SUBSTRATE LIQUID TREATMENT APPARATUS

SUBSTRATE LIQUID TREATMENT APPARATUS

The utility model provides a substrate liquid treatment device. The present utility model prevents droplets of a treatment liquid that has scattered from the surface of the treatment liquid in an inner tank from scattering to an unexpected region outside the inner tank. The substrate liquid processi...

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Hauptverfasser: MASUTOMI HIROYUKI, IKEDA TAKASHI
Format: Patent
Sprache:chi ; eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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creator MASUTOMI HIROYUKI
IKEDA TAKASHI
description The utility model provides a substrate liquid treatment device. The present utility model prevents droplets of a treatment liquid that has scattered from the surface of the treatment liquid in an inner tank from scattering to an unexpected region outside the inner tank. The substrate liquid processing apparatus includes: an inner tank capable of storing a processing liquid and having an upper opening; The outer tank is arranged on the outer side of the inner tank and allows treatment liquid to flow in from the inner tank; A first cover movable between a closed position covering a first regionof the upper opening of the inner tank and an open position opening the first region of the upper opening; And a second cover movable between a closed position covering a second region of the upper opening of the inner tank and an open position opening the second region of the upper opening. The first cover body is provided with a bottom wall and a side wall extending upwards from the bottom wall,and the second cover body
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subjects BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
title SUBSTRATE LIQUID TREATMENT APPARATUS
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