Reaction magnetic control multi-arc coil target device
The utility model belongs to the technical field of vacuum coating, and particularly discloses a reaction magnetic control multi-arc coil target device which comprises a circular multi-arc target material and a metal target material seat used for installing the circular multi-arc target material, th...
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| creator | PAN ZHENQIANG SHI HUAFENG ZHU HUIQIN PAN YOUMING |
| description | The utility model belongs to the technical field of vacuum coating, and particularly discloses a reaction magnetic control multi-arc coil target device which comprises a circular multi-arc target material and a metal target material seat used for installing the circular multi-arc target material, the metal target material seat is installed inside a vacuum coating chamber through an installation flange, a magnetic coil is embedded in the installation flange, and the magnetic coil is connected with the circular multi-arc target material. An anode cover is arranged at the position, corresponding to the front end of the target, of the mounting flange, an arc striking device is further mounted on the mounting flange, and a rotating permanent magnet device is arranged on the back face of the metal target base. The reaction magnetic control multi-arc coil target device has high stability and uniformity of a sputtering magnetic field, the uniformity of target material sputtering and the consistency of the coating eff |
| format | Patent |
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An anode cover is arranged at the position, corresponding to the front end of the target, of the mounting flange, an arc striking device is further mounted on the mounting flange, and a rotating permanent magnet device is arranged on the back face of the metal target base. 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An anode cover is arranged at the position, corresponding to the front end of the target, of the mounting flange, an arc striking device is further mounted on the mounting flange, and a rotating permanent magnet device is arranged on the back face of the metal target base. 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An anode cover is arranged at the position, corresponding to the front end of the target, of the mounting flange, an arc striking device is further mounted on the mounting flange, and a rotating permanent magnet device is arranged on the back face of the metal target base. The reaction magnetic control multi-arc coil target device has high stability and uniformity of a sputtering magnetic field, the uniformity of target material sputtering and the consistency of the coating eff</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Reaction magnetic control multi-arc coil target device |
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