Nozzle
A showerhead and a process chamber including the showerhead are provided herein. In some embodiments, the showerhead includes a body having a central portion and an outer portion, where the outer portion includes an annular wall extending upwardly from the central portion and a flange extending radi...
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| creator | SANCHEZ MARIO DAN RASHEED MUHAMMAD M |
| description | A showerhead and a process chamber including the showerhead are provided herein. In some embodiments, the showerhead includes a body having a central portion and an outer portion, where the outer portion includes an annular wall extending upwardly from the central portion and a flange extending radially outwardly from the annular wall; a plurality of holes disposed through the central portion; anannular step portion provided radially outward of the outermost of the plurality of holes and radially inward of the outer portion; a plurality of positioning features disposed about a central axis ofthe showerhead and formed in a perimeter of the outer portion; and a plurality of coupling features disposed about the central axis and formed in a perimeter of the outer portion.
本文提供了喷头和包含喷头的处理室。在一些实施方式中，喷头包括具有中央部分和外部分的主体，其中外部分包括从中央部分向上延伸的环形壁和从环形壁径向向外延伸的凸缘；穿过中央部分设置的多个孔；环形台阶部分，设置在多个孔中最外面的孔的径向外侧且在外部分的径向内侧；多个定位特征，围绕喷头的中心轴布置并形成在外部分的周边中；和多个耦合特征，围绕中心轴布置并形成在外部分的周边中。 |
| format | Patent |
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本文提供了喷头和包含喷头的处理室。在一些实施方式中，喷头包括具有中央部分和外部分的主体，其中外部分包括从中央部分向上延伸的环形壁和从环形壁径向向外延伸的凸缘；穿过中央部分设置的多个孔；环形台阶部分，设置在多个孔中最外面的孔的径向外侧且在外部分的径向内侧；多个定位特征，围绕喷头的中心轴布置并形成在外部分的周边中；和多个耦合特征，围绕中心轴布置并形成在外部分的周边中。</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SEMICONDUCTOR DEVICES ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2021</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210212&DB=EPODOC&CC=CN&NR=212542358U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76419</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20210212&DB=EPODOC&CC=CN&NR=212542358U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>SANCHEZ MARIO DAN</creatorcontrib><creatorcontrib>RASHEED MUHAMMAD M</creatorcontrib><title>Nozzle</title><description>A showerhead and a process chamber including the showerhead are provided herein. In some embodiments, the showerhead includes a body having a central portion and an outer portion, where the outer portion includes an annular wall extending upwardly from the central portion and a flange extending radially outwardly from the annular wall; a plurality of holes disposed through the central portion; anannular step portion provided radially outward of the outermost of the plurality of holes and radially inward of the outer portion; a plurality of positioning features disposed about a central axis ofthe showerhead and formed in a perimeter of the outer portion; and a plurality of coupling features disposed about the central axis and formed in a perimeter of the outer portion.
本文提供了喷头和包含喷头的处理室。在一些实施方式中，喷头包括具有中央部分和外部分的主体，其中外部分包括从中央部分向上延伸的环形壁和从环形壁径向向外延伸的凸缘；穿过中央部分设置的多个孔；环形台阶部分，设置在多个孔中最外面的孔的径向外侧且在外部分的径向内侧；多个定位特征，围绕喷头的中心轴布置并形成在外部分的周边中；和多个耦合特征，围绕中心轴布置并形成在外部分的周边中。</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2021</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZGDzy6-qyknlYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxzn5GhkamJkbGphahocZEKQIAa8scQw</recordid><startdate>20210212</startdate><enddate>20210212</enddate><creator>SANCHEZ MARIO DAN</creator><creator>RASHEED MUHAMMAD M</creator><scope>EVB</scope></search><sort><creationdate>20210212</creationdate><title>Nozzle</title><author>SANCHEZ MARIO DAN ; RASHEED MUHAMMAD M</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN212542358UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2021</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>SANCHEZ MARIO DAN</creatorcontrib><creatorcontrib>RASHEED MUHAMMAD M</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>SANCHEZ MARIO DAN</au><au>RASHEED MUHAMMAD M</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Nozzle</title><date>2021-02-12</date><risdate>2021</risdate><abstract>A showerhead and a process chamber including the showerhead are provided herein. In some embodiments, the showerhead includes a body having a central portion and an outer portion, where the outer portion includes an annular wall extending upwardly from the central portion and a flange extending radially outwardly from the annular wall; a plurality of holes disposed through the central portion; anannular step portion provided radially outward of the outermost of the plurality of holes and radially inward of the outer portion; a plurality of positioning features disposed about a central axis ofthe showerhead and formed in a perimeter of the outer portion; and a plurality of coupling features disposed about the central axis and formed in a perimeter of the outer portion.
本文提供了喷头和包含喷头的处理室。在一些实施方式中，喷头包括具有中央部分和外部分的主体，其中外部分包括从中央部分向上延伸的环形壁和从环形壁径向向外延伸的凸缘；穿过中央部分设置的多个孔；环形台阶部分，设置在多个孔中最外面的孔的径向外侧且在外部分的径向内侧；多个定位特征，围绕喷头的中心轴布置并形成在外部分的周边中；和多个耦合特征，围绕中心轴布置并形成在外部分的周边中。</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Nozzle |
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