Substrate characteristic clamp
The utility model provides a substrate characteristic clamp which comprises a base and a baffle, the tangent plane of the baffle and the tangent plane of the base are both rectangular, the situation that a substrate is scratched or broken due to the fact that metal deposition is concentrated when pr...
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| creator | LU ZHIJIN WANG ZHIHAO ZHENG YITENG |
| description | The utility model provides a substrate characteristic clamp which comprises a base and a baffle, the tangent plane of the baffle and the tangent plane of the base are both rectangular, the situation that a substrate is scratched or broken due to the fact that metal deposition is concentrated when protrusions exist on the clamping surface is avoided, and meanwhile machining and manufacturing are convenient. One side of the baffle is connected with one side of the base to form an L shape, and the L shape is matched with the edge shape of the substrate to fix the substrate; the width of the baffle is larger than that of the base, the contact area between the baffle and the substrate is increased, the shielding suction area is increased, strength is improved, and service life is prolonged. Thetwo side parts, close to the baffle, of the base are concave, so that the accumulated film can be wound and plated to the back surface and is prevented from being concentrated; a through hole used for connection is formed in |
| format | Patent |
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One side of the baffle is connected with one side of the base to form an L shape, and the L shape is matched with the edge shape of the substrate to fix the substrate; the width of the baffle is larger than that of the base, the contact area between the baffle and the substrate is increased, the shielding suction area is increased, strength is improved, and service life is prolonged. Thetwo side parts, close to the baffle, of the base are concave, so that the accumulated film can be wound and plated to the back surface and is prevented from being concentrated; a through hole used for connection is formed in</description><language>chi ; eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2020</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200616&DB=EPODOC&CC=CN&NR=210765495U$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20200616&DB=EPODOC&CC=CN&NR=210765495U$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>LU ZHIJIN</creatorcontrib><creatorcontrib>WANG ZHIHAO</creatorcontrib><creatorcontrib>ZHENG YITENG</creatorcontrib><title>Substrate characteristic clamp</title><description>The utility model provides a substrate characteristic clamp which comprises a base and a baffle, the tangent plane of the baffle and the tangent plane of the base are both rectangular, the situation that a substrate is scratched or broken due to the fact that metal deposition is concentrated when protrusions exist on the clamping surface is avoided, and meanwhile machining and manufacturing are convenient. One side of the baffle is connected with one side of the base to form an L shape, and the L shape is matched with the edge shape of the substrate to fix the substrate; the width of the baffle is larger than that of the base, the contact area between the baffle and the substrate is increased, the shielding suction area is increased, strength is improved, and service life is prolonged. Thetwo side parts, close to the baffle, of the base are concave, so that the accumulated film can be wound and plated to the back surface and is prevented from being concentrated; a through hole used for connection is formed in</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2020</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJALLk0qLilKLElVSM5ILEpMLkktyiwuyUxWSM5JzC3gYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxzn5GhgbmZqYmlqahocZEKQIAcCAlug</recordid><startdate>20200616</startdate><enddate>20200616</enddate><creator>LU ZHIJIN</creator><creator>WANG ZHIHAO</creator><creator>ZHENG YITENG</creator><scope>EVB</scope></search><sort><creationdate>20200616</creationdate><title>Substrate characteristic clamp</title><author>LU ZHIJIN ; WANG ZHIHAO ; ZHENG YITENG</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN210765495UU3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2020</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>LU ZHIJIN</creatorcontrib><creatorcontrib>WANG ZHIHAO</creatorcontrib><creatorcontrib>ZHENG YITENG</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>LU ZHIJIN</au><au>WANG ZHIHAO</au><au>ZHENG YITENG</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate characteristic clamp</title><date>2020-06-16</date><risdate>2020</risdate><abstract>The utility model provides a substrate characteristic clamp which comprises a base and a baffle, the tangent plane of the baffle and the tangent plane of the base are both rectangular, the situation that a substrate is scratched or broken due to the fact that metal deposition is concentrated when protrusions exist on the clamping surface is avoided, and meanwhile machining and manufacturing are convenient. One side of the baffle is connected with one side of the base to form an L shape, and the L shape is matched with the edge shape of the substrate to fix the substrate; the width of the baffle is larger than that of the base, the contact area between the baffle and the substrate is increased, the shielding suction area is increased, strength is improved, and service life is prolonged. Thetwo side parts, close to the baffle, of the base are concave, so that the accumulated film can be wound and plated to the back surface and is prevented from being concentrated; a through hole used for connection is formed in</abstract><oa>free_for_read</oa></addata></record> |
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| language | chi ; eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Substrate characteristic clamp |
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