Special etching device for ceramic plate
The utility model discloses a special etching device for a ceramic plate, which comprises a tooling plate, a tooling through groove is arranged in the center of the tooling plate, four corners inside a groove body of the tooling through groove are respectively connected with a material bearing plate...
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creator | ZHANG XIAO YIN WEILIN |
description | The utility model discloses a special etching device for a ceramic plate, which comprises a tooling plate, a tooling through groove is arranged in the center of the tooling plate, four corners inside a groove body of the tooling through groove are respectively connected with a material bearing plate for placing the ceramic plate, and four corners of the upper surface of the tooling through groove are respectively provided with a mounting groove for placing a magnet. Different from a traditional fixing mode, limiting and fixing of the ceramic plate are achieved through the magnetic attraction principle, the problems that in the etching process of the traditional ceramic plate, mounting and placing are slow, and fixing is difficult are solved, and time and labor are saved.
本实用新型公开了一种陶瓷板专用蚀刻装置,包括工装板,工装板中央设有工装通槽,工装通槽的槽体内部四角处均连有用于放置陶瓷板的呈料板,工装通槽的上表面四角处均开设有用于放置磁铁的安装槽,本装置结构简单,操作方便,区别于传统的固定方式,利用磁吸的原理实现了陶瓷板的限位和固定,解决了传统陶瓷板在蚀刻过程中出现的安装放板慢,固定困难的问题,省时省力。 |
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本实用新型公开了一种陶瓷板专用蚀刻装置,包括工装板,工装板中央设有工装通槽,工装通槽的槽体内部四角处均连有用于放置陶瓷板的呈料板,工装通槽的上表面四角处均开设有用于放置磁铁的安装槽,本装置结构简单,操作方便,区别于传统的固定方式,利用磁吸的原理实现了陶瓷板的限位和固定,解决了传统陶瓷板在蚀刻过程中出现的安装放板慢,固定困难的问题,省时省力。</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 ; NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221202&DB=EPODOC&CC=CN&NR=217948267U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25568,76551</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221202&DB=EPODOC&CC=CN&NR=217948267U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>ZHANG XIAO</creatorcontrib><creatorcontrib>YIN WEILIN</creatorcontrib><title>Special etching device for ceramic plate</title><description>The utility model discloses a special etching device for a ceramic plate, which comprises a tooling plate, a tooling through groove is arranged in the center of the tooling plate, four corners inside a groove body of the tooling through groove are respectively connected with a material bearing plate for placing the ceramic plate, and four corners of the upper surface of the tooling through groove are respectively provided with a mounting groove for placing a magnet. Different from a traditional fixing mode, limiting and fixing of the ceramic plate are achieved through the magnetic attraction principle, the problems that in the etching process of the traditional ceramic plate, mounting and placing are slow, and fixing is difficult are solved, and time and labor are saved.
本实用新型公开了一种陶瓷板专用蚀刻装置,包括工装板,工装板中央设有工装通槽,工装通槽的槽体内部四角处均连有用于放置陶瓷板的呈料板,工装通槽的上表面四角处均开设有用于放置磁铁的安装槽,本装置结构简单,操作方便,区别于传统的固定方式,利用磁吸的原理实现了陶瓷板的限位和固定,解决了传统陶瓷板在蚀刻过程中出现的安装放板慢,固定困难的问题,省时省力。</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</subject><subject>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAILkhNzkzMUUgtSc7IzEtXSEkty0xOVUjLL1JITi1KzM1MVijISSxJ5WFgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8c5-RobmliYWRmbmoaHGRCkCAAU_KOM</recordid><startdate>20221202</startdate><enddate>20221202</enddate><creator>ZHANG XIAO</creator><creator>YIN WEILIN</creator><scope>EVB</scope></search><sort><creationdate>20221202</creationdate><title>Special etching device for ceramic plate</title><author>ZHANG XIAO ; YIN WEILIN</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN217948267UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25</topic><topic>NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE</topic><toplevel>online_resources</toplevel><creatorcontrib>ZHANG XIAO</creatorcontrib><creatorcontrib>YIN WEILIN</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>ZHANG XIAO</au><au>YIN WEILIN</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Special etching device for ceramic plate</title><date>2022-12-02</date><risdate>2022</risdate><abstract>The utility model discloses a special etching device for a ceramic plate, which comprises a tooling plate, a tooling through groove is arranged in the center of the tooling plate, four corners inside a groove body of the tooling through groove are respectively connected with a material bearing plate for placing the ceramic plate, and four corners of the upper surface of the tooling through groove are respectively provided with a mounting groove for placing a magnet. Different from a traditional fixing mode, limiting and fixing of the ceramic plate are achieved through the magnetic attraction principle, the problems that in the etching process of the traditional ceramic plate, mounting and placing are slow, and fixing is difficult are solved, and time and labor are saved.
本实用新型公开了一种陶瓷板专用蚀刻装置,包括工装板,工装板中央设有工装通槽,工装通槽的槽体内部四角处均连有用于放置陶瓷板的呈料板,工装通槽的上表面四角处均开设有用于放置磁铁的安装槽,本装置结构简单,操作方便,区别于传统的固定方式,利用磁吸的原理实现了陶瓷板的限位和固定,解决了传统陶瓷板在蚀刻过程中出现的安装放板慢,固定困难的问题,省时省力。</abstract><oa>free_for_read</oa></addata></record> |
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subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLICMATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASSC23 AND AT LEAST ONEPROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25 NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE |
title | Special etching device for ceramic plate |
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