENTION OF FOULING IN GENERAL ; TRANSPORTING</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230516&DB=EPODOC&CC=CN&NR=219025306U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230516&DB=EPODOC&CC=CN&NR=219025306U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GU QUANMING</creatorcontrib><creatorcontrib>ZUO GUOJUN</creatorcontrib><creatorcontrib>FU ZHENGCHAO</creatorcontrib><creatorcontrib>CHENG XU</creatorcontrib><creatorcontrib>REN JINZHI</creatorcontrib><title>Semi-automatic manipulator capable of lifting up and down and rotating back and forth and rotating wafer in groove</title><description>The utility model relates to the technical field of wafer cleaning, in particular to an up-down lifting and front-back rotating in-groove wafer rotating semi-automatic manipulator which comprises a lifting mechanism, a front-back rotating mechanism and an in-groove wafer rotating mechanism. The top suspension mode is adopted, the structure is simple, the occupied space is small, and installation and maintenance are convenient. By adopting the lifting mechanism, the front-back rotating mechanism and the in-groove wafer rotating mechanism, the wafer box can move up and down and rotate left and right, and in the process, the in-groove wafer rotating mechanism can also drive the wafer to rotate in the wafer box.
本实用新型涉及晶圆清洗技术领域,具体涉及一种上下升降前后旋转槽内晶圆旋转半自动机械手,包括:升降机构、前后旋转机构、槽内晶圆旋转机构。采用顶部悬挂的方式,结构简单,占用空间小,便于安装和检修。本实用新型通过采用升降机构、前后旋转机构、槽内晶圆旋转机构,能够使得晶圆盒能够上下运动和左右旋转,在这个过程中槽内晶圆旋转机构还能带动晶圆在晶圆盒内旋转。</description><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>PERFORMING OPERATIONS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNijELwjAQRrM4iPofDvdCbVFwLoqTi3Yu1_TSBpNcSK_27wvFxc3pe7z3rVV6kLcZTsIexWrwGGycHAon0BixdQRswFkjNvQwRcDQQcdzWCCx4BJa1K_FGE4y_LYZDSWwAfrE_KatWhl0I-2-u1H76-VZ3TKK3NAYUVMgaap7cTjnxbHMT3Vd_nX6AEZbRGg</recordid><startdate>20230516</startdate><enddate>20230516</enddate><creator>GU QUANMING</creator><creator>ZUO GUOJUN</creator><creator>FU ZHENGCHAO</creator><creator>CHENG XU</creator><creator>REN JINZHI</creator><scope>EVB</scope></search><sort><creationdate>20230516</creationdate><title>Semi-automatic manipulator capable of lifting up and down and rotating back and forth and rotating wafer in groove</title><author>GU QUANMING ; ZUO GUOJUN ; FU ZHENGCHAO ; CHENG XU ; REN JINZHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN219025306UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>PERFORMING OPERATIONS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>GU QUANMING</creatorcontrib><creatorcontrib>ZUO GUOJUN</creatorcontrib><creatorcontrib>FU ZHENGCHAO</creatorcontrib><creatorcontrib>CHENG XU</creatorcontrib><creatorcontrib>REN JINZHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GU QUANMING</au><au>ZUO GUOJUN</au><au>FU ZHENGCHAO</au><au>CHENG XU</au><au>REN JINZHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Semi-automatic manipulator capable of lifting up and down and rotating back and forth and rotating wafer in groove</title><date>2023-05-16</date><risdate>2023</risdate><abstract>The utility model relates to the technical field of wafer cleaning, in particular to an up-down lifting and front-back rotating in-groove wafer rotating semi-automatic manipulator which comprises a lifting mechanism, a front-back rotating mechanism and an in-groove wafer rotating mechanism. The top suspension mode is adopted, the structure is simple, the occupied space is small, and installation and maintenance are convenient. By adopting the lifting mechanism, the front-back rotating mechanism and the in-groove wafer rotating mechanism, the wafer box can move up and down and rotate left and right, and in the process, the in-groove wafer rotating mechanism can also drive the wafer to rotate in the wafer box.
本实用新型涉及晶圆清洗技术领域,具体涉及一种上下升降前后旋转槽内晶圆旋转半自动机械手,包括:升降机构、前后旋转机构、槽内晶圆旋转机构。采用顶部悬挂的方式,结构简单,占用空间小,便于安装和检修。本实用新型通过采用升降机构、前后旋转机构、槽内晶圆旋转机构,能够使得晶圆盒能够上下运动和左右旋转,在这个过程中槽内晶圆旋转机构还能带动晶圆在晶圆盒内旋转。</abstract><oa>free_for_read</oa></addata></record> |
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language | chi ; eng |
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subjects | CLEANING CLEANING IN GENERAL PERFORMING OPERATIONS PREVENTION OF FOULING IN GENERAL TRANSPORTING |
title | Semi-automatic manipulator capable of lifting up and down and rotating back and forth and rotating wafer in groove |
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