ITO target edging and chamfering clamp
The utility model discloses an ITO (Indium Tin Oxide) target material edging and chamfering clamp, which aims to prevent the ITO target material from cracking during processing and ensure the processing quality, and adopts the technical scheme that the ITO target material edging and chamfering clamp...
Gespeichert in:
| Hauptverfasser: | , , , , |
|---|---|
| Format: | Patent |
| Sprache: | chi ; eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | LEE YOON-GYU KANG SU-NAM WANG ZITONG PEI WEIYANG YU FANG |
| description | The utility model discloses an ITO (Indium Tin Oxide) target material edging and chamfering clamp, which aims to prevent the ITO target material from cracking during processing and ensure the processing quality, and adopts the technical scheme that the ITO target material edging and chamfering clamp comprises a base, the top surface of the base is a first inclined surface, and the top surface of the base is a second inclined surface; an ITO target material to be processed is placed on the first inclined surface, the side edge of the ITO target material to be processed is clamped through a clamping assembly, the first inclined surface is further provided with a flow guide groove used for downwards guiding cutting fluid used when the ITO target material is processed, and the ITO target material to be processed covers the flow guide groove.
本实用新型公开了一种ITO靶材磨边倒角夹具，旨在避免ITO靶材在加工时出现开裂的情况，保证加工质量，其技术方案：一种ITO靶材磨边倒角夹具，包括底座，所述底座的顶面为第一倾斜面，待加工ITO靶材放置在第一倾斜面上且通过一夹紧组件将其侧边夹紧，所述第一倾斜面上还设有用于向下导流加工ITO靶材时使用的切削液的导流槽，待加工ITO靶材覆盖在所述导流槽上 |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN217530454UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN217530454UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN217530454UU3</originalsourceid><addsrcrecordid>eNrjZFDzDPFXKEksSk8tUUhNSc_MS1dIzEtRSM5IzE1LLQJxk3MScwt4GFjTEnOKU3mhNDeDkptriLOHbmpBfnxqcUFicmpeakm8s5-RobmpsYGJqUloqDFRigB2yye0</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>ITO target edging and chamfering clamp</title><source>esp@cenet</source><creator>LEE YOON-GYU ; KANG SU-NAM ; WANG ZITONG ; PEI WEIYANG ; YU FANG</creator><creatorcontrib>LEE YOON-GYU ; KANG SU-NAM ; WANG ZITONG ; PEI WEIYANG ; YU FANG</creatorcontrib><description>The utility model discloses an ITO (Indium Tin Oxide) target material edging and chamfering clamp, which aims to prevent the ITO target material from cracking during processing and ensure the processing quality, and adopts the technical scheme that the ITO target material edging and chamfering clamp comprises a base, the top surface of the base is a first inclined surface, and the top surface of the base is a second inclined surface; an ITO target material to be processed is placed on the first inclined surface, the side edge of the ITO target material to be processed is clamped through a clamping assembly, the first inclined surface is further provided with a flow guide groove used for downwards guiding cutting fluid used when the ITO target material is processed, and the ITO target material to be processed covers the flow guide groove.
本实用新型公开了一种ITO靶材磨边倒角夹具，旨在避免ITO靶材在加工时出现开裂的情况，保证加工质量，其技术方案：一种ITO靶材磨边倒角夹具，包括底座，所述底座的顶面为第一倾斜面，待加工ITO靶材放置在第一倾斜面上且通过一夹紧组件将其侧边夹紧，所述第一倾斜面上还设有用于向下导流加工ITO靶材时使用的切削液的导流槽，待加工ITO靶材覆盖在所述导流槽上</description><language>chi ; eng</language><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; TRANSPORTING</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221004&DB=EPODOC&CC=CN&NR=217530454U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20221004&DB=EPODOC&CC=CN&NR=217530454U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LEE YOON-GYU</creatorcontrib><creatorcontrib>KANG SU-NAM</creatorcontrib><creatorcontrib>WANG ZITONG</creatorcontrib><creatorcontrib>PEI WEIYANG</creatorcontrib><creatorcontrib>YU FANG</creatorcontrib><title>ITO target edging and chamfering clamp</title><description>The utility model discloses an ITO (Indium Tin Oxide) target material edging and chamfering clamp, which aims to prevent the ITO target material from cracking during processing and ensure the processing quality, and adopts the technical scheme that the ITO target material edging and chamfering clamp comprises a base, the top surface of the base is a first inclined surface, and the top surface of the base is a second inclined surface; an ITO target material to be processed is placed on the first inclined surface, the side edge of the ITO target material to be processed is clamped through a clamping assembly, the first inclined surface is further provided with a flow guide groove used for downwards guiding cutting fluid used when the ITO target material is processed, and the ITO target material to be processed covers the flow guide groove.
