Ring
A ring is provided that includes a body and a gas flow system disposed within the body. The gas flowing system comprises an arc-shaped groove; a circumferential groove; one or more internal channels fluidly coupling the circumferential groove to the arcuate groove, the one or more internal channels...
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| creator | GARY KEPPERS GOVINDA RAJ FRANCISCO RODARTE ARAVIND NAIK SUDHIR GONDHALEKAR RAVIKUMARA KODINAGANHALLI IAN WIDLOW |
| description | A ring is provided that includes a body and a gas flow system disposed within the body. The gas flowing system comprises an arc-shaped groove; a circumferential groove; one or more internal channels fluidly coupling the circumferential groove to the arcuate groove, the one or more internal channels being fluidly coupled to the arcuate groove; and a plurality of nozzle regions, where the pluralityof nozzle regions are disposed at an inner surface of the body and each fluidly coupled to the circumferential groove through a nozzle passage. The circumferential groove has a radius smaller than a radius of the arcuate groove.
提供了一种环，包括主体以及设置在所述主体内的气体流动系统。所述气体流动系统包括弧形凹槽；周向凹槽；一个或多个内部通道，所述一个或多个内部通道将所述周向凹槽流体地耦接到所述弧形凹槽；以及多个喷嘴区域，其中所述多个喷嘴区域设置在所述主体的内表面处，并且各自通过喷嘴通道流体地耦接到所述周向凹槽。所述周向凹槽具有比所述弧形凹槽的半径小的半径。 |
| format | Patent |
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提供了一种环，包括主体以及设置在所述主体内的气体流动系统。所述气体流动系统包括弧形凹槽；周向凹槽；一个或多个内部通道，所述一个或多个内部通道将所述周向凹槽流体地耦接到所述弧形凹槽；以及多个喷嘴区域，其中所述多个喷嘴区域设置在所述主体的内表面处，并且各自通过喷嘴通道流体地耦接到所述周向凹槽。所述周向凹槽具有比所述弧形凹槽的半径小的半径。</description><language>chi ; eng</language><subject>BASIC ELECTRIC ELEMENTS ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; SEMICONDUCTOR DEVICES</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200707&DB=EPODOC&CC=CN&NR=210956616U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200707&DB=EPODOC&CC=CN&NR=210956616U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>GARY KEPPERS</creatorcontrib><creatorcontrib>GOVINDA RAJ</creatorcontrib><creatorcontrib>FRANCISCO RODARTE</creatorcontrib><creatorcontrib>ARAVIND NAIK</creatorcontrib><creatorcontrib>SUDHIR GONDHALEKAR</creatorcontrib><creatorcontrib>RAVIKUMARA KODINAGANHALLI</creatorcontrib><creatorcontrib>IAN WIDLOW</creatorcontrib><title>Ring</title><description>A ring is provided that includes a body and a gas flow system disposed within the body. The gas flowing system comprises an arc-shaped groove; a circumferential groove; one or more internal channels fluidly coupling the circumferential groove to the arcuate groove, the one or more internal channels being fluidly coupled to the arcuate groove; and a plurality of nozzle regions, where the pluralityof nozzle regions are disposed at an inner surface of the body and each fluidly coupled to the circumferential groove through a nozzle passage. The circumferential groove has a radius smaller than a radius of the arcuate groove.
提供了一种环，包括主体以及设置在所述主体内的气体流动系统。所述气体流动系统包括弧形凹槽；周向凹槽；一个或多个内部通道，所述一个或多个内部通道将所述周向凹槽流体地耦接到所述弧形凹槽；以及多个喷嘴区域，其中所述多个喷嘴区域设置在所述主体的内表面处，并且各自通过喷嘴通道流体地耦接到所述周向凹槽。所述周向凹槽具有比所述弧形凹槽的半径小的半径。</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>SEMICONDUCTOR DEVICES</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZGAJysxL52FgTUvMKU7lhdLcDEpuriHOHrqpBfnxqcUFicmpeakl8c5-RoYGlqZmZoZmoaHGRCkCABH1G1c</recordid><startdate>20200707</startdate><enddate>20200707</enddate><creator>GARY KEPPERS</creator><creator>GOVINDA RAJ</creator><creator>FRANCISCO RODARTE</creator><creator>ARAVIND NAIK</creator><creator>SUDHIR GONDHALEKAR</creator><creator>RAVIKUMARA KODINAGANHALLI</creator><creator>IAN WIDLOW</creator><scope>EVB</scope></search><sort><creationdate>20200707</creationdate><title>Ring</title><author>GARY KEPPERS ; GOVINDA RAJ ; FRANCISCO RODARTE ; ARAVIND NAIK ; SUDHIR GONDHALEKAR ; RAVIKUMARA KODINAGANHALLI ; IAN WIDLOW</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN210956616UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>SEMICONDUCTOR DEVICES</topic><toplevel>online_resources</toplevel><creatorcontrib>GARY KEPPERS</creatorcontrib><creatorcontrib>GOVINDA RAJ</creatorcontrib><creatorcontrib>FRANCISCO RODARTE</creatorcontrib><creatorcontrib>ARAVIND NAIK</creatorcontrib><creatorcontrib>SUDHIR GONDHALEKAR</creatorcontrib><creatorcontrib>RAVIKUMARA KODINAGANHALLI</creatorcontrib><creatorcontrib>IAN WIDLOW</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>GARY KEPPERS</au><au>GOVINDA RAJ</au><au>FRANCISCO RODARTE</au><au>ARAVIND NAIK</au><au>SUDHIR GONDHALEKAR</au><au>RAVIKUMARA KODINAGANHALLI</au><au>IAN WIDLOW</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Ring</title><date>2020-07-07</date><risdate>2020</risdate><abstract>A ring is provided that includes a body and a gas flow system disposed within the body. The gas flowing system comprises an arc-shaped groove; a circumferential groove; one or more internal channels fluidly coupling the circumferential groove to the arcuate groove, the one or more internal channels being fluidly coupled to the arcuate groove; and a plurality of nozzle regions, where the pluralityof nozzle regions are disposed at an inner surface of the body and each fluidly coupled to the circumferential groove through a nozzle passage. The circumferential groove has a radius smaller than a radius of the arcuate groove.
提供了一种环，包括主体以及设置在所述主体内的气体流动系统。所述气体流动系统包括弧形凹槽；周向凹槽；一个或多个内部通道，所述一个或多个内部通道将所述周向凹槽流体地耦接到所述弧形凹槽；以及多个喷嘴区域，其中所述多个喷嘴区域设置在所述主体的内表面处，并且各自通过喷嘴通道流体地耦接到所述周向凹槽。所述周向凹槽具有比所述弧形凹槽的半径小的半径。</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES |
| title | Ring |
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