Treatment liquid supply device

The utility model provides a treating fluid supply device which enables quality management to be easy. A resist solution supply device for supplying a resist solution to a resist coating device for applying the resist solution to a wafer to perform a predetermined process, there are a plurality of resist coating devices as supply destinations of the resist liquid. The processing liquid supply device is provided with a sending-out part shared by the plurality of liquid processing devices. And a delivery unit that delivers the treatment liquid stored in a treatment liquid supply source for storing the treatment liquid to each of the plurality of liquid treatment devices. Wherein the delivery unit has a plurality of pumps that suck the treatment liquid to replenish the treatment liquid, and deliver the replenished treatment liquid, and the delivery unit is always in a state in which the treatment liquid can be delivered from at least one of the plurality of pumps to the plurality of liquid treatment devices. Acc