本实用新型公开了一种ITO靶材磨边倒角夹具，旨在避免ITO靶材在加工时出现开裂的情况，保证加工质量，其技术方案：一种ITO靶材磨边倒角夹具，包括底座，所述底座的顶面为第一倾斜面，待加工ITO靶材放置在第一倾斜面上且通过一夹紧组件将其侧边夹紧，所述第一倾斜面上还设有用于向下导流加工ITO靶材时使用的切削液的导流槽，待加工ITO靶材覆盖在所述导流槽上</description><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFDzDPFXKEksSk8tUUhNSc_MS1dIzEtRSM5IzE1LLQJxk3MScwt4GFjTEnOKU3mhNDeDkptriLOHbmpBfnxqcUFicmpeakm8s5-RobmpsYGJqUloqDFRigB2yye0</recordid><startdate>20221004</startdate><enddate>20221004</enddate><creator>LEE YOON-GYU</creator><creator>KANG SU-NAM</creator><creator>WANG ZITONG</creator><creator>PEI WEIYANG</creator><creator>YU FANG</creator><scope>EVB</scope></search><sort><creationdate>20221004</creationdate><title>ITO target edging and chamfering clamp</title><author>LEE YOON-GYU ; KANG SU-NAM ; WANG ZITONG ; PEI WEIYANG ; YU FANG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN217530454UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>LEE YOON-GYU</creatorcontrib><creatorcontrib>KANG SU-NAM</creatorcontrib><creatorcontrib>WANG ZITONG</creatorcontrib><creatorcontrib>PEI WEIYANG</creatorcontrib><creatorcontrib>YU FANG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LEE YOON-GYU</au><au>KANG SU-NAM</au><au>WANG ZITONG</au><au>PEI WEIYANG</au><au>YU FANG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>ITO target edging and chamfering clamp</title><date>2022-10-04</date><risdate>2022</risdate><abstract>The utility model discloses an ITO (Indium Tin Oxide) target material edging and chamfering clamp, which aims to prevent the ITO target material from cracking during processing and ensure the processing quality, and adopts the technical scheme that the ITO target material edging and chamfering clamp comprises a base, the top surface of the base is a first inclined surface, and the top surface of the base is a second inclined surface; an ITO target material to be processed is placed on the first inclined surface, the side edge of the ITO target material to be processed is clamped through a clamping assembly, the first inclined surface is further provided with a flow guide groove used for downwards guiding cutting fluid used when the ITO target material is processed, and the ITO target material to be processed covers the flow guide groove.
本实用新型公开了一种ITO靶材磨边倒角夹具，旨在避免ITO靶材在加工时出现开裂的情况，保证加工质量，其技术方案：一种ITO靶材磨边倒角夹具，包括底座，所述底座的顶面为第一倾斜面，待加工ITO靶材放置在第一倾斜面上且通过一夹紧组件将其侧边夹紧，所述第一倾斜面上还设有用于向下导流加工ITO靶材时使用的切削液的导流槽，待加工ITO靶材覆盖在所述导流槽上</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | chi ; eng |
| recordid | cdi_epo_espacenet_CN217530454UU |
| source | esp@cenet |
| subjects | DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING PERFORMING OPERATIONS POLISHING TRANSPORTING |
| title | ITO target edging and chamfering clamp |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-01T18%3A32%3A26IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=LEE%20YOON-GYU&rft.date=2022-10-04&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN217530454UU%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |