Helium recovery device in semiconductor wafer substitute processing industry
The utility model discloses a helium recovery device in the semiconductor wafer processing industry, relates to the technical field of wafer processing, and provides the following scheme aiming at the problems that a wafer drying device provided by the background technology is lack of a helium recov...
Gespeichert in:
1. Verfasser: | |
---|---|
Format: | Patent |
Sprache: | chi ; eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | TAO YONGGUI |
description | The utility model discloses a helium recovery device in the semiconductor wafer processing industry, relates to the technical field of wafer processing, and provides the following scheme aiming at the problems that a wafer drying device provided by the background technology is lack of a helium recovery and purification device, so that helium is wasted and the production cost is increased: the helium recovery device comprises a drying device body and a purification box body, an exhaust hole is formed in one side of the top of the drying device body, an air extracting pump is installed on one side of the top end in the purifying box body, the air extracting end of the air extracting pump is connected with an air extracting pipe, and one end of the air extracting pipe penetrates out of the purifying box body and is connected to the exhaust hole in the drying device body. According to the utility model, by utilizing the dual purification effects of the first separation filter and the second separation filter, the |
format | Patent |
fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_CN215654289UU</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>CN215654289UU</sourcerecordid><originalsourceid>FETCH-epo_espacenet_CN215654289UU3</originalsourceid><addsrcrecordid>eNqNyrEOgjAUBdAuDkb9hxd3B1GMzkTDYJxkJrW9kJdA2_S1GP5eBz_A6Sxnqe41Bs4jRRg_Ic5kMbEBsSPByMY7m03ykd66QyTJL0mccgKF6A1E2PXfbLOkOK_VotODYPNzpba367Oqdwi-hQRt4JDa6lHsy1N5LM6Xpjn8lT6VgDfk</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Helium recovery device in semiconductor wafer substitute processing industry</title><source>esp@cenet</source><creator>TAO YONGGUI</creator><creatorcontrib>TAO YONGGUI</creatorcontrib><description>The utility model discloses a helium recovery device in the semiconductor wafer processing industry, relates to the technical field of wafer processing, and provides the following scheme aiming at the problems that a wafer drying device provided by the background technology is lack of a helium recovery and purification device, so that helium is wasted and the production cost is increased: the helium recovery device comprises a drying device body and a purification box body, an exhaust hole is formed in one side of the top of the drying device body, an air extracting pump is installed on one side of the top end in the purifying box body, the air extracting end of the air extracting pump is connected with an air extracting pipe, and one end of the air extracting pipe penetrates out of the purifying box body and is connected to the exhaust hole in the drying device body. According to the utility model, by utilizing the dual purification effects of the first separation filter and the second separation filter, the</description><language>chi ; eng</language><subject>BLASTING ; CHEMISTRY ; COMPOUNDS THEREOF ; ENGINEERING ELEMENTS AND UNITS ; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES ; FIXED-CAPACITY GAS-HOLDERS ; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS ; HEATING ; INORGANIC CHEMISTRY ; LIGHTING ; MEANS FOR DAMPING VIBRATION ; MECHANICAL ENGINEERING ; METALLURGY ; NON-METALLIC ELEMENTS ; PERFORMING OPERATIONS ; PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL ; SEPARATION ; SHOCK-ABSORBERS ; SPRINGS ; STORING OF DISTRIBUTING GASES OR LIQUIDS ; THERMAL INSULATION IN GENERAL ; TRANSPORTING ; VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES ; WEAPONS</subject><creationdate>2022</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220128&DB=EPODOC&CC=CN&NR=215654289U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,782,887,25573,76557</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20220128&DB=EPODOC&CC=CN&NR=215654289U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>TAO YONGGUI</creatorcontrib><title>Helium recovery device in semiconductor wafer substitute processing industry</title><description>The utility model discloses a helium recovery device in the semiconductor wafer processing industry, relates to the technical field of wafer processing, and provides the following scheme aiming at the problems that a wafer drying device provided by the background technology is lack of a helium recovery and purification device, so that helium is wasted and the production cost is increased: the helium recovery device comprises a drying device body and a purification box body, an exhaust hole is formed in one side of the top of the drying device body, an air extracting pump is installed on one side of the top end in the purifying box body, the air extracting end of the air extracting pump is connected with an air extracting pipe, and one end of the air extracting pipe penetrates out of the purifying box body and is connected to the exhaust hole in the drying device body. According to the utility model, by utilizing the dual purification effects of the first separation filter and the second separation filter, the</description><subject>BLASTING</subject><subject>CHEMISTRY</subject><subject>COMPOUNDS THEREOF</subject><subject>ENGINEERING ELEMENTS AND UNITS</subject><subject>FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES</subject><subject>FIXED-CAPACITY GAS-HOLDERS</subject><subject>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</subject><subject>HEATING</subject><subject>INORGANIC CHEMISTRY</subject><subject>LIGHTING</subject><subject>MEANS FOR DAMPING VIBRATION</subject><subject>MECHANICAL ENGINEERING</subject><subject>METALLURGY</subject><subject>NON-METALLIC ELEMENTS</subject><subject>PERFORMING OPERATIONS</subject><subject>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</subject><subject>SEPARATION</subject><subject>SHOCK-ABSORBERS</subject><subject>SPRINGS</subject><subject>STORING OF DISTRIBUTING GASES OR LIQUIDS</subject><subject>THERMAL INSULATION IN GENERAL</subject><subject>TRANSPORTING</subject><subject>VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES</subject><subject>WEAPONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2022</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEOgjAUBdAuDkb9hxd3B1GMzkTDYJxkJrW9kJdA2_S1GP5eBz_A6Sxnqe41Bs4jRRg_Ic5kMbEBsSPByMY7m03ykd66QyTJL0mccgKF6A1E2PXfbLOkOK_VotODYPNzpba367Oqdwi-hQRt4JDa6lHsy1N5LM6Xpjn8lT6VgDfk</recordid><startdate>20220128</startdate><enddate>20220128</enddate><creator>TAO YONGGUI</creator><scope>EVB</scope></search><sort><creationdate>20220128</creationdate><title>Helium recovery device in semiconductor wafer substitute processing industry</title><author>TAO YONGGUI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN215654289UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2022</creationdate><topic>BLASTING</topic><topic>CHEMISTRY</topic><topic>COMPOUNDS THEREOF</topic><topic>ENGINEERING ELEMENTS AND UNITS</topic><topic>FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES</topic><topic>FIXED-CAPACITY GAS-HOLDERS</topic><topic>GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS</topic><topic>HEATING</topic><topic>INORGANIC CHEMISTRY</topic><topic>LIGHTING</topic><topic>MEANS FOR DAMPING VIBRATION</topic><topic>MECHANICAL ENGINEERING</topic><topic>METALLURGY</topic><topic>NON-METALLIC ELEMENTS</topic><topic>PERFORMING OPERATIONS</topic><topic>PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL</topic><topic>SEPARATION</topic><topic>SHOCK-ABSORBERS</topic><topic>SPRINGS</topic><topic>STORING OF DISTRIBUTING GASES OR LIQUIDS</topic><topic>THERMAL INSULATION IN GENERAL</topic><topic>TRANSPORTING</topic><topic>VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES</topic><topic>WEAPONS</topic><toplevel>online_resources</toplevel><creatorcontrib>TAO YONGGUI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>TAO YONGGUI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Helium recovery device in semiconductor wafer substitute processing industry</title><date>2022-01-28</date><risdate>2022</risdate><abstract>The utility model discloses a helium recovery device in the semiconductor wafer processing industry, relates to the technical field of wafer processing, and provides the following scheme aiming at the problems that a wafer drying device provided by the background technology is lack of a helium recovery and purification device, so that helium is wasted and the production cost is increased: the helium recovery device comprises a drying device body and a purification box body, an exhaust hole is formed in one side of the top of the drying device body, an air extracting pump is installed on one side of the top end in the purifying box body, the air extracting end of the air extracting pump is connected with an air extracting pipe, and one end of the air extracting pipe penetrates out of the purifying box body and is connected to the exhaust hole in the drying device body. According to the utility model, by utilizing the dual purification effects of the first separation filter and the second separation filter, the</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | chi ; eng |
recordid | cdi_epo_espacenet_CN215654289UU |
source | esp@cenet |
subjects | BLASTING CHEMISTRY COMPOUNDS THEREOF ENGINEERING ELEMENTS AND UNITS FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED,LIQUEFIED, OR SOLIDIFIED GASES FIXED-CAPACITY GAS-HOLDERS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING INORGANIC CHEMISTRY LIGHTING MEANS FOR DAMPING VIBRATION MECHANICAL ENGINEERING METALLURGY NON-METALLIC ELEMENTS PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL SEPARATION SHOCK-ABSORBERS SPRINGS STORING OF DISTRIBUTING GASES OR LIQUIDS THERMAL INSULATION IN GENERAL TRANSPORTING VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED ORSOLIDIFIED GASES WEAPONS |
title | Helium recovery device in semiconductor wafer substitute processing industry |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-02T15%3A59%3A18IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=TAO%20YONGGUI&rft.date=2022-01-28&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3ECN215654289UU%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |